Patent classifications
G02F1/1524
Tungsten oxide nanostructure thin films for electrochromic devices
A method of manufacturing a thin film is provided. The method includes providing a plurality of crystalline hexagonal tungsten trioxide particles, size-reducing the crystalline hexagonal tungsten trioxide particles by grinding to produce crystalline hexagonal tungsten trioxide nanostructures, and coating the crystalline hexagonal tungsten trioxide nanostructures onto a substrate to produce a thin film. An electrochromic multi-layer stack is also provided.
Pinhole mitigation for optical devices
Methods, apparatus, and systems for mitigating pinhole defects in optical devices such as electrochromic windows. One method mitigates a pinhole defect in an electrochromic device by identifying the site of the pinhole defect and obscuring the pinhole to make it less visually discernible. In some cases, the pinhole defect may be the result of mitigating a short-related defect.
Pinhole mitigation for optical devices
Methods, apparatus, and systems for mitigating pinhole defects in optical devices such as electrochromic windows. One method mitigates a pinhole defect in an electrochromic device by identifying the site of the pinhole defect and obscuring the pinhole to make it less visually discernible. In some cases, the pinhole defect may be the result of mitigating a short-related defect.
ULTRATHIN ELECTROCHROMIC ELEMENT AND DEVICE FOR HIGH OPTICAL MODULATION
The present disclosure relates to electrochromic devices including an insulating layer and at least one electrochromic material having one or more optical properties that may be changed upon application of an electric potential. The device may include a conductive nanoparticle layer and/or a buffer layer. Upon provision of an electric potential above a threshold, electrons and holes may be injected into the electrochromic material and blocked by the insulating layer, resulting in an accumulation of the electrons and holes in their respective electrochromic material resulting in a change to the one or more optical properties of the electrochromic material. An opposite electric potential may be provided to reverse the change in the one or more optical properties.
ULTRATHIN ELECTROCHROMIC ELEMENT AND DEVICE FOR HIGH OPTICAL MODULATION
The present disclosure relates to electrochromic devices including an insulating layer and at least one electrochromic material having one or more optical properties that may be changed upon application of an electric potential. The device may include a conductive nanoparticle layer and/or a buffer layer. Upon provision of an electric potential above a threshold, electrons and holes may be injected into the electrochromic material and blocked by the insulating layer, resulting in an accumulation of the electrons and holes in their respective electrochromic material resulting in a change to the one or more optical properties of the electrochromic material. An opposite electric potential may be provided to reverse the change in the one or more optical properties.
DISPLAY SUBSTRATE, DISPLAY APPARATUS, AND DISPLAY SUBSTRATE MANUFACTURE METHOD
This disclosure relates to a display substrate. The display substrate includes: a backplate, and a light-emitting device and a thin film encapsulation layer which are successively formed on the backplate, wherein the backplate includes a display area, the display area includes a plurality of pixel areas arranged in an array; the display substrate further includes an electrochromic unit arranged on a side, away from the backplate, of the thin film encapsulation layer, wherein the electrochromic unit includes at least a first area, and projection of the first area onto the backplate covers the pixel areas; the electrochromic unit is in a transparent state when the light-emitting device emits light, and the electrochromic unit is in a black state when the light-emitting device does not emit light. This disclosure also relates to a display apparatus and a display substrate manufacture method.
BUILDING CLADDING SYSTEMS COMPRISING SWITCHABLE MATERIALS AND METHODS OF USE THEREOF
Building cladding systems with changeable appearances and methods of use are described. The building cladding system may include a substrate and a coating comprising a switchable material. Varying a voltage, temperature, or wavelength of light on or applied to the coating may change an appearance of the building cladding system.
BUILDING CLADDING SYSTEMS COMPRISING SWITCHABLE MATERIALS AND METHODS OF USE THEREOF
Building cladding systems with changeable appearances and methods of use are described. The building cladding system may include a substrate and a coating comprising a switchable material. Varying a voltage, temperature, or wavelength of light on or applied to the coating may change an appearance of the building cladding system.
Electrochromic devices
Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer, which are in direct contact with one another. The interfacial region contains an ion conducting electronically insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices. In addition to the improved electrochromic devices and methods for fabrication, integrated deposition systems for forming such improved devices are also disclosed.
Electrochromic devices
Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer, which are in direct contact with one another. The interfacial region contains an ion conducting electronically insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices. In addition to the improved electrochromic devices and methods for fabrication, integrated deposition systems for forming such improved devices are also disclosed.