The present invention discloses a display panel. The display panel comprises a substrate, a plurality of active switches disposed on the substrate, a color filter layer formed on the active switches, and a transparent photoresist layer formed on and covering the color filter layer. The transparent photoresist layer comprises a protective layer and at least one photo spacer.

Provided is a manufacturing method for an array substrate and an array substrate. The manufacturing method for an array substrate comprises: depositing a gate metal layer, and carrying out a first pass of photolithography to form a gate; depositing a gate insulation layer, a first semiconductor layer, a second semiconductor layer, a first barrier layer, a second barrier layer and a source-drain metal layer in sequence, carrying out a second pass of photolithography to form an active island, meanwhile forming a source and a drain; depositing a passivation layer, and carrying out a third pass of photolithography to form a conductive via in the passivation layer on the drain; and depositing a transparent conductive layer, and carrying out a fourth pass of photolithography to form the transparent conductive layer into the pixel electrode and enable the pixel electrode to be communicated with the drain through the conductive via.

A display device and a method of manufacturing the display device are disclosed. In one aspect, the display device includes a substrate including a display region and a peripheral region. A first block member is in the peripheral region and surrounding display structures, the first block member having a first height. A second block member is spaced apart from the first block member in a first direction extending from the display region to the peripheral region, the second block member surrounding the first block member, the second block member having a second height that is greater than the first height. A first encapsulation layer is over the display structures, the first block member, and the second block member. A second encapsulation layer is over the first encapsulation layer, the second encapsulation layer overlapping at least a portion of the first block member in the depth dimension of the display device.

Embodiments described herein provide a system, a software application, and a method of a lithography process, to write full tone portions and grey tone portions in a single pass. One embodiment includes a controller configured to provide mask pattern data to a lithography system. The controller is configured to divide a plurality of spatial light modulator pixels spatially by at least a grey tone group and a full tone group of spatial light modulator pixels. When divided by the controller, the grey tone group of spatial light modulator pixels is operable to project a first number of the multiplicity of shots to the plurality of full tone exposure polygons and the plurality of grey tone exposure polygons, and the full tone group of spatial light modulator pixels is operable to project a second number of the multiplicity of shots to the plurality of full tone exposure polygons.

The present disclosure provides a display panel and a fabricating method thereof, wherein the display panel includes a first substrate and a second substrate, the first substrate is provided with a plurality of first spacers, and the second substrate is provided with a plurality of second spacers disposed corresponding to the first spacers, a recess is disposed on a side of the second spacers adjacent to the first substrate, and an end of the first spacers away from the first substrate is placed in the recess, so that a relative displacement between the first substrate and the second substrate is reduced when the display panel is bent, thereby improving the problems of light leakage and color mixing, and reducing a risk of scratching an alignment film when the spacers slide.

An array substrate, a manufacturing method thereof and a display device are provided. The array substrate includes: a base substrate, a reflection region layered structure and a reflection electrode. The base substrate includes a pixel region, the pixel region includes a reflection region. The reflection region layered structure is in the reflection region, and includes a particle layer, the particle layer is configured to provide a granular rough surface on a side of the reflection region layered structure facing away from the base substrate. The reflection electrode is on the particle layer.

A method for manufacturing the array substrate includes: forming a gate metal layer on a base by a first patterning process and forming a gate insulating layer on the gate metal layer; forming a semiconductor layer and a source/drain metal layer by a second patterning process on the resulted base, the source/drain metal layer including a data line and a metal electrode connected to the data line; forming a first electrode on the resulted base and forming a channel region by a third patterning process, the channel region causing the metal electrode to form a source electrode and a drain electrode; forming a passivation layer and an organic insulating layer by a fourth patterning process on the resulted base; the organic insulating layer at least corresponding to the data line; and forming a second electrode by a fifth patterning process on the resulted base.

A display device and a method of manufacturing the display device are disclosed. In one aspect, the display device includes a substrate including a display region and a peripheral region. A first block member is in the peripheral region and surrounding display structures, the first block member having a first height. A second block member is spaced apart from the first block member in a first direction extending from the display region to the peripheral region, the second block member surrounding the first block member, the second block member having a second height that is greater than the first height. A first encapsulation layer is over the display structures, the first block member, and the second block member. A second encapsulation layer is over the first encapsulation layer, the second encapsulation layer overlapping at least a portion of the first block member in the depth dimension of the display device.

There is provided a manufacture method of an array substrate of a display device using TFT as a pixel control unit, an array substrate, and a display apparatus. In this method, when a data line and source and drain electrodes of a TFT are prepared, a half-tone mask is used to retain at least one part of a photoresist on the data line; and the retained photoresist is softened by heating so that the at least one part of the data line is coated by the retained photoresist.

Embodiments described herein provide a system, a software application, and a method of a lithography process, to write full tone portions and grey tone portions in a single pass. One embodiment includes a controller configured to provide mask pattern data to a lithography system. The controller is configured to divide a plurality of spatial light modulator pixels spatially by at least a grey tone group and a full tone group of spatial light modulator pixels. When divided by the controller, the grey tone group of spatial light modulator pixels is operable to project a first number of the multiplicity of shots to the plurality of full tone exposure polygons and the plurality of grey tone exposure polygons, and the full tone group of spatial light modulator pixels is operable to project a second number of the multiplicity of shots to the plurality of full tone exposure polygons.