An apparatus for removing static electricity of a semiconductor substrate, which removes static electricity embedded inside a thin film on the semiconductor substrate by emitting vacuum ultraviolet (VUV) light to the semiconductor substrate disposed inside a vacuum chamber. The apparatus includes: a VUV generator disposed at an upper side of the vacuum chamber and provided with a VUV lamp configured to emit small-area VUV light into an inside of the vacuum chamber; and a light diffusion unit disposed below the VUV generator and configured to diffuse incident VUV light into a wide area and output the diffused VUV light to the semiconductor substrate disposed below the light diffusion unit.

The present disclosure provides a skin treatment apparatus, including: a housing provided with a light outlet area; a light-emitting component arranged in the housing; a cold compress component disposed at the light outlet area for cooling the skin; and a heat dissipation component. The light-emitting component is configured to generate light irradiated to a skin to be treated from the light outlet area. The heat dissipation component includes: a fan, a temperature equalizing plate, and a heat dissipation sheet mounted on the temperature equalizing plate. The fan is defined with a first air vent, one end of the temperature equalizing plate is thermally connected to the cold compress component, and the other end of the temperature equalizing plate is located at the first air vent.

An IPL apparatus utilizing a Pulse Forming Network (PFN) for generating a plurality of light pulse sequences, comprising a treatment unit comprising one or more lamps adapted to emit a plurality of light pulses towards a treatment face of the IPL apparatus, a PFN and a control unit adapted to operate the PFN to generate a regulated energized pulse driven to the lamp(s). The regulated energized pulse having a desired multi-level voltage waveform with a maximum voltage level and a minimum voltage level which is in a range of 30-50 percent of the maximum voltage level. Rapidly varying heat is induced by a sequence of the plurality of light pulses emitted by the lamp(s) according to the multi-level voltage waveform.

Provided is an ultraviolet light irradiation device that is capable of causing effective inactivation of microorganisms as well as a method of using the ultraviolet light irradiation device. An ultraviolet light irradiation device includes a light source that radiates ultraviolet light with a wavelength in a range of 190 nm to 235 nm; a housing that houses the light source; an extracting portion that extracts the ultraviolet light that is radiated from the light source and causes it to be directed toward an exterior of the housing; and a diffusing member that diffuses the ultraviolet light.

Apparatuses are disclosed which include a lamp assembly having a germicidal lamp configured to emit ultraviolet light and a base supporting the germicidal lamp. The apparatuses further include a support structure holding operational components for the apparatus and an automated actuator for moving the base and the germicidal lamp relative to the support structure. In addition, the apparatuses include a processor and a storage medium having program instructions which are executable by the processor for activating the automated actuator such that the base and the germicidal lamp are repositioned relative to the support structure while the germicidal lamp is emitting ultraviolet light.

An excimer lamp does not cause a significant decrease in the emission intensity of ultraviolet light and transmission capacity, and that takes into consideration the adverse effect on the human body while securing a sufficient intensity of ultraviolet light. The excimer lamp includes a discharge vessel, a discharge gas sealed in the discharge vessel, and an ultraviolet light transmitting thin film provided on at least an inner surface of the discharge vessel, in which the ultraviolet light transmitting thin film includes first particles that are dispersed in the ultraviolet light transmitting thin film and that scatter ultraviolet light, and second particles that fill voids between the first particles, and an average particle diameter of the first particles is larger than an average particle diameter of the second particles.

An irradiation device includes a housing, reflectors arranged on sides of the housing, an excimer emitter as a UV radiation source, porous sintered metal distributor elements, a chamber acting as a buffer volume, a high-voltage socket, an earth connection, and an emitter head having holes. The excimer emitter has an inner electrode and an outer electrode. The distributor elements are arranged along the excimer emitter. The emitter head is provided as a molded body to accommodate the inner electrode and the outer electrode. The emitter head form-fittingly guides the inner electrode and the outer electrode to the high-voltage socket and/or to the earth connection, and provides a supply of deionized cooling water to an inner cooling channel and to an outer cooling channel via the holes to cool the excimer emitter. A nitrogen flushing takes place via the distributor elements and the chamber.

Apparatuses are disclosed which include a lamp assembly having a germicidal lamp configured to emit ultraviolet light and a base supporting the germicidal lamp. The apparatuses further include a support structure holding operational components for the apparatus and an automated actuator for moving the base and the germicidal lamp relative to the support structure. In addition, the apparatuses include a processor and a storage medium having program instructions which are executable by the processor for activating the automated actuator such that the base and the germicidal lamp are repositioned relative to the support structure while the germicidal lamp is emitting ultraviolet light.

The purpose of the present invention is to provide an irradiation unit and a lamp unit in which the risk of damaging a lamp is reduced due to simplified replacement of the lamp. The present invention includes: a lamp unit on which an excimer lamp is mounted, the excimer lamp having a light-emitting tube that extends in a first direction and a first electrode and a second electrode that are arranged to face each other in a radial direction of the light-emitting tube; and a housing which accommodates the excimer lamp due to the lamp unit being inserted therein, the lamp unit includes a plate material, a restriction member which protrudes from a first main surface and restricts movement of the excimer lamp inside the housing, and a power supply portion that is disposed on a second main surface side of the plate material positioned outside of the housing and that supplies electric power to the excimer lamp when the plate material closes an insertion opening.

A compact LSP broadband light includes a gas containment structure containing a mixture of a first noble gas and a second noble gas, a filter tube positioned within the gas containment structure, an input window, and a pump source. The laser pump source directs an optical pump through the input window to sustain a plasma within the filter tube. The first noble gas absorbs broadband light within a first and a second wavelength band. The filter tube absorbs broadband light having a wavelength below a selected threshold. The absorption of broadband light by the first noble gas and the filter tube provide long-pass filtering to protect one or more downstream optical elements. The gas containment structure includes an output optical window for transmission of filtered broadband light. The gas containment structure includes a gas inlet and outlet for generating a reverse vortex flow pattern within the filter tube.