The present disclosure includes apparatuses, methods, and systems for predicting and compensating for degradation of memory cells. An embodiment includes a memory having a group of memory cells, and circuitry configured to, upon a quantity of sense operations performed on the group of memory cells meeting or exceeding a threshold quantity, perform a sense operation on the group of memory cells using a positive sensing voltage and perform a sense operation on the group of memory cells using a negative sensing voltage, and perform an operation to program the memory cells of the group determined to be in a reset data state by both of the sense operations to the reset data state.

Systems, methods, and apparatus related to dynamically determining read voltages used in memory devices. In one approach, a memory device has a memory array including memory cells. One or more resistors are formed as part of the memory array. A memory controller increments a counter as write operations are performed on the memory cells. When the counter reaches a limit, a write operation is performed on the resistors. The write operation applies voltages to the resistors similarly as applied to the memory cells over time during normal operation. When performing a read operation, a current is applied to one or more of the resistors to determine a boost voltage. When reading the memory cells, a read voltage is adjusted based on the boost voltage. The memory cells are read using the adjusted read voltage.

A neural network using a cross-point array is provided along with a pattern readout method thereof. Resistive memory devices are stacked vertically to form the neural network as synaptic devices. The connection strength of the signal passing between two neurons is controlled by the positive and negative conductance of the resistive memory devices and it is possible to recognize and readout patterns by learning in the cross-point array.

A non-volatile memory device includes a memory array, a reading circuit, a column decoder stage, and a read supply voltage generator. The column decoder stage includes selectable bitlines and selection switches. A read supply voltage generator includes a voltage regulation circuit and a dummy column decoder coupled to an output of the voltage regulation circuit and having electrical characteristics correlated to the selected read path. The voltage regulation circuit is configured to receive a first electrical quantity correlated to a desired voltage value on the selected bitline and a second electrical quantity correlated to a desired current value for the selected bitline and to generate a regulated read supply voltage for the column decoder stage.

A nonvolatile memory apparatus may include a control circuit, a sense amplifier, and a reference generator. The control circuit may apply a read voltage across a target memory cell through a selected global bit line and a selected global word line. The sense amplifier may generate an output signal by comparing voltage levels of the selected global word line and a reference line. The reference generator may change the voltage level of the reference line by charging and discharging a capacitor that is coupled to the reference line.

A device includes at least one tunable resistive element. Each tunable resistive element comprises a first terminal, a second terminal, and a dielectric layer arranged between the first and second terminals. The device is configured to apply at least one electrical set pulse to the resistive elements to form a conductive filament comprising a plurality of oxygen vacancies in the dielectric layer. The device is configured to apply at least one electrical reset pulse to displace a subset of the oxygen vacancies of the conductive filament. The at least one electrical reset pulse comprises a first part, which is adapted to increase the temperature of the conductive filament and increase the mobility of the oxygen vacancies of the conductive filament, and a second part, which is configured to displace the subset of the oxygen vacancies of the conductive filament.

A memory system may include multiple memory cells to store logical data and cycle tracking circuitry to track a number of cycles associated the memory cells. The cycles may be representative of one or more past accesses of the memory cells. The memory system may also include control circuitry to access the memory cells. Accessing of the memory cell may include a read operation, a write operation, or both. During the accessing of the memory cell, the control circuitry may determine a voltage parameter of the access based at least in part on the tracked number of cycles.

A programmable resistive memory element and a method of adjusting a resistance of a programmable resistive memory element are provided. The programmable resistive memory element includes at least one resistive memory element. Each resistive memory element includes an Indium-Gallium-Zinc-Oxide (IGZO) resistive layer, a first electrical contact and a second electrical contact. The first and second electrical contacts are disposed on the IGZO resistive layer in the same plane. The programmable resistive memory element includes a voltage generator coupled to the first and second electrical contacts, constructed and arranged to apply a thermal treatment to the resistive memory element to adjust a resistance of the resistive memory element.

Methods, systems, and devices for a low resistance crosspoint architecture are described. A manufacturing system may deposit a thermal barrier material, followed by a first layer of a first conductive material, on a layered assembly including a patterned layer of electrode materials and a patterned layer of a memory material. The manufacturing system may etch a first area of the layered assembly to form a gap in the first layer of the first conductive material, the thermal barrier material, the patterned layer of the memory material, and the patterned layer of electrode materials. The manufacturing system may deposit a second conductive material to form a conductive via in the gap, where the conductive via extends to a height within the layered assembly that is above the thermal barrier material.

A memory cell includes a first electrode, a second electrode, a variable resistance layer located between the first electrode and the second electrode, and a ferroelectric layer located between the variable resistance layer and the second electrode, wherein the variable resistance layer is maintained in an amorphous state during a program operation.