H01J9/24

Insulator with conductive dissipative coating

Embodiments of the invention provide a conductive coating on an insulator of an x-ray tube and a method for applying the conductive coating. The method may use a first process, such as brazing, to join a support to the insulator and a second process, such as vapor deposition, to apply the conductive coating onto a substrate surface of the insulator. The second process may be carried out after the first process without any damage to x-ray tube insulator assembly.

Insulator with conductive dissipative coating

Embodiments of the invention provide a conductive coating on an insulator of an x-ray tube and a method for applying the conductive coating. The method may use a first process, such as brazing, to join a support to the insulator and a second process, such as vapor deposition, to apply the conductive coating onto a substrate surface of the insulator. The second process may be carried out after the first process without any damage to x-ray tube insulator assembly.

METHOD OF FORMING PLASMA PROCESSING APPARATUS, RELATED APPARATUS, AND METHOD OF FORMING SEMICONDUCTOR DEVICE USING THE SAME

A method of forming a plasma processing apparatus comprises providing a chamber, the chamber including a wall defining an interior, and a viewport extending through the wall. An analysis apparatus connected to the viewport may be formed. The analysis apparatus includes an analyzer adjacent to the chamber, a probe connected to the analyzer and aligned with the viewport, and a first window aligned with the probe, the first window having a first surface, and a second surface at an opposite side relative to the first surface, the second surface being exposed to the interior of the chamber, and the second surface of the first window has a scattering surface.

Two-part high voltage vacuum feed through for an electron tube
09728369 · 2017-08-08 · ·

A high voltage vacuum feed through (23) for an electron tube (25) has an anode (28) and an insulating body (1) of ceramic material, the insulating body (1) having a continuous hollow space (10). The anode (28) has a rear part (2) and a front part (3) mounted thereto. The rear part (2) consists of a first metallic material, having a thermal expansion coefficient corresponding to a thermal expansion coefficient of the ceramic material. The rear part (2) is arranged in the hollow space (10) of the insulating body (1) and is soldered into the insulating body (1) in a vacuum-tight fashion. The front part (3) has a second metallic material whose heat conductivity is larger than that of the first metallic material. The high voltage vacuum feed through reliably remains vacuum-tight during operation and can be easily provided with different target materials.

Two-part high voltage vacuum feed through for an electron tube
09728369 · 2017-08-08 · ·

A high voltage vacuum feed through (23) for an electron tube (25) has an anode (28) and an insulating body (1) of ceramic material, the insulating body (1) having a continuous hollow space (10). The anode (28) has a rear part (2) and a front part (3) mounted thereto. The rear part (2) consists of a first metallic material, having a thermal expansion coefficient corresponding to a thermal expansion coefficient of the ceramic material. The rear part (2) is arranged in the hollow space (10) of the insulating body (1) and is soldered into the insulating body (1) in a vacuum-tight fashion. The front part (3) has a second metallic material whose heat conductivity is larger than that of the first metallic material. The high voltage vacuum feed through reliably remains vacuum-tight during operation and can be easily provided with different target materials.

Lucent waveguide plasma light source
09818597 · 2017-11-14 · ·

A lucent waveguide plasma light source has a quartz waveguide body with a central through bore. The bore has orifices at its opposite ends, opening centrally of flat, end faces of the body. Between these the body has a circular cylindrical periphery. A drawn quartz tube is inserted into the body. The tube has its one end closed and a collar which locates the tube in the bore and is fused to the faces at the orifices of the bore. The tube is evacuated and charged with excitable material and closed as a sealed void. A Faraday cage and an antenna in a bore in the body are provided for feeding microwave energy to the light source. When powered with microwaves, resonance is established in the wave guide and a plasma is established in the void, wherein Light radiates and leaves the waveguide and Faraday cage radially of the periphery.

Heat spreader for plasma display panel

A heat spreader for high volume manufacturing of a heat source, having a heat spreader composition which comprises a heat spreader material, an adhesive thereon, and a release material. The adhesive and release material are selected to prevent delamination of the heat spreader material when the release material is removed during the high volume manufacturing process of heat sources.

INSULATOR WITH CONDUCTIVE DISSIPATIVE COATING
20220139663 · 2022-05-05 ·

Embodiments of the invention provide a conductive coating on an insulator of an x-ray tube and a method for applying the conductive coating. The method may use a first process, such as brazing, to join a support to the insulator and a second process, such as vapor deposition, to apply the conductive coating onto a substrate surface of the insulator. The second process may be carried out after the first process without any damage to x-ray tube insulator assembly.

INSULATOR WITH CONDUCTIVE DISSIPATIVE COATING
20220139663 · 2022-05-05 ·

Embodiments of the invention provide a conductive coating on an insulator of an x-ray tube and a method for applying the conductive coating. The method may use a first process, such as brazing, to join a support to the insulator and a second process, such as vapor deposition, to apply the conductive coating onto a substrate surface of the insulator. The second process may be carried out after the first process without any damage to x-ray tube insulator assembly.

Method of forming plasma processing apparatus, related apparatus, and method of forming semiconductor device using the same

A method of forming a plasma processing apparatus comprises providing a chamber, the chamber including a wall defining an interior, and a viewport extending through the wall. An analysis apparatus connected to the viewport may be formed. The analysis apparatus includes an analyzer adjacent to the chamber, a probe connected to the analyzer and aligned with the viewport, and a first window aligned with the probe, the first window having a first surface, and a second surface at an opposite side relative to the first surface, the second surface being exposed to the interior of the chamber, and the second surface of the first window has a scattering surface.