A visible light photocatalyst coating includes a metal oxide that in the presence of a organic contaminate that absorbs at least some visible light or includes the metal oxide and an auxiliary visible light absorbent, where upon absorption of degradation of the organic contaminate occurs. Contaminates can be microbes, such as bacteria, viruses, or fungi. The metal oxide is nanoparticulate or microparticulate. The metal oxide can be TiO.sub.2. The coating can include an auxiliary dye having an absorbance of light in at least a portion of the visible spectrum. The coating can include a suspending agent, such as NaOH. The visible light photocatalyst coating can cover a surface of a device that is commonly handled or touched, such as a door knob, rail, or counter.

A self-cleaning film system includes a substrate and a film. The film includes a monolayer formed from a fluorinated material, and a first plurality of regions disposed within the monolayer and spaced apart from one another such that each of the regions abuts, is surrounded by, and is not covered by the fluorinated material. Each of the regions includes a photocatalytic material. The system may include a wave guide disposed adjacent the substrate. The wave guide includes a first light source configured for emitting a first portion of electromagnetic radiation towards the film having an ultraviolet wavelength of from 10 nm to 400 nm, and a second light source configured for emitting a second portion of electromagnetic radiation towards the film having an infrared wavelength of from 700 nm to 1 mm. A method of forming a self-cleaning film system configured for reducing a visibility of a contaminant is disclosed.

A self-cleaning film system includes a substrate and a film. The film includes a monolayer formed from a fluorinated material, and a first plurality of regions disposed within the monolayer and spaced apart from one another such that each of the regions abuts, is surrounded by, and is not covered by the fluorinated material. Each of the regions includes a photocatalytic material. The system may include a wave guide disposed adjacent the substrate. The wave guide includes a first light source configured for emitting a first portion of electromagnetic radiation towards the film having an ultraviolet wavelength of from 10 nm to 400 nm, and a second light source configured for emitting a second portion of electromagnetic radiation towards the film having an infrared wavelength of from 700 nm to 1 mm. A method of forming a self-cleaning film system configured for reducing a visibility of a contaminant is disclosed.

A method for preparing a bactericidal film on fiber cloth, comprising cleansing a reel of fiber cloth; placing the reel of fiber cloth into a vacuum chamber; supplying a DC power and a mid-frequency power; introducing argon gas to increase the chamber pressure to 0.3 Pa; position sputtering targets in the following order: silicon target, silicon carbide target, silver target, silicon carbide target, silver target, silicon carbide target and silver target, and then sputtering the targets simultaneously; wherein the silicon targets act as a bonding layer between the bactericidal film and the substrate; stopping the silicon targets, the silicon carbide targets and the silver targets first, and then turning off the argon gas; injecting air into the chamber until the pressure in the chamber and the atmospheric pressure are balanced.

The present disclosure relates to a multilayer fabric media comprising a non-woven membrane of fibers comprising at least one polymer in combination with at least one photoreactive agent mounted on a woven or non-woven substrate and coated with a light transmissible protective layer, to methods of forming such multilayer fabric media, and to articles of manufacture made therewith.

Methods of forming an antiviral facial mask that is capable of not only filtering pathogen particles, but also deactivating pathogen particles prior to exposure by the wearer. Typical facial masks do not deactivate pathogen particles, but rather merely capture viral particles on an outer surface of the mask. As such, the masks present a risk of interaction between the mask wearer and the particles, such as during the removal and/or application of the masks. Methods of forming enhanced antiviral facial masks include the formation of fibers via electrospinning, such that the fibers include a solution of two oppositely charged polyelectrolytes, surfactants, and metal ions. In use, water from human breath activates the surfactants to capture and deactivate pathogen particles. Moreover, the strength of the fibers from the oppositely charged polyelectrolytes results in increased lifespans of the masks, as the masks do not breakdown in the presence of high humidity.

An embodiment provides a method for cleaning a surface, including: encapsulating a cleaning composition in a polymer material to form a compound, wherein the polymer material surrounds the cleaning composition; placing the compound in a location adjacent to the surface, wherein the location adjacent to the surface is a volume separated from an outer volume; dissolving the polymer material at a pH above a target value above the polymer material pH dissolution point, wherein the dissolving releases the cleaning composition; and cleaning the surface using the released cleaning composition. Other aspects are described and claimed.

A surface coating composition may include titanium dioxide optionally combined with copper oxide to permanently bind to any surface to create a long lasting, self-cleaning, deodorizing, and antimicrobial surface, and preparation method thereof. A method of continuous flow process to create anatase TiO.sub.2 crystals with particle sizes ranging from about 0.1 nm to about 200 nm, or further ranging from about 0.1 nm to about 20 nm in size.

A surface coating composition may include titanium dioxide optionally combined with copper oxide to permanently bind to any surface to create a long lasting, self-cleaning, deodorizing, and antimicrobial surface, and preparation method thereof. A method of continuous flow process to create anatase TiO.sub.2 crystals with particle sizes ranging from about 0.1 nm to about 200 nm, or further ranging from about 0.1 nm to about 20 nm in size.

A method may comprise measuring at least one of the conductivity or resistance on a surface of a substrate comprising an antimicrobial system; comparing the measured conductivity or resistance to a reference value; and/or determining a presence or an absence of the antimicrobial system on the surface.