Methods and systems are provided for plasma confinement utilizing various electrode and valve configurations. In one example, a device includes a first electrode positioned to define an outer boundary of an acceleration volume, a second electrode arranged coaxially with respect to the first electrode and positioned to define an inner boundary of the acceleration volume, at least one power supply to drive an electric current along a Z-pinch plasma column between the first second electrodes, and a set of valves to provide gas to the acceleration volume to fuel the Z-pinch plasma column, wherein an electron flow of the electric current is in a first direction from the second electrode to the first electrode. In additional or alternative examples, a shaping part is conductively connected to the second electrode to, in a presence of the gas, cause a gas breakdown of the gas to generate a sheared flow velocity profile.

Methods and systems are provided for plasma confinement utilizing various electrode and valve configurations. In one example, a device includes a first electrode positioned to define an outer boundary of an acceleration volume, a second electrode arranged coaxially with respect to the first electrode and positioned to define an inner boundary of the acceleration volume, at least one power supply to drive an electric current along a Z-pinch plasma column between the first second electrodes, and a set of valves to provide gas to the acceleration volume to fuel the Z-pinch plasma column, wherein an electron flow of the electric current is in a first direction from the second electrode to the first electrode. In additional or alternative examples, a shaping part is conductively connected to the second electrode to, in a presence of the gas, cause a gas breakdown of the gas to generate a sheared flow velocity profile.

A method and system for stably generating and accelerating magnetized plasma comprises ionizing an injected gas in plasma generator and generating a formation magnetic field to form a magnetized plasma with a closed poloidal field, generating a reverse poloidal field behind the magnetized plasma and having a same field direction as a back edge of the closed poloidal field and having an opposite field direction of the formation magnetic field, and generating a pushing toroidal field that pushes the reverse poloidal field against the closed poloidal field, thereby accelerating the magnetized plasma through a plasma accelerator downstream from the plasma generator. The reverse poloidal field serves to prevent the reconnection of the formation magnetic field and closed poloidal field after the magnetized plasma is formed, which would allow the pushing toroidal field to mix with the closed poloidal field and cause instability and reduced plasma confinement.

A method and system for stably generating and accelerating magnetized plasma comprises ionizing an injected gas in plasma generator and generating a formation magnetic field to form a magnetized plasma with a closed poloidal field, generating a reverse poloidal field behind the magnetized plasma and having a same field direction as a back edge of the closed poloidal field and having an opposite field direction of the formation magnetic field, and generating a pushing toroidal field that pushes the reverse poloidal field against the closed poloidal field, thereby accelerating the magnetized plasma through a plasma accelerator downstream from the plasma generator. The reverse poloidal field serves to prevent the reconnection of the formation magnetic field and closed poloidal field after the magnetized plasma is formed, which would allow the pushing toroidal field to mix with the closed poloidal field and cause instability and reduced plasma confinement.

A micro-cathode arc propulsion system. By replacing an inductive circuit in a traditional micro-cathode arc propulsion system with a capacitor circuit, the stability of the operation of a micro-cathode arc thruster can be improved due to the stable discharging mode of the capacitor, and as the internal resistance of the capacitor is small during operation, the additional power consumption of the circuit is reduced, and the efficiency of the system is improved. In addition, as a pulse power supply is used to power in a pulse manner, the average power inputted into the micro-cathode arc thruster is greatly reduced.

A method and apparatus for processing a particle shower using a laser-driven plasma is provided. The method comprises interacting a particle shower with a processing laser-driven plasma stage, the particle shower comprising at least one particle species, wherein the laser is a high-energy, ultra-short pulse laser. In some embodiments, the method comprises accelerating, decelerating, trapping, or collimating the at least one particle species in the processing laser-drive plasma stage. Particularly, the embodiments enable generating high energy particle beams that were only possible using accelerators spanning several hundred meters, in a space of a few meters.

A method and apparatus for processing a particle shower using a laser-driven plasma is provided. The method comprises interacting a particle shower with a processing laser-driven plasma stage, the particle shower comprising at least one particle species, wherein the laser is a high-energy, ultra-short pulse laser. In some embodiments, the method comprises accelerating, decelerating, trapping, or collimating the at least one particle species in the processing laser-drive plasma stage. Particularly, the embodiments enable generating high energy particle beams that were only possible using accelerators spanning several hundred meters, in a space of a few meters.

Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. A surface floating potential of a substrate placed atop a stage in a positive column of the DC plasma is adjusted and maintained to a reference potential. A periodic biasing signal referenced to the reference potential is capacitively coupled to the stage to control a surface potential at the substrate according to: an active phase for provision of kinetic energy to free electrons in the DC plasma for activation of targeted bonds at the surface of the substrate; a neutralization phase for repelling of the free electrons from the surface of the substrate; and an initialization phase for restoring an initial condition of the surface floating potential.

A system includes a core, a plurality of tubes, a plurality of gates, and a plurality of compressors. The core defines a plurality of openings. The plurality of tubes extend radially outward from the core. Each tube of the plurality of tubes includes (i) a first end interfacing with one of the plurality of openings and (ii) an opposing second end. Each gate of the plurality of gates is positioned at a respective opening of the plurality of openings of the core such that the plurality of gates are positioned to selectively prevent a backflow of liquid from the core through the plurality of openings and the first end of the plurality of tubes into the plurality of tubes. Each compressor of the plurality of compressors is associated with a respective tube of the plurality of tubes and is positioned at the opposing second end of the respective tube.

Electroaerodynamic devices and their methods of operation are disclosed. In one embodiment, ions are formed by dielectric barrier discharge using a time varying voltage differential applied between a first electrode and a second electrode. The ions are then accelerated in a downstream direction using a second voltage differential applied between a third electrode and the first and/or second electrodes, where the third electrode is located down stream from the first and second electrodes. The ions may then collide with naturally charged molecules and/or atoms within a fluid to accelerate the fluid in the downstream to create an ionic wind and an associated thrust.