Patent classifications
H05F3/06
ION-BAR STRUCTURE WITH SELF-CLEANING FUNCTION
The present disclosure provides an ion-bar structure with a self-cleaning function including an ion-bar body, a slide assembly, and a brush assembly. The ion-bar body has a slide track disposed along its own axis. The slide assembly is movably disposed on the slide track. The brush assembly is connected to the slide assembly for moving with the slide assembly. The brush assembly is contacted with a bottom side of the ion-bar body.
ION-BAR STRUCTURE WITH SELF-CLEANING FUNCTION
The present disclosure provides an ion-bar structure with a self-cleaning function including an ion-bar body, a slide assembly, and a brush assembly. The ion-bar body has a slide track disposed along its own axis. The slide assembly is movably disposed on the slide track. The brush assembly is connected to the slide assembly for moving with the slide assembly. The brush assembly is contacted with a bottom side of the ion-bar body.
Static eliminator and droplet ejection system
Provided is a static eliminator that efficiently eliminates static electricity from a tray of a droplet ejection device of a tray transport type. A static eliminator 20 includes a movable part 22 which is pushed by a tray 12 due to movement of the tray 12 and moves, and an ion generator 24 disposed on a movement path of the tray 12 and configured to generate ions according to the movement of the movable part 22.
Static eliminator and droplet ejection system
Provided is a static eliminator that efficiently eliminates static electricity from a tray of a droplet ejection device of a tray transport type. A static eliminator 20 includes a movable part 22 which is pushed by a tray 12 due to movement of the tray 12 and moves, and an ion generator 24 disposed on a movement path of the tray 12 and configured to generate ions according to the movement of the movable part 22.
Systems and methods for monitoring electrostatic buildup for an attraction system
An attraction system of an amusement park includes a sensor configured to monitor electrostatic buildup associated with the attraction system and a control system communicatively coupled to the sensor. The control system is configured to receive data from the sensor, the data being indicative of an amount of the electrostatic buildup associated with the attraction system, and operate the attraction system based on the data indicative of the amount of the electrostatic buildup associated with the attraction system.
Systems and methods for monitoring electrostatic buildup for an attraction system
An attraction system of an amusement park includes a sensor configured to monitor electrostatic buildup associated with the attraction system and a control system communicatively coupled to the sensor. The control system is configured to receive data from the sensor, the data being indicative of an amount of the electrostatic buildup associated with the attraction system, and operate the attraction system based on the data indicative of the amount of the electrostatic buildup associated with the attraction system.
STATIC ELIMINATOR HAVING OFFSET VOLTAGE REDUCTION UNIT
Disclosed is a static eliminator having an offset voltage reducing structure capable of improving antistatic performance for a charged body by reducing an ion offset voltage. The present static eliminator comprises a static eliminator body having an air passage through which high-pressure air is supplied, a plurality of discharge structures installed at the lower end of the static eliminator body to supply the high-pressure air passing through the air passage, and generating positive/negative ions by discharging using the applied high voltage, and an offset voltage reduction unit having a plurality of openings formed to allow the positive/negative ions and high-pressure air to pass therethrough, and installed to cover at least some of the plurality of discharge structures.
SYSTEM AND METHOD FOR DISSIPATING WORKPIECE CHARGE BUILD UP
A system and method for reducing charge on a workpiece disposed on a platen is disclosed. The system includes an ionizer to generate ionized gas from the source of backside gas. The ionizer may be used to introduce ionized gas into the backside gas channels of the platen. A controller is used to selectively allow backside gas and/or ionized gas into the backside gas channels. In certain embodiments, the platen also includes an exhaust channel in communication with an exhaust valve to ensure that the pressure within the volume between the top surface of the platen and the workpiece is maintained in a desired range. In one embodiment, the system includes a valving system in communication with the source of backside gas and also in communication with the ionizer. In another embodiment, the amount of ionization performed by the ionizer is programmable.
SYSTEM AND METHOD FOR DISSIPATING WORKPIECE CHARGE BUILD UP
A system and method for reducing charge on a workpiece disposed on a platen is disclosed. The system includes an ionizer to generate ionized gas from the source of backside gas. The ionizer may be used to introduce ionized gas into the backside gas channels of the platen. A controller is used to selectively allow backside gas and/or ionized gas into the backside gas channels. In certain embodiments, the platen also includes an exhaust channel in communication with an exhaust valve to ensure that the pressure within the volume between the top surface of the platen and the workpiece is maintained in a desired range. In one embodiment, the system includes a valving system in communication with the source of backside gas and also in communication with the ionizer. In another embodiment, the amount of ionization performed by the ionizer is programmable.
Substrate processing apparatus and substrate processing method
In a substrate processing apparatus, neutralization processing is performed on a substrate by a neutralization device provided in a thermal processing section. In the neutralization device, at least one of a holder that holds the substrate and an emitter that emits vacuum ultraviolet rays is moved relative to another one in one direction. At this time, one surface of the substrate is irradiated with the vacuum ultraviolet rays emitted by the emitter. When the entire one surface of the substrate is irradiated with the vacuum ultraviolet rays, the neutralization processing ends. Thereafter, the substrate on which the neutralization processing has been performed is transported to a coating processing unit in a coating processing section. In the coating processing unit, a film of a processing liquid is formed on the one surface of the substrate on which the neutralization processing has been performed.