Methods of operating a memory include receiving a plurality of digits of data for programming to a plurality of memory cells of the memory, redistributing the received plurality of digits of data in a reversible manner to generate a plurality of digits of redistributed data each corresponding to a respective memory cell of the plurality of memory cells, and for each memory cell of the plurality of memory cells, programming the corresponding digit of redistributed data for that memory cell to a first digit position of a respective data state of that memory cell, programming a second digit of data having a first data value to a second digit position of the respective data state of that memory cell, and programming a third digit of data having a second data value to a third digit position of the respective data state of that memory cell.

Various embodiments, disclosed herein, can include apparatus and methods to perform a one check failure byte (CFBYTE) scheme in programming of a memory device. In programming memory cells in which each memory cell can store multiple bits, the multiple bits being a n-tuple of bits of a set of n-tuples of bits with each n-tuple of the set associated with a level of a set of levels of threshold voltages for the memory cells. Verification of a program algorithm can be structured based on a programming algorithm that proceeds in a progressive manner by placing a threshold voltage of one level/distribution at a time. The routine of this progression can be used to perform just one failure byte check for that specific target distribution only, thus eliminating the need to check failure byte for all subsequent target distribution during every stage of program algorithm. Additional apparatus, systems, and methods are disclosed.

A twin bit memory cell includes first and second spaced apart floating gates formed in first and second trenches in the upper surface of a semiconductor substrate. An erase gate, or a pair of erase gates, are disposed over and insulated from the floating gates, respectively. A word line gate is disposed over and insulated from a portion of the upper surface that is between the first and second trenches. A first source region is formed in the substrate under the first trench, and a second source region formed in the substrate under the second trench. A continuous channel region of the substrate extends from the first source region, along a side wall of the first trench, along the portion of the upper surface that is between the first and second trenches, along a side wall of the second trench, and to the second source region.

Method of operating a memory include increasing respective threshold voltages of a first subset of memory cells of a plurality of memory cells to threshold voltage levels higher than a particular voltage level in response to applying a first plurality of programming pulses, and subsequently increasing respective threshold voltages of a second subset of memory cells of the plurality of memory cells to threshold voltage levels lower than the particular voltage level in response to applying a second plurality of programming pulses, wherein the first plurality of programming pulses have respective voltage levels within a first range of voltage levels, the second plurality of programming pulses have respective voltage levels within a second range of voltage levels, and a lowest voltage level of the first range of voltage levels is lower than or equal to a highest voltage level of the second range of voltage levels.

A semiconductor memory device includes a memory cell array, a peripheral circuit, and a control logic. The memory cell array includes a plurality of memory blocks. The peripheral circuit performs a read operation on a selected memory block among the plurality of memory blocks. The control logic controls the read operation of the peripheral circuit. The selected memory block is coupled to a plurality of bit lines, and the plurality of bit lines are grouped into a plurality of bit line groups. The peripheral circuit performs data sensing by applying different reference currents to the plurality of bit line groups, respectively.

A method of forming a memory device that includes forming on a substrate, a first insulation layer, a first conductive layer, a second insulation layer, a second conductive layer, a third insulation layer. First trenches are formed through third insulation layer, the second conductive layer, the second insulation layer and the first conductive layer, leaving side portions of the first conductive layer exposed. A fourth insulation layer is formed at the bottom of the first trenches that extends along the exposed portions of the first conductive layer. The first trenches are filled with conductive material. Second trenches are formed through the third insulation layer, the second conductive layer, the second insulation layer and the first conductive layer. Drain regions are formed in the substrate under the second trenches. A pair of memory cells results, with a single continuous channel region extending between drain regions for the pair of memory cells.

Memory devices are disclosed. A memory device may include control logic configured to program a first number of memory cells to a level greater than or equal to a first particular level and inhibit programming of a second number of memory cells while the first number of memory cells is programmed. The control logic may also be configured to program the second number of memory cells to a level less than the first particular level and inhibit programming of the first number of memory cells while the second number of memory cells is programmed. Associated methods are also disclosed.

A semiconductor device, including: a plurality of non-volatile memory cells including a first memory cell and a second memory cell, where the plurality of non-volatile memory cells includes source diffusion lines and drain diffusion lines, at least one of the source diffusion lines and drain diffusion lines are shared by the first memory cell and the second memory cell, where the first memory cell includes a thin tunneling oxide of less than 1 nm thickness, and where the second memory cell includes a thick tunneling oxide of greater than 2 nm thickness.

Some embodiments include apparatuses, and methods of operating the apparatuses. Some of the apparatuses include a data line, a first memory cell string including first memory cells located in different levels of the apparatus, first access lines to access the first memory cells, a first select gate coupled between the data line and the first memory cell string, a first select line to control the first select gate, a second memory cell string including second memory cells located in different levels of the apparatus, second access lines to access the second memory cells, the second access lines being electrically separated from the first access lines, a second select gate coupled between the data line and the second memory cell string, a second select line to control the second select gate, and the first select line being in electrical contact with the second select line.

A method of reading a memory device having a plurality of memory cells by, and a device configured for, reading a first memory cell of the plurality of memory cells to generate a first read current, reading a second memory cell of the plurality of memory cells to generate a second read current, applying a first offset value to the second read current, and then combining the first and second read currents to form a third read current, and then determining a program state using the third read current. Alternately, a first voltage is generated from the first read current, a second voltage is generated from the second read current, whereby the offset value is applied to the second voltage, wherein the first and second voltages are combined to form a third voltage, and then the program state is determined using the third voltage.