An excimer bulb assembly, with an excimer bulb, at least one integral captured reflector, and an integral filter such that the excimer bulb only emits substantial UV radiation between 200 nm and 230 nm, using a filter that passes light from about 200 nm to 234 nm (+/−2 nm).

There is provided a photoreactor for the remediation of gaseous emissions and/or contaminated water using ultraviolet (UV) or vacuum ultraviolet (VUV). There is also provided an emission source for generating UV and/or VUV, the source comprising: a microwave generator; a chamber arranged to receive microwaves generated by the microwave generator, the chamber comprising: a gas comprising species for forming excimers; a resonator arranged to receive the microwaves in the chamber and generate a plasma; a first electrode spaced apart from the resonator; and a voltage source configured to generate an electric field between the resonator and the first electrode, wherein, on application of the electric field, the electric field drives electrons and/or ions from the plasma to generate excimers and produce vacuum ultraviolet or ultraviolet emission. There are also provided methods of generating UV and/or VUV, and methods of remediating fluids.

Multilayer articles are provided, including an absorbent layer and an ultraviolet mirror containing at least a plurality of alternating first and second optical layers. The absorbent layer absorbs ultraviolet light having a wavelength between at least 230 nanometers (nm) and 400 nm. The ultraviolet mirror reflects ultraviolet light in a wavelength range from 190 nm to 240 nm. Systems are also provided including a broadband UVC light source and a multilayer article. Devices are provided including a chamber, a broadband UVC light source located within the chamber, an absorbent layer in the chamber, and an ultraviolet mirror between the light source and absorbent layer. Methods of disinfecting a material are further provided, including obtaining a system or device, directing UVC light at the ultraviolet mirror, and exposing the material to ultraviolet light in a wavelength range from 190 nm to 240 nm, reflected by the ultraviolet mirror towards the material.

An excimer bulb assembly including a krypton/chlorine excimer bulb and a pass filter. The excimer bulb assembly does not emit substantial UV C radiation in wavelengths longer than deadly 240 nm through UV C wavelengths. The pass filter is adapted to block substantial UV C radiation in wavelengths in the range of 240 nm-280 nm. The assembly may include a captured reflector, a smart chip, and/or a heat sink. The bulb and its electrical connectors may form a cartridge. The assembly may include a housing and the cartridge may swivel in the housing.

A can type fixture including a housing adapted for insertion into a hole in a ceiling. An excimer bulb or plurality of excimer bulbs supported in the housing and adapted for emitting Far UV C radiation at a plurality of wavelengths. A filter or a plurality of filters adapted for removing Far UV C wavelengths harmful to humans. A reflector and/or a diffusion layer. A driver/power supply is supported by the housing. The driver/power supply is adapted for providing electrical power to the excimer bulb(s) and is in electrical communication with the excimer bulb(s). The driver/power supply may be adapted to dim the excimer bulb(s). An illumination element, such as an LED array may be supported in the housing. The fixture may also include a motion sensor, crowd density sensor, proximity sensor, and/or distance sensor and may communicate via IoT.

A broadband radiation source is disclosed. The source may include a gas containment vessel configured to maintain a plasma and emit broadband radiation. The source may also include a recirculation gas loop fluidically coupled to the gas containment vessel. The recirculation gas loop may be configured to transport gas from one or more gas boosters configured to pressurize the low-pressure gas into a high-pressure gas and transport the high-pressure gas to the recirculation loop via an outlet. The system includes a pressurized gas reservoir fluidically coupled to the outlet of the one or more gas boosters and is configured to receive and store high pressure gas from the one or more gas boosters. The source includes a pressurized gas reservoir located between the one or more gas boosters and the gas containment vessel and is configured to receive and store high pressure gas from the one or more gas boosters.

An extreme ultraviolet light source apparatus includes a disc-shaped cathode rotating about an axis, a disc-shaped anode rotating about an axis, an energy beam irradiation device irradiating a plasma raw material on the cathode with an energy beam to vaporize the plasma raw material, a power supply for causing a discharge between the cathode and the anode for generating a plasma in the gap between the cathode and the anode to emit extreme ultraviolet light, and an irradiation position adjusting mechanism for adjusting a position at which the cathode is irradiated with the energy beam. The cathode, the anode, and the irradiation position adjusting mechanism are accommodated in a housing. A photography device is disposed outside the housing and is configured to photograph a visible-light image of a vicinity of the cathode and the anode, the vicinity including visible light emitted from the plasma.

A broadband radiation source is disclosed. The source may include a gas containment vessel configured to maintain a plasma and emit broadband radiation. The source may also include a recirculation gas loop fluidically coupled to the gas containment vessel. The recirculation gas loop may be configured to transport gas from one or more gas boosters configured to pressurize the low-pressure gas into a high-pressure gas and transport the high-pressure gas to the recirculation loop via an outlet. The system includes a pressurized gas reservoir fluidically coupled to the outlet of the one or more gas boosters and is configured to receive and store high pressure gas from the one or more gas boosters. The source includes a pressurized gas reservoir located between the one or more gas boosters and the gas containment vessel and is configured to receive and store high pressure gas from the one or more gas boosters.

A product having at least one plasma lamp that includes plates that are approximately parallel, with at least one array of microcavities formed in a surface of at least one plate. When desirable, the plates are separated a fixed distance by spacers with at least one spacer being placed near the plate's edge to form a hermetic seal therewith. A gas makes contact with the microcavity array. Electrodes capable of delivering a time-varying voltage are located such that the application of the time-varying voltage interacts with the gas to form a glow discharge plasma in the microcavities and the fixed volume between the plates. The glow discharge plasma efficiently and uniformly emits radiation that is predominantly in the UV/VUV spectral range with at least a portion of the radiation being emitted from the plasma lamp.

The present invention has as its object the provision of an ultraviolet sterilizer that can reduce ultraviolet light in a wavelength region of 230 to 300 nm, which is harmful to the human body, and can output effective light in a wavelength region of 200 to 230 nm with high emission intensity. The ultraviolet sterilizer of the present invention is an ultraviolet sterilizer comprising: an ultraviolet light source; a lamp storage chamber for storing the ultraviolet light source; and a light guiding part for guiding light from the ultraviolet light source, in which a band pass filter for reducing ultraviolet light in a wavelength region harmful to a human body is provided at least one of a position between the light guiding part and the lamp storage chamber and a position of a light outputting leading end of the light guiding part, and an inner surface of the light guiding part is formed from an ultraviolet absorbing member that absorbs the ultraviolet light in the wavelength region harmful to the human body.