H01J2237/244

PARTICLE BEAM SYSTEM AND METHOD FOR OPERATING A PARTICLE BEAM SYSTEM
20200185185 · 2020-06-11 ·

A particle beam system for examining and processing an object includes an electron beam column and an ion beam column with a common work region, in which an object may be disposed and in which a principal axis of the electron beam column and a principal axis of the ion beam column meet at a coincidence point. The particle beam system further includes a shielding electrode that is disposable between an exit opening of the ion beam column and the coincidence point. The shielding electrode is able to be disposed closer to the coincidence point than the electron beam column.

Atom probe with vacuum differential

In an atom probe having a vacuum chamber containing a specimen mount and a detector for receiving ions emitted from the specimen, a high vacuum subchamber is provided about the specimen mount, with an aperture in the subchamber allowing passage of emitted ions to the detector. The high vacuum subchamber may be pumped to higher vacuum (lower pressure) than the vacuum chamber, and so long as the pressure in the vacuum chamber is below about 10.sup.1 Pa, very little gas diffusion takes place through the aperture, allowing higher vacuum to be maintained in the subchamber despite the aperture opening to the chamber. The higher vacuum in the subchamber about the specimen assists in reducing noise in atom probe image data. The aperture may conveniently be provided by the aperture in a counter electrode, such as a local electrode, as commonly used in atom probes.

Miniature device for ultra high sensitivity and stability probing in vacuum

The present disclosure relates to in situ transmission electron microscope (TEM) holders with improved stability and electrical sensitivity. The holders feature a front bearing seal and a rear bearing seal which allow the holders to achieve high sensitivity, high stability, large range of motion and high vacuum isolation. The bearings use a PEEK insulating disk as a pivot point for translation and tilting motion, and use O-rings to dampen vibrations, provide electrical and vacuum insulation, and to set a grabbing force between the bearing and the probe.

Method of Observing Liquid Specimen, Method of Analyzing Liquid Specimen and Electron Microscope
20190295813 · 2019-09-26 ·

A method of observing a liquid specimen in an electron microscope includes: housing the liquid specimen in a space formed by a specimen stage and a lid member; and observing the liquid specimen, wherein the lid member includes a water retaining material, and a supporting member for supporting the water retaining material, and the water retaining material is provided with a through-hole that enables passage of an electron beam with which the liquid specimen is irradiated.

In situ beam current monitoring and control in scanned ion implantation systems
10395889 · 2019-08-27 · ·

A system and method for controlling an ion implantation system as a function of sampling ion beam current and uniformity thereof. The ion implantation system includes a plurality of ion beam optical elements configured to selectively steer and/or shape the ion beam as it is transported toward a workpiece, wherein the ion beam is sampled at a high frequency to provide a plurality of ion beam current samples, which are then analyzed to detect fluctuations and/or nonuniformities or unpredicted variations amongst the plurality of ion beam current samples. Beam current samples are compared against predetermined threshold levels, and/or predicted nonuniformity levels to generate a control signal when a detected nonuniformity in the plurality of ion beam current density samples exceeds a predetermined threshold. A control system can be configured to generate a control signal for interlocking the ion beam transport in the ion implantation system or for varying an input to at least one beam optical element to control variations in beam current.

Charged particle assessment tool, inspection method
11984295 · 2024-05-14 · ·

A charged particle assessment tool including: an objective lens configured to project a plurality of charged particle beams onto a sample, the objective lens having a sample-facing surface defining a plurality of beam apertures through which respective ones of the charged particle beams are emitted toward the sample; and a plurality of capture electrodes, each capture electrode adjacent a respective one of the beam apertures, configured to capture charged particles emitted from the sample.

Scanning microscope with controlled variable measurement parameters
10338367 · 2019-07-02 · ·

A scanning microscope includes: a charged particle beam source configured to output a charged particle beam to be emitted to a sample; a detector configured to detect charged particles from the sample; and a controller configured to control the charged particle beam source and the detector, wherein the controller changes one or more variable parameters to determine a plurality of different parameter value sets, acquires a measurement result of a temporal change of absorption current in a target sample material under each of the plurality of different parameter value sets, and, based on the measurement results, selects a parameter value set for use in measurement of the target sample from the plurality of different parameter value sets.

MINIATURE DEVICE FOR ULTRA HIGH SENSITIVITY AND STABILITY PROBING IN VACUUM

The present disclosure relates to in situ transmission electron microscope (TEM) holders with improved stability and electrical sensitivity. The holders feature a front bearing seal and a rear bearing seal which allow the holders to achieve high sensitivity, high stability, large range of motion and high vacuum isolation. The bearings use a PEEK insulating disk as a pivot point for translation and tilting motion, and use O-rings to dampen vibrations, provide electrical and vacuum insulation, and to set a grabbing force between the bearing and the probe.

MONITORING SYSTEM, APPARATUS, AND METHOD FOR DETERMINING MAINTENANCE CYCLE OF PROCESSING CHAMBER

Proposed is a system for monitoring internal conditions of a processing chamber. The system includes at least one sensor provided inside the processing chamber and configured to measure an amount of reactant present inside the processing chamber, and a monitoring apparatus configured to monitor the internal conditions of the processing chamber on the basis of a measurement value received from the at least one sensor, wherein the monitoring apparatus determines at least one of a start point and an end point of a cleaning process for the processing chamber on the basis of a change in the measurement value.

SPECIMEN OBSERVATION METHOD
20190051489 · 2019-02-14 ·

A device for observing a specimen, such as a charged particle beam device exemplified by a scanning electron microscope and a transmission electron microscope in which an operator can specify minute bubbles with high contrast in a charged particle beam image of a liquid subjected to processing of generating bubbles, using a phenomenon in which contrast as high as an operator can specify minute bubbles is provided in a charged particle beam image of a specimen including an ionic liquid and a liquid subjected to processing of generating bubbles, thus making it possible to recognize minute bubbles in a liquid.