The present application discloses a method for preparing an electrochromic device. The method includes placing an edge protection material on a first and second substrates, placing a first and second interlayers respectively within the edge protection material on the first and second substrates, wherein the edge protection material surrounds edges of the first and second interlayers, and interposing an electrochromic film between the first and second interlayers. The edge protection material prevents chemicals in the first and second interlayers from entering into the electrochromic film.

An electrochromic film and an electrochromic device including the electrochromic film are disclosed. The electrochromic film includes an electrochromic layer and a passivation layer on one side of the electrochromic layer. The coloration level of the electrochromic film is different from the coloration level of the passivation layer. The film may change optical properties as a result of electrochromism according to an electrochemical reaction. The electrochromic film and the electrochromic device have improved electrochromism, excellent durability, excellent color-switching speed, and stepwise control of optical properties.

Certain embodiments relate to optical devices and methods of fabricating optical devices that pre-treat a sub-layer to enable selective removal of the pre-treated sub-layer and overlying layers. Other embodiments pertain to methods of fabricating an optical device that apply a sacrificial material layer.

A monolithic tandem electrochromic device, comprising a central transparent conductor ion blocking layer, a first electrochromic multilayer stack arranged on a first surface of the central transparent conductor ion blocking layer, and a second electrochromic multilayer stack arranged on a second surface of the central transparent conductor ion blocking layer is described. The central transparent conductor ion blocking layer can comprise ion conductivities between 10.sup.−4 and 10.sup.−20 S/cm, and electrical resistivity less than 100 Ohm-cm.

Provided is an electrochromic device. The electrochromic device includes a first additional layer, a first base layer, an electrochromic layer, a second base layer, and a second additional layer stacked in sequence. Two ends of the electrochromic layer are flush with two ends of the first base layer. Two ends of the second base layer and two ends of the second additional layer are disposed beyond the two ends of the electrochromic layer. A first sealing element is disposed around the electrochromic layer and on the second base layer.

A long-range electrochromic fiber for infrared camouflage and preparation method thereof are disclosed. The method includes: coating indium tin oxide dispersion, electrolyte solution, and electrochromic material on the surface of the metal fiber sequentially, and preparing counter electrodes and polymer protective layer on the outside of the electrochromic layer to obtain the long-range electrochromic fiber. The obtained long-range electrochromic fiber can realize the regulation of infrared emissivity, can be continuously prepared for more than 100 meters and has a good application prospect in infrared camouflage, wearable display, etc.

To provide an electrochromic display element, which contains: a display substrate; a display electrode; an electrochromic layer provided in contact with the display electrode; a counter substrate provided to face the display substrate; a counter electrode; a charge retention layer provided in contact with the counter electrode; and an electrolyte layer filling between the display substrate and the counter substrate, wherein the electrochromic layer contains titanium oxide particles, and metal hydroxide is dispersed on surfaces and in inner parts of the titanium oxide particles.

An electrochromic device is provided including a first substrate, a first electrode on the first substrate, a second substrate, a second electrode on the second substrate facing the first electrode, an electrochromic layer in contact with the first electrode, an anti-deterioration layer in contact with the second electrode facing the first electrode, and an electrolyte layer in contact with both the electrochromic layer and the anti-deterioration layer. At least one of the first electrode and the second electrode includes In.sub.2O.sub.3, and has an infrared light transmittance of 70% or more at a wavelength of 1,500 nm. The electrochromic layer includes a triarylamine-containing radical polymerizable compound represented by a specific formula.

The embodiments herein relate to electrochromic stacks, electrochromic devices, and methods and apparatus for making such stacks and devices. In various embodiments, an anodically coloring layer in an electrochromic stack or device is fabricated to include nickel-tungsten-tin-oxide (NiWSnO). This material is particularly beneficial in that it is very transparent in its clear state.

Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.