A method for reading data stored in a flash memory includes at least the following steps: controlling the flash memory to perform a plurality of read operations upon a plurality of memory cells included in the flash memory; obtaining a plurality of bit sequences read from the memory cells, respectively, wherein the read operations read bits of a predetermined bit order from the memory cells by utilizing different control gate voltage settings; and determining readout information of the memory cells according to binary digit distribution characteristics of the bit sequences.

A content addressable memory cell includes a first floating body transistor and a second floating body transistor. The first floating body transistor and the second floating body transistor are electrically connected in series through a common node. The first floating body transistor and the second floating body transistor store complementary data.

According to one embodiment, a semiconductor memory device includes first and second memory cells, a first word line, first and second sense amplifiers, first and second bit lines, a controller. The first and second sense amplifiers each include first and second transistors. The first bit line is connected between the first memory cell and the first transistor. The second bit line is connected between the second memory cell and the second transistor. In the read operation, the controller is configured to apply a kick voltage to the first word line before applying the read voltage to the first word line, and to apply a first voltage to a gate of the first transistor and a second voltage to a gate of the second transistor while applying the kick voltage to the first word line.

A nonvolatile memory cell includes a semiconductor layer including a first recess and a second recess. A first gate insulation layer is disposed on a bottom surface and side surfaces of the first recess. A second gate insulation layer is disposed on a bottom surface and side surfaces of the second recess. A variable resistive material layer is disposed on a first region of the semiconductor layer disposed between the first and second recesses. An insulation barrier layer disposed on a top surface and side surfaces of the variable resistive material layer. A gate electrode surrounding the insulation barrier layer and extending to fill the first and second recesses.

Some embodiments include apparatuses and methods of forming such apparatuses. One of the apparatus includes first memory cells located in different levels in a first portion of the apparatus, second memory cells located in different levels in a second portion of the apparatus, a switch located in a third portion of the apparatus between the first and second portions, first and second control gates to access the first and second memory cells, an additional control gate located between the first and second control gates to control the switch, a first conductive structure having a thickness and extending perpendicular to the levels in the first portion of the apparatus, a first dielectric structure between the first conductive structure and charge-storage portions of the first memory cells, a second dielectric structure having a second thickness between the second conductive structure and a sidewall of the additional control gate, the second thickness being greater than the first thickness.

According to one embodiment, a semiconductor memory device includes first and second memory cells, a first word line, first and second sense amplifiers, first and second bit lines, a controller. The first and second sense amplifiers each include first and second transistors. The first bit line is connected between the first memory cell and the first transistor. The second bit line is connected between the second memory cell and the second transistor. In the read operation, the controller is configured to apply a kick voltage to the first word line before applying the read voltage to the first word line, and to apply a first voltage to a gate of the first transistor and a second voltage to a gate of the second transistor while applying the kick voltage to the first word line.

A content addressable memory cell includes a first floating body transistor and a second floating body transistor. The first floating body transistor and the second floating body transistor are electrically connected in series through a common node. The first floating body transistor and the second floating body transistor store complementary data.

A nonvolatile memory cell includes a semiconductor layer including a first recess and a second recess. A first gate insulation layer is disposed on a bottom surface and side surfaces of the first recess. A second gate insulation layer is disposed on a bottom surface and side surfaces of the second recess. A variable resistive material layer is disposed on a first region of the semiconductor layer disposed between the first and second recesses. An insulation barrier layer disposed on a top surface and side surfaces of the variable resistive material layer. A gate electrode surrounding the insulation barrier layer and extending to fill the first and second recesses.

A content addressable memory cell includes a first floating body transistor and a second floating body transistor. The first floating body transistor and the second floating body transistor are electrically connected in series through a common node. The first floating body transistor and the second floating body transistor store complementary data.

A memory device is provided. The device comprises a semiconductor fin with a first gate and a second gate disposed over the semiconductor fin. A third gate is positioned over the semiconductor fin and a lower portion of the third gate is disposed between the first and second gates.