Embodiments described herein generally relate to plasma assisted or plasma enhanced processing chambers. More specifically, embodiments herein relate to electrostatic chucking (ESC) substrate supports configured to provide pulsed DC voltage, and methods of applying a pulsed DC voltage, to a substrate during plasma assisted or plasma enhanced semiconductor manufacturing processes.

This invention concerns power supplies suitable for electric arc gas heaters such a plasma torches. It more particularly relates to the dimensioning of the inductor in the switched-mode DC to DC converter used for feeding the torch. The invention concerns in particular a DC power supply for driving a non-transferred electric arc gas heater, comprising: an AC to DC rectifier providing a potential U.sub.0; a DC to DC switching converter having a switching frequency f.sub.S; a current control loop having a latency Formula (I); and, a ballast inductor having an inductance L; characterized in that inductance L is such that Formula (II) and Formula (III). Such a design ensures the stability of the current control loop, while also ensuring a sufficient amount of current ripple to spread out the erosion zone on the electrodes of the torch. $\begin{array}{cc};& \left(I\right)\\ L>\left(\frac{U_0}{1500}\right),& \left(\mathrm{II}\right)\\ L<\frac{1}{f_s}\left(\frac{U_0}{200}\right).& \left(\mathrm{III}\right)\end{array}$

A control device for an arc furnace includes an arc furnace control module for controlling the arc furnace and a flicker module for determining a flicker value in a grid supplying the arc furnace, wherein the arc furnace control module is adapted for controlling the arc furnace based on the flicker value and wherein the arc furnace control module and the flicker module are integrated into one structural component.

A control device for an arc furnace includes an arc furnace control module for controlling the arc furnace and a flicker module for determining a flicker value in a grid supplying the arc furnace, wherein the arc furnace control module is adapted for controlling the arc furnace based on the flicker value and wherein the arc furnace control module and the flicker module are integrated into one structural component.

An apparatus for the gasification and vitrification of waste comprises a plasma arc furnace provided with two movable graphite electrodes. The furnace includes an air-cooled bottom electrode adapted for transferring the current through a slag melt. The furnace is entirely sealed and is also provided with gas tight electrode seals adapted to control reducing conditions inside the furnace. An electrical circuit is further provided, which is adapted for switching from transferred io non-transferred modes of heating, thereby allowing the furnace to be restarted in case of slag freezing.

An apparatus for the gasification and vitrification of waste comprises a plasma arc furnace provided with two movable graphite electrodes. The furnace includes an air-cooled bottom electrode adapted for transferring the current through a slag melt. The furnace is entirely sealed and is also provided with gas tight electrode seals adapted to control reducing conditions inside the furnace. An electrical circuit is further provided, which is adapted for switching from transferred io non-transferred modes of heating, thereby allowing the furnace to be restarted in case of slag freezing.

Rapid plasma nitriding is achieved by harnessing the power and increased density of plasma discharges created by hollow cathodes. When opposing surfaces are maintained at the proper voltage, sub atmospheric pressure, and spacing, a phenomenon known as the hollow cathode effect creates additional hot oscillating electrons capable of multiple ionization events thereby increasing the number of ions and electrons per unit volume (plasma density). The present invention describes the harnessing of this phenomenon to rapidly plasma nitride metal surfaces and optionally rapidly deposit functional coatings in a continuous operation for duplex coatings.

Systems and methods for controlling a plasma edge region are described. One of the systems includes a top electrode and a bottom electrode. The system also includes an upper electrode extension and a lower electrode extension. At least a portion of the plasma edge region is formed between the upper electrode extension and the lower electrode extension. The system includes a circuit to control a radio frequency signal at the upper electrode extension.

Systems and methods for controlling a plasma edge region are described. One of the systems includes a top electrode and a bottom electrode. The system also includes an upper electrode extension and a lower electrode extension. At least a portion of the plasma edge region is formed between the upper electrode extension and the lower electrode extension. The system includes a circuit to control a radio frequency signal at the upper electrode extension.

An apparatus 300 for simulating a pulsed pressure induced cavitation technique (PPCT) from a pressurized working fluid (F) provides laboratory research and development for enhanced geothermal systems (EGS), oil, and gas wells. A pump 304 is configured to deliver a pressurized working fluid (F) to a control valve 306, which produces a pulsed pressure wave in a test chamber 308. The pulsed pressure wave parameters are defined by the pump 304 pressure and control valve 306 cycle rate. When a working fluid (F) and a rock specimen 312 are included in the apparatus, the pulsed pressure wave causes cavitation to occur at the surface of the specimen 312, thus initiating an extensive network of fracturing surfaces and micro fissures, which are examined by researchers.