An integrated circuit includes a first circuit cell having a first width and a second circuit cell having a second width that is wider than the first width by at least one contacted poly pitch. An equivalent circuit of the first circuit cell is the same as an equivalent circuit of the second circuit cell.

A method of manufacturing an integrated circuit includes adjusting a first spacing between an adjacent pair of routing tracks in a first set of routing tracks to be equal to a second spacing, adjusting a third spacing between an adjacent pair of routing tracks in a second set of routing tracks to be equal to a fourth spacing, placing a first and second pair of conductive patterns on the corresponding first and second set of routing tracks, forming a first set of conductive structures based on the first pair of conductive patterns, and a second set of conductive structures based on the second pair of conductive patterns. A first and second cell have a same cell height that is a non-integer multiple of a minimum pitch. One spacing of a first set of spacings is different from another spacing of the first set of spacings.

A method of manufacturing an integrated circuit includes adjusting a first spacing between an adjacent pair of routing tracks in a first set of routing tracks to be equal to a second spacing, adjusting a third spacing between an adjacent pair of routing tracks in a second set of routing tracks to be equal to a fourth spacing, placing a first and second pair of conductive patterns on the corresponding first and second set of routing tracks, forming a first set of conductive structures based on the first pair of conductive patterns, and a second set of conductive structures based on the second pair of conductive patterns. A first and second cell have a same cell height that is a non-integer multiple of a minimum pitch. One spacing of a first set of spacings is different from another spacing of the first set of spacings.

A circuit unit in a chip includes a main circuit portion and a configurable portion. The configurable portion includes an output stage, a plurality of configurable stages, and a configurable metal layer. The configurable stages are configured to be connected in sequence to the output stage. The configurable metal layer is connected to the output stage. The main circuit portion is configured to be adjacent to and connected to the output stage of the configurable portion. A driving strength of the circuit unit is determined based on a connection relationship between each of the plurality of configurable stages and the configurable metal layer.

A circuit unit in a chip includes a main circuit portion and a configurable portion. The configurable portion includes an output stage, a plurality of configurable stages, and a configurable metal layer. The configurable stages are configured to be connected in sequence to the output stage. The configurable metal layer is connected to the output stage. The main circuit portion is configured to be adjacent to and connected to the output stage of the configurable portion. A driving strength of the circuit unit is determined based on a connection relationship between each of the plurality of configurable stages and the configurable metal layer.

In a first aspect, a semiconductor device includes a plurality of cells. Each cell of the plurality of cells includes four metal tracks running substantially parallel to each other in a first metal layer to provide signal routing and a plurality of wrapped channels having a pitch that is uniform among the plurality of wrapped channels. In a second aspect, a semiconductor device includes a plurality of cells. Each cell of the plurality of cells includes four metal tracks running substantially parallel to each other in a first metal layer to provide signal routing and a plurality of wrapped channels having an asymmetric distribution. For example, a first distance between a first pair of adjacent wrapped channels is different than a second distance between a second pair of adjacent wrapped channels.

A clock circuit includes at least two first driving circuits and a plurality of discrete first wires located between adjacent first driving circuits, the adjacent first driving circuits are connected through at least one first wire and at least two second wires, the first driving circuits are connected with the second wires, all of the first wires connected between two second wires are connected in series with each other, the first wires are located on a first metal layer, the second wires are located on a second metal layer, and the second metal layer is above the first metal layer.

A clock circuit includes at least two first driving circuits and a plurality of discrete first wires located between adjacent first driving circuits, the adjacent first driving circuits are connected through at least one first wire and at least two second wires, the first driving circuits are connected with the second wires, all of the first wires connected between two second wires are connected in series with each other, the first wires are located on a first metal layer, the second wires are located on a second metal layer, and the second metal layer is above the first metal layer.

Some embodiments provide a method for calculating parasitic parameters for a pattern to be manufactured on an integrated circuit (IC) substrate. The method receives a definition of a wire structure as input. The method rasterizes the wire structure (e.g., produces pixel-based definition of the wire structure) to produce several images. Before rasterizing the wire structure, the method in some embodiments decomposes the wire structure into several components (e.g., several wires, wire segments or wire structure portions), which it then individually rasterizes. The method then uses the images as inputs to a neural network, which then calculates parasitic parameters associated with the wire structure. In some embodiments, the parasitic parameters include unwanted parasitic capacitance effects exerted on the wire structure. Conjunctively, or alternatively, these parameters include unwanted parasitic resistance and/or inductance effects on the wire structure.

Some embodiments provide a method for calculating parasitic parameters for a pattern to be manufactured on an integrated circuit (IC) substrate. The method receives a definition of a wire structure as input. The method rasterizes the wire structure (e.g., produces pixel-based definition of the wire structure) to produce several images. Before rasterizing the wire structure, the method in some embodiments decomposes the wire structure into several components (e.g., several wires, wire segments or wire structure portions), which it then individually rasterizes. The method then uses the images as inputs to a neural network, which then calculates parasitic parameters associated with the wire structure. In some embodiments, the parasitic parameters include unwanted parasitic capacitance effects exerted on the wire structure. Conjunctively, or alternatively, these parameters include unwanted parasitic resistance and/or inductance effects on the wire structure.