This disclosure relates to a multi-planar heater element for use in a high-speed oven with a new tensioning system. Disclosed subject matter includes a radiative heater for use in a high-speed oven formed from two or more planar heater elements stacked closely to form an effective single element and allowing for extended life through the minimization of concentrated eddy currents in both elements. The disclosure further includes structures to install and remove various planar heating elements without any external tools.

Systems and methods to improve an industrial heater are disclosed. The heater comprises a horizontal cylinder oriented parallel to the ground and may encase an interior recess running the length of the heater. The heater may be divided into a plurality of sections or zones. One or more mid-rings may support the structure of the heater, and may be disposed at the intersections of adjacent sections or zones. A plurality of interior boards and/or insulation layers may line the interior façade, and may be configured to overlap each other and/or interlock together. The interlocking structure may be absent of any gap or space to prevent heat loss from the interior recess. One or more heat strips may be configured in a sinusoidal pattern. The strips may be mirrored on the opposite side of the interior recess, and may be configured to elongate in the direction opposite of gravity.

Systems and methods to improve an industrial heater are disclosed. The heater comprises a horizontal cylinder oriented parallel to the ground and may encase an interior recess running the length of the heater. The heater may be divided into a plurality of sections or zones. One or more mid-rings may support the structure of the heater, and may be disposed at the intersections of adjacent sections or zones. A plurality of interior boards and/or insulation layers may line the interior façade, and may be configured to overlap each other and/or interlock together. The interlocking structure may be absent of any gap or space to prevent heat loss from the interior recess. One or more heat strips may be configured in a sinusoidal pattern. The strips may be mirrored on the opposite side of the interior recess, and may be configured to elongate in the direction opposite of gravity.

Embodiments of the present disclosure relate to bake apparatuses for handling and uniform baking of substrates and methods for the handling and the uniform baking of substrates. The bake apparatuses allow the substrates to be heated to a temperature greater than 50° C. without bowing of about 1 mm to about 2 mm from the edge of the substrates to the center of the substrates. The bake apparatuses heat the substrates uniformly or substantially uniformly to improve substrate quality.

Embodiments of the present disclosure relate to bake apparatuses for handling and uniform baking of substrates and methods for the handling and the uniform baking of substrates. The bake apparatuses allow the substrates to be heated to a temperature greater than 50° C. without bowing of about 1 mm to about 2 mm from the edge of the substrates to the center of the substrates. The bake apparatuses heat the substrates uniformly or substantially uniformly to improve substrate quality.

A heating chamber (1) for a heating furnace is proposed, with which electrothermal vaporization of impurities from samples can be effected in order to be able to then analyze them spectrometrically. The heating chamber has a wall (3), a sample reception area (5), a nozzle area (7) and two electrical connection areas (9, 11). The heating chamber (1) is specially configured such that an electric current flows through the wall (3) in such a way that a heating capacity caused by it is higher in the nozzle area (7) than in the sample reception area (5). For example, the electrical connection areas (9, 11) may be arranged in a radial direction remoter from the longitudinal axis (8) than a part of the wall (3) surrounding the nozzle area (7), and the heating chamber (1) may be configured, for example by means of a locally constricted area (13), in such a way that the current between the two electrical connection areas (9, 11) is predominantly conducted radially inwards towards the part of the wall (3) surrounding the nozzle area (7). Advantageous heat distribution in the heating chamber (1) achievable thereby may have a positive effect on the analysis of sample impurities.

A heating chamber (1) for a heating furnace is proposed, with which electrothermal vaporization of impurities from samples can be effected in order to be able to then analyze them spectrometrically. The heating chamber has a wall (3), a sample reception area (5), a nozzle area (7) and two electrical connection areas (9, 11). The heating chamber (1) is specially configured such that an electric current flows through the wall (3) in such a way that a heating capacity caused by it is higher in the nozzle area (7) than in the sample reception area (5). For example, the electrical connection areas (9, 11) may be arranged in a radial direction remoter from the longitudinal axis (8) than a part of the wall (3) surrounding the nozzle area (7), and the heating chamber (1) may be configured, for example by means of a locally constricted area (13), in such a way that the current between the two electrical connection areas (9, 11) is predominantly conducted radially inwards towards the part of the wall (3) surrounding the nozzle area (7). Advantageous heat distribution in the heating chamber (1) achievable thereby may have a positive effect on the analysis of sample impurities.

Discussed are a surface type heating element which generates heat using electricity and a method of manufacturing the surface type heating element. The surface type heating element includes: a substrate; a buffer layer disposed on the substrate, the buffer layer having a thermal expansion coefficient of about 50*10.sup.7 to about 100)*10.sup.7 m/ C.; and a surface type heating element layer disposed on the buffer layer and including a NiCr alloy, and thus it can be used even at a high operating temperature of about 450 C. or more, suppresses the elution of the material itself, and allows thermal stress caused by a difference in coefficient of thermal expansion between the surface type heating element layer and the substrate to be reduced while having high fracture toughness, a low coefficient of thermal expansion, and heat resistance.

A heat chamber apparatus comprises a base assembly, a lid assembly operably installed on the base assembly, and a rack assembly and heater assembly incorporated in the base and/or lid assemblies, the base and lid assemblies being optionally telescopically engaged for selectively adjusting the interior space of the heat chamber, and the rack assembly separating the interior space into first and second sub-chambers and being optionally pivotable for selectively accessing the sub-chambers.

A far-infrared radiation multi-stage type heating furnace for steel sheets for hot stamping, the furnace including far-infrared radiation heaters having flexibility that are prevented from deflecting even during heating at temperatures ranging from the Ac.sub.3 transformation temperature to 950 C. The furnace includes: multiple-staged heating units that accommodate steel sheets, each heating unit formed by thermal insulation materials disposed around the periphery; and far-infrared radiation heaters positioned above and below the heating units. A far-infrared radiation heater is received by first metal strips. The first metal strips are disposed so that their strong axis direction approximately corresponds to the direction of gravity and supported by support pieces so as to be expandable and contractible in a longitudinal direction by thermal expansion or thermal contraction. The support pieces are disposed outside the thermal insulation materials in the heating units and a ceiling unit.