Multiple reacting systems for performing and harvesting thermal energy from a fusion reaction. The reacting systems each including a reactor. One reacting system includes a smaller inner core and larger outer core, and compression devices configured to compress liquid metal in the outer and inner core. Another reacting system contains an empty core with compression devises configured to shoot liquid metal into the empty core. In both reacting systems, charged plasma is fired into the innermost core, and heated liquid metal is used to compress the plasma within the innermost core. A fusion reaction occurs when the liquid metal compresses the plasma in the innermost core, producing thermal energy.

Plasma which is supplied from a supply passage (1) is accelerated with a Hall electric field (E) which is generated through interaction of electrons (e.sup.) emitted from a cathode (3), a radial direction magnetic field (Bd), and an electric field (Ex).

Plasma which is supplied from a supply passage (1) is accelerated with a Hall electric field (E) which is generated through interaction of electrons (e.sup.) emitted from a cathode (3), a radial direction magnetic field (Bd), and an electric field (Ex).

Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. A surface floating potential of a substrate placed atop a stage in a positive column of the DC plasma is adjusted and maintained to a reference potential. A periodic biasing signal referenced to the reference potential is capacitively coupled to the stage to control a surface potential at the substrate according to: an active phase for provision of kinetic energy to free electrons in the DC plasma for activation of targeted bonds at the surface of the substrate; a neutralization phase for repelling of the free electrons from the surface of the substrate; and an initialization phase for restoring an initial condition of the surface floating potential.

Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. A surface floating potential of a substrate placed atop a stage in a positive column of the DC plasma is adjusted and maintained to a reference potential. A periodic biasing signal referenced to the reference potential is capacitively coupled to the stage to control a surface potential at the substrate according to: an active phase for provision of kinetic energy to free electrons in the DC plasma for activation of targeted bonds at the surface of the substrate; a neutralization phase for repelling of the free electrons from the surface of the substrate; and an initialization phase for restoring an initial condition of the surface floating potential.

The invention provides a plasma production and control device that may be used in propulsion (e.g., satellite propulsion) and/or industrial applications. The plasma production system comprises a unidirectional magnetic field.

An apparatus is provided for generating accelerated electrons, including a housing; an inlet for supplying a working gas; at least one first cathode; and at least one first anode, between which a corona discharge plasma can be generated. Ions from the corona discharge plasma can be accelerated onto the surface of a second cathode. Electrons emitted by the second cathode can be accelerated in the direction of the electron exit window by means of a second electric voltage applied between the second cathode and a second anode. The housing, the second cathode, and the electron exit window are ring-shaped. The ring-shaped space is divided into ring segments. Each ring segment has at least one wire-shaped electrode, which extends through the ring segment. At least one separate power supply device is associated with each ring segment, by means of which the strength of the electrical current is adjustable.

An apparatus is provided for generating accelerated electrons, including a housing; an inlet for supplying a working gas; at least one first cathode; and at least one first anode, between which a corona discharge plasma can be generated. Ions from the corona discharge plasma can be accelerated onto the surface of a second cathode. Electrons emitted by the second cathode can be accelerated in the direction of the electron exit window by means of a second electric voltage applied between the second cathode and a second anode. The housing, the second cathode, and the electron exit window are ring-shaped. The ring-shaped space is divided into ring segments. Each ring segment has at least one wire-shaped electrode, which extends through the ring segment. At least one separate power supply device is associated with each ring segment, by means of which the strength of the electrical current is adjustable.

The present technology is directed to plasma systems and associated methods, including propulsion systems for flight vehicles. A representative system includes a plurality of coils. The coils include a first coil positioned along a force axis, a second coil positioned along the force axis and spaced apart from the first coil, and a third coil that is magnetically shielded. A controller is operatively coupled to the coils and is configured to (a) increase energy to the first coil to generate a magnetic field in a portion of the plasma adjacent to the first coil, (b) decrease energy to the first coil and increase energy to the second coil to translate the resulting superposed magnetic field through the plasma to a position adjacent the second coil, and (c) transfer energy from the second coil to the third coil and decrease energy to the second coil to reduce the magnetic field in the plasma.

Provided herein are high energy ion beam generator systems and methods that provide low cost, high performance, robust, consistent, uniform, low gas consumption and high current/high-moderate voltage generation of neutrons and protons. Such systems and methods find use for the commercial-scale generation of neutrons and protons for a wide variety of research, medical, security, and industrial processes.