G11C2013/0083

CLEANING MEMORY BLOCKS USING MULTIPLE TYPES OF WRITE OPERATIONS
20220230683 · 2022-07-21 ·

Methods, systems, and devices for cleaning memory blocks using multiple types of write operations are described. A counter may be incremented each time a write command is received. In response to the counter reaching a threshold, the counter may be reset and a flag may be set. Each time a cleaning of a memory block is to take place, the flag may be checked. If the flag is set, the memory block may be cleaned using a second type of cleaning operation, such as one using a force write approach. Otherwise, the memory block may be cleaned using a first type of cleaning operation, such as one using a normal write approach. Once set, the flag may be reset after one or more memory blocks are cleaned using the second type of cleaning operation.

Systems and Methods for Stabilizing Cell Threshold Voltage
20210407591 · 2021-12-30 ·

The present disclosure relates to a memory device comprising a plurality of memory cells, each memory cell being programmable to a logic state corresponding to a threshold voltage exhibited by the memory cell in response to an applied voltage, and a logic circuit portion operatively coupled to the plurality of memory cells, wherein the logic circuit portion is configured to scan memory addresses of the memory device, and to generate seasoning pulses to be applied to the addressed pages of the memory device. A related electronic system and related methods are also disclosed.

MEMORY ARRAY WITH ASYMMETRIC BIT-LINE ARCHITECTURE

The present disclosure relates to an integrated circuit. The integrated circuit has a plurality of bit-line stacks disposed over a substrate and respectively including a plurality of bit-lines stacked onto one another. A data storage structure is over the plurality of bit-line stacks and a selector is over the data storage structure. A word-line is over the selector. The selector is configured to selectively allow current to pass between the plurality of bit-lines and the word-line. The plurality of bit-line stacks include a first bit-line stack, a second bit-line stack, and a third bit-line stack. The first and third bit-line stacks are closest bit-line stacks to opposing sides of the second bit-line stack. The second bit-line stack is separated from the first bit-line stack by a first distance and is further separated from the third bit-line stack by a second distance larger than the first distance.

TECHNIQUES FOR A MULTI-STEP CURRENT PROFILE FOR A PHASE CHANGE MEMORY
20210391005 · 2021-12-16 ·

Examples may include techniques to implement a SET write operation to a selected memory cell include in a memory array. Examples include selecting the memory cell that includes phase change material and applying various currents over various periods of time during a nucleation stage and a crystal growth stage to cause the memory cell to be in a SET logical state.

IN-MEMORY RESISTIVE RANDOM ACCESS MEMORY XOR LOGIC USING COMPLIMENTARY SWITCHING
20220190239 · 2022-06-16 ·

In a method for using or forming a semiconductor structure. The semiconductor structure may include a resistive random access memory (RRAM) gate with a first electrode and a second electrode. The RRAM gate may also include a switching layer that includes a dielectric material having a switching layer k-value and a switching layer thermal conductivity. The RRAM gate may also include a complimentary switching (CS) mitigation layer with a material having a CS k-value that is lower than the switching layer k-value and a CS thermal conductivity that is higher than the switching layer thermal conductivity.

ELECTRICALLY FORMED MEMORY ARRAY
20220190032 · 2022-06-16 ·

The present disclosure includes electrically formed memory arrays, and methods of processing the same. A number of embodiments include a plurality of conductive lines separated from one other by an insulation material, a first plurality of conductive extensions arranged to extend substantially perpendicular to the plurality of conductive lines, a storage element material formed around each respective one of the first plurality of conductive extensions, a second plurality of conductive extensions arranged to extend substantially perpendicular to the plurality of conductive lines, and a plurality of single element materials formed around each respective one of the second plurality of conductive extensions.

Resistive memory device and reliability enhancement method thereof by using ratio of set current and reference current

A resistive memory device and a reliability enhancement method thereof are provided. The reliability enhancement method includes the following steps. A forming operation is performed on a plurality of memory cells. The formed memory cells are read to respectively obtain a plurality of formed currents. A reference current is set according to a statistic value of the formed currents. A setting operation is performed on the memory cells. A ratio between a set current of each of the memory cells and the reference current is calculated, and a physical status of each of the memory cells is judged according to the ratio. It is determined whether to perform a fix operation of each of the memory cells or not according to physical status.

TECHNIQUES FOR A MULTI-STEP CURRENT PROFILE FOR A PHASE CHANGE MEMORY
20220165335 · 2022-05-26 ·

Examples may include techniques to implement a SET write operation to a selected memory cell include in a memory array. Examples include selecting the memory cell that includes phase change material and applying various currents over various periods of time during a nucleation stage and a crystal growth stage to cause the memory cell to be in a SET logical state.

RRAM devices with reduced forming voltage

Approaches for fabricating RRAM stacks with reduced forming voltage, and the resulting structures and devices, are described. In an example, a resistive random access memory (RRAM) device includes a conductive interconnect in an inter-layer dielectric (ILD) layer above a substrate. An RRAM element is on the conductive interconnect, the RRAM element including a first electrode layer on the uppermost surface of the conductive interconnect. A resistance switching layer is on the first electrode layer, the resistance switching layer including a first metal oxide material layer on the first electrode layer, and a second metal oxide material layer on the first metal oxide material layer, the second metal oxide material layer including a metal species not included in the first metal oxide material layer. An oxygen exchange layer is on the second metal oxide material layer of the resistance switching layer. A second electrode layer is on the oxygen exchange layer.

Semiconductor memory device
11735260 · 2023-08-22 · ·

A semiconductor memory device capable of satisfying multiple reliability conditions and multiple performance requirements is provided. A variable resistance memory of the disclosure makes it possible to write data in a memory array by changing a write condition according to the type of a write command from the outside. If the write command is an endurance-related command, an endurance algorithm is selected and data is written in an endurance storage area. If the write command is a retention-related command, a retention algorithm is selected and data is written in a retention storage area.