A conductive mesh structure according to an embodiment includes a dielectric layer, and a conductive mesh layer including first conductive lines and second conductive lines arranged on the dielectric layer and intersecting each other. The conductive mesh layer satisfies a predetermined range of transmittance and numerical values related to the interior angle of a mesh unit cell. An antenna element in which moire is suppressed can be manufactured from the conductive mesh structure.

A biosignal sensing electrode that includes: a conductive film containing particles of a layered material including one or plural layers, the one or plural layers includes a layer body represented by: M.sub.mX.sub.n, wherein M is at least one metal of Group 3, 4, 5, 6, or 7, X is a carbon atom, a nitrogen atom, or a combination thereof, n is 1 to 4, m is more than n and 5 or less, and a modifier or terminal T exists on a surface of the layer body, wherein T is at least one selected from a hydroxyl group, a fluorine atom, a chlorine atom, an oxygen atom, or a hydrogen atom; and a porous membrane that contains a hydrophilic polymer, the porous membrane having a first surface in contact with at least part of the conductive film and a second surface defining a contact surface with a subject.

A biosignal sensing electrode that includes: a conductive film containing particles of a layered material including one or plural layers, the one or plural layers includes a layer body represented by: M.sub.mX.sub.n, wherein M is at least one metal of Group 3, 4, 5, 6, or 7, X is a carbon atom, a nitrogen atom, or a combination thereof, n is 1 to 4, m is more than n and 5 or less, and a modifier or terminal T exists on a surface of the layer body, wherein T is at least one selected from a hydroxyl group, a fluorine atom, a chlorine atom, an oxygen atom, or a hydrogen atom; and a porous membrane that contains a hydrophilic polymer, the porous membrane having a first surface in contact with at least part of the conductive film and a second surface defining a contact surface with a subject.

To provide a novel conductive film having two regions differing in the light transmittance, an optoelectronic device having such a conductive film, and a method for producing a conductive film by which such a conductive film can readily be produced.

A conductive film, which has a first region and a second region having a light transmittance higher than the first region,

the conductive film having a first film formed of a conductive material as a material and a resin film formed of a fluorinated polymer as a material,

the first film being disposed to overlap with at least the first region among the first region and the second region,

the resin film being disposed to overlap with the second region, and

the fluorinated polymer satisfying the following (1) and (2):

(1) when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10.sup.−3 Pa, the temperature at which the thermogravimetric loss rate substantially reaches 100% is 400° C. or lower;

(2) when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10.sup.−3 Pa, the temperature width from a temperature at which the thermogravimetric loss rate is 10% to a temperature at which it is 90%, is within 200° C.

To provide a novel conductive film having two regions differing in the light transmittance, an optoelectronic device having such a conductive film, and a method for producing a conductive film by which such a conductive film can readily be produced.

A conductive film, which has a first region and a second region having a light transmittance higher than the first region,

the conductive film having a first film formed of a conductive material as a material and a resin film formed of a fluorinated polymer as a material,

the first film being disposed to overlap with at least the first region among the first region and the second region,

the resin film being disposed to overlap with the second region, and

the fluorinated polymer satisfying the following (1) and (2):

(1) when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10.sup.−3 Pa, the temperature at which the thermogravimetric loss rate substantially reaches 100% is 400° C. or lower;

(2) when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10.sup.−3 Pa, the temperature width from a temperature at which the thermogravimetric loss rate is 10% to a temperature at which it is 90%, is within 200° C.

Electrochromic devices and methods may employ the addition of a defect-mitigating insulating layer which prevents electronically conducting layers and/or electrochromically active layers from contacting layers of the opposite polarity and creating a short circuit in regions where defects form. In some embodiments, an encapsulating layer is provided to encapsulate particles and prevent them from ejecting from the device stack and risking a short circuit when subsequent layers are deposited. The insulating layer may have an electronic resistivity of between about 1 and 10.sup.8 Ohm-cm. In some embodiments, the insulating layer contains one or more of the following metal oxides: aluminum oxide, zinc oxide, tin oxide, silicon aluminum oxide, cerium oxide, tungsten oxide, nickel tungsten oxide, and oxidized indium tin oxide. Carbides, nitrides, oxynitrides, and oxycarbides may also be used.

Electrochromic devices and methods may employ the addition of a defect-mitigating insulating layer which prevents electronically conducting layers and/or electrochromically active layers from contacting layers of the opposite polarity and creating a short circuit in regions where defects form. In some embodiments, an encapsulating layer is provided to encapsulate particles and prevent them from ejecting from the device stack and risking a short circuit when subsequent layers are deposited. The insulating layer may have an electronic resistivity of between about 1 and 10.sup.8 Ohm-cm. In some embodiments, the insulating layer contains one or more of the following metal oxides: aluminum oxide, zinc oxide, tin oxide, silicon aluminum oxide, cerium oxide, tungsten oxide, nickel tungsten oxide, and oxidized indium tin oxide. Carbides, nitrides, oxynitrides, and oxycarbides may also be used.

A transparent film including: a transparent substrate; and a conducting fiber-containing layer that is stacked on at least one main surface of the transparent substrate material and contains conducting fibers substantially evenly dispersed in a plane view and a binder resin. The transparent film has a high resistance part in which an undercoat layer is provided between the transparent substrate material and the conducting fiber-containing layer, and a low resistance part in which the undercoat layer is not provided between the transparent substrate material and the conducting fiber-containing layer. The relationship between a sheet resistance value R.sub.H of the high resistance part and a sheet resistance value R.sub.L of the low resistance part is expressed as R.sub.H/R.sub.L>100. The undercoat layer contains a resin having at least one group or boding part having (—NH—).

A transparent film including: a transparent substrate; and a conducting fiber-containing layer that is stacked on at least one main surface of the transparent substrate material and contains conducting fibers substantially evenly dispersed in a plane view and a binder resin. The transparent film has a high resistance part in which an undercoat layer is provided between the transparent substrate material and the conducting fiber-containing layer, and a low resistance part in which the undercoat layer is not provided between the transparent substrate material and the conducting fiber-containing layer. The relationship between a sheet resistance value R.sub.H of the high resistance part and a sheet resistance value R.sub.L of the low resistance part is expressed as R.sub.H/R.sub.L>100. The undercoat layer contains a resin having at least one group or boding part having (—NH—).

The present disclosure provides an intermittent tape (100) disposed of around a pair of conductors. The intermittent tape (100) has a top dielectric layer (102), a bottom dielectric layer (106) and a conductive layer (104). The conductive layer (104) is sandwiched between the top dielectric layer (102) and the bottom dielectric layer (106). The conductive layer (104) includes conductive segments (108) and non-conductive segments (110). The non-conductive segments (110) are defined by an absence of the conductive segments (108). The conductive segments (108) and the non-conductive segments (110) are arranged alternatingly. A width of the non-conductive segments (110) between the conductive segments (108) is constant.