Methods and apparatus to thermally destruct volatile organic compounds are disclosed. An example thermal oxidizer for a furnace includes: an oxidation chamber comprising an inlet configured to receive exhaust gases from a furnace and an outlet configured to output resultant gases; and a plurality of heating elements within the oxidation chamber configured to heat the exhaust gases to oxidize one or more components of the exhaust gases between the inlet and the outlet to result in the resultant gases, the plurality of heating elements comprising resistive heating elements forming coils having respective axes, the plurality of heating elements being oriented within the oxidation chamber such that the axes of the coils are transverse to an exhaust gas flow direction from the inlet to the outlet of the oxidation chamber.

This application is related to a method and construction technology for the implementation of narrowband, digital heat injection technology. More specifically, it relates to techniques for implementations thereof producing engineered irradiation patterns.

This application is related to a method and construction technology for the implementation of narrowband, digital heat injection technology. More specifically, it relates to techniques for implementations thereof producing engineered irradiation patterns.

A microwave oven is provided including a cooking cavity for receiving food to be cooked, at least one microwave source for generating microwave energy inside the cooking cavity, and a supplemental heating system positioned to heat the food. The supplemental heating system includes at least one IR radiation source for generating IR radiation and a metallic mesh screen placed between the at least one IR radiation source and the cooking cavity for spatially distributing the IR radiation to uniformly project into the cooking cavity and minimizing microwave energy field losses. The metallic mesh screen includes a plurality of hexagonal apertures arranged in a honeycomb pattern. The distance between parallel sides of each one of the hexagonal apertures is Ax and the distance between each hexagonal aperture and each adjacent hexagonal aperture is Bx where Ax is less than or equal to about 3 times Bx.

A planar heating apparatus includes a substrate, first electrodes on the substrate, second electrodes alternately arranged with the first electrodes, an electrode connector connecting end portions of the first or second electrodes to each other and a power connector connected to the electrode connector and to which a power supply is connected. The power connector extends outside of the substrate.

A planar heating apparatus includes a substrate, first electrodes on the substrate, second electrodes alternately arranged with the first electrodes, an electrode connector connecting end portions of the first or second electrodes to each other and a power connector connected to the electrode connector and to which a power supply is connected. The power connector extends outside of the substrate.

The invention relates to a dental furnace, in particular a high-temperature dental furnace for oxide ceramics such as zirconium dioxide with sintering temperatures of between 1350° C. and 1650° C., having heating elements (14, 16) which are intended to give off heating energy to a firing chamber (12) in the dental furnace (10). The heating elements (14, 16) are configured as electrical resistance heating elements and supported below the firing chamber (12) each by means of at least one heating element support foot (18). The heating elements (14, 16) extend vertically to the top starting from the heating element support feet (18) and at the top, end in an arch (46), in particular in a semicircular arch or possibly in a pointed arch, without an upper lateral support, in particular not in the region of the arch (46).

The invention relates to a dental furnace, in particular a high-temperature dental furnace for oxide ceramics such as zirconium dioxide with sintering temperatures of between 1350° C. and 1650° C., having heating elements (14, 16) which are intended to give off heating energy to a firing chamber (12) in the dental furnace (10). The heating elements (14, 16) are configured as electrical resistance heating elements and supported below the firing chamber (12) each by means of at least one heating element support foot (18). The heating elements (14, 16) extend vertically to the top starting from the heating element support feet (18) and at the top, end in an arch (46), in particular in a semicircular arch or possibly in a pointed arch, without an upper lateral support, in particular not in the region of the arch (46).

An oven includes a plurality of walls, a fan, and a heating element. The plurality of walls defines an internal cavity in which food may be placed for cooking. A first of the plurality of walls defines a plurality of orifices that establishes fluid communication between the internal cavity and a fluid path. The fan is configured to direct air from the fluid path, through the plurality of orifices, and into the internal cavity. The heating element is disposed on the first of the plurality of walls and adjacent to the plurality of orifices. The heating element is configured to heat the air being directed from the fluid path, through the plurality of orifices, and into the internal cavity.

There is provided a technique capable of shortening a temperature stabilization time in a process chamber by improving a heat insulation performance of a lower portion of the process chamber. A heat insulation structure is arranged in a vicinity of a furnace opening of a heat treatment furnace wherein a temperature gradient is formed at the vicinity of the furnace opening. The heat insulation structure includes a plurality of heat insulation plates with predetermined gaps therebetween. Each heat insulation plate includes a heat shield made of metal; and a seal made of quartz or ceramics and configured to cover a front surface and a rear surface of the heat shield. The heat shield is arranged in a vacuum cavity provided in the seal.