The present disclosure relates to a system and method for continuously supplying negative ions using multi-pulsed plasma sources. The system includes a plurality of plasma generators each to generate plasma by applying pulsed power to the electronegative gas from a gas source; a negative ion supply unit connected to the plasma generators to receive the plasmas transferred therefrom and to continuously supply ions; and a controller connected to the plurality of plasma generators and configured to control characteristics of the pulsed powers delivered to the respective plasma generators and to adjust phase shift associated with the pulsed power envelopes. By adjusting the phase shift, the controller enables a plasma in one of the plasma generators to be in an after-glow state when a plasma in another plasma generator is in an active-glow state.

Current state-of-the art ion sources do not meet multiple application needs for pulsed ion beams because current designs limit obtaining the needed peak currents, anode current densities, total currents, time averaged currents and lifetime in the same structure. High surface energy, power loading, material erosion and stresses damage surfaces. Our concepts for a ‘cold’ anode structure and ion source will reduce these erosion and damage issues. By extending lifetime and performance characteristics multiple applications can be enabled with lower maintenance and cost. The concepts here reduce the surface aging and provide the high performance (peak current, high current density and long lifetime required.

An ion source for extracting a ribbon ion beam with improved height uniformity is disclosed. Gas nozzles are disposed in the chamber proximate the extraction aperture. The gas that is introduced near the extraction aperture serves to shape the ribbon ion beam as it is being extracted. For example, the height of the ribbon ion beam may be reduced by injecting gas above and below the ion beam so as to compress the extracted ion beam in the height direction. In some embodiments, the feedgas is introduced near the extraction aperture. In other embodiments, a shield gas, such as an inert gas, is introduced near the extraction aperture.

Methods include directing a group of ions through a separation region of an ion manipulation apparatus, separating the group of ions in the separation region based on ion mobility, selecting a subset of the group of ions based on a dependence between ion mobility and ion arrival time of the separated ions at a deposition switch of the ion manipulation apparatus, and depositing the selected subset of ions on a substrate. Related systems and ion manipulation apparatus are disclosed. Also disclosed are methods and system that provide concurrent ion accumulation and ion separation in coupled and switchable electrode regions using traveling wave electric fields.

An ion source is configured to form an ion beam and has an arc chamber enclosing an arc chamber environment. A reservoir apparatus can be configured as a repeller and provides a liquid metal to the arc chamber environment. A biasing power supply electrically biases the reservoir apparatus with respect to the arc chamber to vaporize the liquid metal to form a plasma in the arc chamber environment. The reservoir apparatus has a cup and cap defining a reservoir environment for the liquid metal that is fluidly coupled to the arc chamber environment by holes in the cap. Features extend from the cup into the reservoir and contact the liquid metal to feed the liquid metal toward the arc chamber environment by capillary action. A structure, surface area, roughness, and material modifies the capillary action. The feature can be an annular ring, rod, or tube extending into the liquid metal.

An ion source is configured to form an ion beam and has an arc chamber enclosing an arc chamber environment. A reservoir apparatus can be configured as a repeller and provides a liquid metal to the arc chamber environment. A biasing power supply electrically biases the reservoir apparatus with respect to the arc chamber to vaporize the liquid metal to form a plasma in the arc chamber environment. The reservoir apparatus has a cup and cap defining a reservoir environment for the liquid metal that is fluidly coupled to the arc chamber environment by holes in the cap. Features extend from the cup into the reservoir and contact the liquid metal to feed the liquid metal toward the arc chamber environment by capillary action. A structure, surface area, roughness, and material modifies the capillary action. The feature can be an annular ring, rod, or tube extending into the liquid metal.

An ion generating device includes a high voltage transformer, a discharge electrode connected to a terminal of the high voltage transformer on a secondary side, and an induction electrode that generates ions between the induction electrode and the discharge electrode and is connected to a terminal of the high voltage transformer on the secondary side. A first conductive path includes the terminal and extends from the terminal to the discharge electrode and a second conductive path includes a terminal and the induction electrode. Part of the first conductive path is located in proximity and opposed to part of the second conductive path.

A disturbance magnetic field region provided in an outer peripheral portion of a main magnetic field region of an accelerator has a peeler region in which a strength of a magnetic field decreases toward an outside, a regenerator region in which the strength of the magnetic field increases toward the outside, and a substantially flat region in which the strength of the magnetic field is larger than the strength of the magnetic field of the peeler region and smaller than the strength of the magnetic field of the regenerator region.

Disclosed is a static eliminator having an offset voltage reducing structure capable of improving antistatic performance for a charged body by reducing an ion offset voltage. The present static eliminator comprises a static eliminator body having an air passage through which high-pressure air is supplied, a plurality of discharge structures installed at the lower end of the static eliminator body to supply the high-pressure air passing through the air passage, and generating positive/negative ions by discharging using the applied high voltage, and an offset voltage reduction unit having a plurality of openings formed to allow the positive/negative ions and high-pressure air to pass therethrough, and installed to cover at least some of the plurality of discharge structures.

An ion source for extracting a ribbon ion beam with improved height uniformity is disclosed. Gas nozzles are disposed in the chamber proximate the extraction aperture. The gas that is introduced near the extraction aperture serves to shape the ribbon ion beam as it is being extracted. For example, the height of the ribbon ion beam may be reduced by injecting gas above and below the ion beam so as to compress the extracted ion beam in the height direction. In some embodiments, the feedgas is introduced near the extraction aperture. In other embodiments, a shield gas, such as an inert gas, is introduced near the extraction aperture.