The invention is directed to a sealed high intensity illumination device configured to receive a laser beam from a laser light source. A sealed chamber is configured to contain an ionizable medium. The chamber includes a reflective chamber interior surface having a first parabolic contour and parabolic focal region, a second parabolic contour and parabolic focal region, and an interface surface. An ingress surface is disposed within the interface surface configured to admit the laser beam into the chamber, and an egress surface disposed within the interface surface configured to emit high intensity light from the chamber. The first parabolic contour is configured to reflect light from the first parabolic focal region to the second parabolic contour, and the second parabolic contour is configured to reflect light from the first parabolic contour to the second parabolic focal region.

A high brightness laser-sustained broadband light source includes a gas containment structure and a pump laser configured to generate a pump beam including illumination of a wavelength at least proximate to a weak absorption line of a neutral gas contained in the gas containment structure. The broadband light source includes one or more anamorphic illumination optics configured to focus the pump beam into an approximately elliptical beam waist positioned in or proximate to the center of the gas containment structure. The broadband light source includes one or more first collection optics configured to collect broadband radiation emitted by the plasma in a direction substantially aligned with a longer axis of the elliptical beam waist.

To provide a light irradiation device using a plurality of flash lamps in which a structure that can emit high intensity light as a whole and enables a flash lamp to be used for a practical lifetime without increasing an input current to each lamp is adopted. A light emission surface is provided on a distal end on a second electrode introducing part side of a light-emitting tube of a flash lamp including a first electrode introducing part and the second electrode introducing part, and a plurality of flash lamps are arranged in a standing manner on a top plate of a processing chamber so that the light emission surface faces the inside of the processing chamber.

An EUV light generation apparatus includes: a chamber; an EUV light condensing mirror positioned inside the chamber and having a reflective surface that determines a first focal point and a second focal point, the reflective surface and the second focal point being positioned on respective sides of a first surface; at least one magnet configured to generate a magnetic field at and around the first focal point; a first gas supply unit configured to supply first gas to the reflective surface in the chamber and opened near an outer peripheral part of the reflective surface; a second gas supply unit configured to supply second gas into the chamber and opened at a position between the first surface and the second focal point; and a discharge device configured to discharge gas inside the chamber and opened at a position between the first focal point and the at least one magnet.

An excimer bulb assembly, with an excimer bulb, at least one integral captured reflector, and an integral filter such that the excimer bulb only emits substantial UV radiation between 200 nm and 230 nm, using a filter that passes light from about 200 nm to 234 nm (+/−2 nm).

An excimer bulb fixture including an excimer bulb emitting a beam of UV light at a far UV C wavelength. The fixture includes a krypton/chloride bulb, a band pass filter and a diffusion layer or lens. The krypton/chloride bulb is adapted to project a beam of far UV C light through the filter and then through the diffusion layer or lens. The band pass filter is adapted to block substantial UV radiation wavelengths longer than 234 nm. The diffusion layer or lens is adapted to widen the beam of far UV C light. A method far widening a beam of far UV C light includes the steps of projecting a beam of far UV C light produced by a krypton/chloride bulb through a band pass filter; blocking substantially UV C radiation longer than 234 nm; projecting the filtered beam through a diffusion filter or lens; and, widening the filtered beam.

Provided is an ultraviolet light irradiation device that is capable of causing effective inactivation of microorganisms as well as a method of using the ultraviolet light irradiation device.

An ultraviolet light irradiation device includes a light source that radiates ultraviolet light with a wavelength in a range of 190 nm to 235 nm; a housing that houses the light source; an extracting portion that extracts the ultraviolet light that is radiated from the light source and causes it to be directed toward an exterior of the housing; and a diffusing member that diffuses the ultraviolet light.

A lighting element with a gaseous tritium light source and an elongated plastic housing that at least partially encloses the gaseous tritium light source with its housing shell and forms a latching element that snaps together with the gaseous tritium light source, which can be inserted into the plastic housing, and holds it in the plastic housing. A rugged lighting element can be produced if the latching element is formed by at least one catch element, which catch element has a radially sprung flexible spring and at least one, preferably two, inwardly oriented snaps with an indentation for snapping together with the gaseous tritium light source.

A laser-sustained broadband light source includes a gas containment structure and multiple jet nozzles. The jet nozzles are configured to direct multiple liquid jets of plasma-forming material in directions to collide with one another within the gas containment structure. The laser-sustained broadband light source further includes a laser pump source configured to generate an optical pump to sustain a plasma in a region of the gas containment structure at a collision point of the plurality of liquid jets and a light collector element configured to collect broadband light emitted from the plasma.

An excimer bulb assembly, with an excimer bulb, at least one integral captured reflector, and an integral filter such that the excimer bulb only emits substantial UV radiation between 200 nm and 230 nm, using a filter that passes light from about 200 nm to 234 nm (+/−2 nm).