Patent classifications
H01J9/50
FIELD EMISSION DEVICE AND REFORMING TREATMENT METHOD
Emitter (3) and target (7) are arranged so as to face each other in vacuum chamber (1), and guard electrode (5) is provided at outer circumferential side of electron generating portion (31) of emitter (3). Emitter (3) is supported movably in both end directions of vacuum chamber (1) by emitter supporting unit (4) having movable body (40). To perform regeneration process of guard electrode (5), emitter is moved to no-discharge position by operating emitter supporting unit, and state in which field emission of electron generating portion (31) is suppressed is set, then by applying voltage across guard electrode (5), discharge is repeated. After regeneration process, by operating emitter supporting unit again, emitter is moved to discharge position, and state in which field emission of electron generating portion (31) is possible is set with movement of movable body (40) toward the other end side being restrained by movement restraining unit (6).
FIELD EMISSION DEVICE AND REFORMING TREATMENT METHOD
Emitter (3) and target (7) are arranged so as to face each other in vacuum chamber (1), and guard electrode (5) is provided at outer circumferential side of electron generating portion (31) of emitter (3). Emitter (3) is supported movably in both end directions of vacuum chamber (1) by emitter supporting unit (4) having movable body (40). To perform regeneration process of guard electrode (5), emitter is moved to no-discharge position by operating emitter supporting unit, and state in which field emission of electron generating portion (31) is suppressed is set, then by applying voltage across guard electrode (5), discharge is repeated. After regeneration process, by operating emitter supporting unit again, emitter is moved to discharge position, and state in which field emission of electron generating portion (31) is possible is set with movement of movable body (40) toward the other end side being restrained by movement restraining unit (6).
Process for repairing an anode for emitting x-rays and repaired anode
A process for repairing a damaged annular region of an anode configured to emit x-rays includes the step of machining the damaged annular region made of an initial target coating to a depth smaller than a thickness of the coating so as to leave behind a residual annular layer. An intermediate layer is then deposited on the residual annular layer. A repairing layer is then deposited on the intermediate layer. A heat treatment is then performed using an anneal which causes, by interdiffusion and formation of a solid solution, the material of the intermediate layer and the material of the residual annular layer to diffuse into each other and further cause the material of the intermediate layer and the material of the repairing layer diffuse into each other. As a result of this anneal the intermediate layer disappears.
Process for repairing an anode for emitting x-rays and repaired anode
A process for repairing a damaged annular region of an anode configured to emit x-rays includes the step of machining the damaged annular region made of an initial target coating to a depth smaller than a thickness of the coating so as to leave behind a residual annular layer. An intermediate layer is then deposited on the residual annular layer. A repairing layer is then deposited on the intermediate layer. A heat treatment is then performed using an anneal which causes, by interdiffusion and formation of a solid solution, the material of the intermediate layer and the material of the residual annular layer to diffuse into each other and further cause the material of the intermediate layer and the material of the repairing layer diffuse into each other. As a result of this anneal the intermediate layer disappears.
METHODS, SYSTEMS, AND APPARATUS FOR MONITORING RADIATION OUTPUT OF LAMPS
Embodiments of the present disclosure relates to methods, systems, and apparatus for monitoring radiation output of lamps of processing chambers. In some embodiments, a system contains a plurality of lamps coupled to a chamber, and one or more radiation sensors. Each lamp is identified with one or more zones, the radiation sensors are coupled to the chamber, where each radiation sensor is proximal at least one lamp. A controller contains instructions that, when executed, cause: the radiation sensors to convey, to the controller, information associated with radiation emitted by the lamps; the controller to analyze the information, the analyzing including: for each zone: determining a function of radiation over time; and monitoring the function for a condition associated with lamp aging; and the controller to, based on the analyzing the information, perform at least one of the following: vary input power delivered to the lamps; and generate an alert.
METHODS, SYSTEMS, AND APPARATUS FOR MONITORING RADIATION OUTPUT OF LAMPS
Embodiments of the present disclosure relates to methods, systems, and apparatus for monitoring radiation output of lamps of processing chambers. In some embodiments, a system contains a plurality of lamps coupled to a chamber, and one or more radiation sensors. Each lamp is identified with one or more zones, the radiation sensors are coupled to the chamber, where each radiation sensor is proximal at least one lamp. A controller contains instructions that, when executed, cause: the radiation sensors to convey, to the controller, information associated with radiation emitted by the lamps; the controller to analyze the information, the analyzing including: for each zone: determining a function of radiation over time; and monitoring the function for a condition associated with lamp aging; and the controller to, based on the analyzing the information, perform at least one of the following: vary input power delivered to the lamps; and generate an alert.
ELECTRODE ASSEMBLY FOR A DIELECTRIC BARRIER DISCHARGE PLASMA SOURCE AND METHOD OF MANUFACTURING SUCH AN ELECTRODE ASSEMBLY
An electrode assembly for use in a dielectric barrier discharge plasma source comprises a base metal plate, an enamel layer on a surface of the base metal plate and embedded electrodes embedded in the enamel layer. The electrode assembly may be made by depositing a one or more layers of powdered glass over a surface of the base metal plate, fusing the powdered glass the one or more layers each in a separate heating step for the relevant layer. To form the embedded electrodes, a pattern of electrode material is provided over the powdered glass of the one or more layers after fusing the one or more layers. Subsequently one or more further layers of powdered glass are deposited over the electrodes and the layer(s) below it, and the powdered glass in each of the one or more further layers is fused in a separate heating step.
ELECTRODE ASSEMBLY FOR A DIELECTRIC BARRIER DISCHARGE PLASMA SOURCE AND METHOD OF MANUFACTURING SUCH AN ELECTRODE ASSEMBLY
An electrode assembly for use in a dielectric barrier discharge plasma source comprises a base metal plate, an enamel layer on a surface of the base metal plate and embedded electrodes embedded in the enamel layer. The electrode assembly may be made by depositing a one or more layers of powdered glass over a surface of the base metal plate, fusing the powdered glass the one or more layers each in a separate heating step for the relevant layer. To form the embedded electrodes, a pattern of electrode material is provided over the powdered glass of the one or more layers after fusing the one or more layers. Subsequently one or more further layers of powdered glass are deposited over the electrodes and the layer(s) below it, and the powdered glass in each of the one or more further layers is fused in a separate heating step.
Cold cathode ionization vacuum gauge
A cold cathode ionization vacuum gauge includes an extended anode electrode and a cathode electrode surrounding the anode electrode along its length and forming a discharge space between the anode electrode and the cathode electrode. The vacuum gauge further includes an electrically conductive guard ring electrode interposed between the cathode electrode and the anode electrode about a base of the anode electrode to collect leakage electrical current, and a discharge starter device disposed over and electrically connected with the guard ring electrode, the starter device having a plurality of tips directed toward the anode and forming a gap between the tips and the anode.
Cold cathode ionization vacuum gauge
A cold cathode ionization vacuum gauge includes an extended anode electrode and a cathode electrode surrounding the anode electrode along its length and forming a discharge space between the anode electrode and the cathode electrode. The vacuum gauge further includes an electrically conductive guard ring electrode interposed between the cathode electrode and the anode electrode about a base of the anode electrode to collect leakage electrical current, and a discharge starter device disposed over and electrically connected with the guard ring electrode, the starter device having a plurality of tips directed toward the anode and forming a gap between the tips and the anode.