An EUV light generator including the following components: A. an electron storage ring including a first linear section and a second linear section; B. an electron supplier configured to supply the electron storage ring with an electron bunch; C. a high-frequency acceleration cavity disposed in the first linear section and configured to accelerate the electron bunch in such a way that a length Lez of the electron bunch satisfies 0.09 mLez3 m; and D. an undulator disposed in the second linear section and configured to output EUV light when the electron bunch enters the undulator.

An EUV light generator including the following components: A. an electron storage ring including a first linear section and a second linear section; B. an electron supplier configured to supply the electron storage ring with an electron bunch; C. a high-frequency acceleration cavity disposed in the first linear section and configured to accelerate the electron bunch in such a way that a length Lez of the electron bunch satisfies 0.09 mLez3 m; and D. an undulator disposed in the second linear section and configured to output EUV light when the electron bunch enters the undulator.

An electron beam transport system for controlling the position of two different electron beams comprises: a main electron beam transport module; a first input electron beam transport module; a second input electron beam transport module; and a controller. The main electron beam transport module comprises a beam monitoring device disposed at a measurement position. The first input electron beam transport module comprises a first actuator for applying a perturbation to a transverse position of a first electron beam at a first actuation point. The second input electron beam transport module comprises a second actuator for applying a perturbation to a transverse position of a second electron beam at a second actuation point. The controller is operable to receive a signal from the beam monitoring device and to send control signals to the first actuator and the second actuator. The controller is operable to determine a first quantity indicative of a difference in a transverse position of the first and second electron beams and a second quantity indicative of an average transverse position of the first and second electron beams. The controller is further operable to control the trajectories of the first and second electron beams independently by implementing a first control loop that iteratively attempts to reduce the first quantity by using the first actuator to perturb a trajectory of the first electron beam, and a second control loop that iteratively perturbs a trajectory of the second electron beam using the second actuator such that the average transverse position of the two different electron beams moves towards a desired transverse position.

An electron beam transport system for controlling the position of two different electron beams comprises: a main electron beam transport module; a first input electron beam transport module; a second input electron beam transport module; and a controller. The main electron beam transport module comprises a beam monitoring device disposed at a measurement position. The first input electron beam transport module comprises a first actuator for applying a perturbation to a transverse position of a first electron beam at a first actuation point. The second input electron beam transport module comprises a second actuator for applying a perturbation to a transverse position of a second electron beam at a second actuation point. The controller is operable to receive a signal from the beam monitoring device and to send control signals to the first actuator and the second actuator. The controller is operable to determine a first quantity indicative of a difference in a transverse position of the first and second electron beams and a second quantity indicative of an average transverse position of the first and second electron beams. The controller is further operable to control the trajectories of the first and second electron beams independently by implementing a first control loop that iteratively attempts to reduce the first quantity by using the first actuator to perturb a trajectory of the first electron beam, and a second control loop that iteratively perturbs a trajectory of the second electron beam using the second actuator such that the average transverse position of the two different electron beams moves towards a desired transverse position.

An apparatus for guiding, in particular directing or accelerating, charged particles (50), comprising: a substrate (110) having a surface (115); an optically thinner layer (120) formed on the surface (115); an inhomogeneous channel (130) which is formed by two mutually opposite delimiting structures on a side of the layer (120) that is opposite the substrate (110); and a radiation device which is designed to generate at least one pulsed laser beam (140) and inject the at least one pulsed laser beam (140) into the channel (130) from a side that is opposite the optically thinner layer (120). The layer (120) for the laser beam (140) is optically thin, and the delimiting structures have a high optical density in comparison with the layer (120). The delimiting structures are designed to guide the particles (50) by means of the laser beam (140) in the channel (130) and alternatingly focus them along the channel (130) and in at least one direction perpendicular to the channel (130).

An apparatus for guiding, in particular directing or accelerating, charged particles (50), comprising: a substrate (110) having a surface (115); an optically thinner layer (120) formed on the surface (115); an inhomogeneous channel (130) which is formed by two mutually opposite delimiting structures on a side of the layer (120) that is opposite the substrate (110); and a radiation device which is designed to generate at least one pulsed laser beam (140) and inject the at least one pulsed laser beam (140) into the channel (130) from a side that is opposite the optically thinner layer (120). The layer (120) for the laser beam (140) is optically thin, and the delimiting structures have a high optical density in comparison with the layer (120). The delimiting structures are designed to guide the particles (50) by means of the laser beam (140) in the channel (130) and alternatingly focus them along the channel (130) and in at least one direction perpendicular to the channel (130).

A compact, small foot print, light source based on electron beam acceleration for insertion devices in EUV range metrology and actinic mask inspection using coherent scattering methods includes spiral storage rings providing plane straight sections. A magnet structure generates emittance for brilliance and coherent light content. A booster feeds the storage ring by top-up injection and keeps electron beam intensity stable. A booster level below the storage ring receives the electron beam from a linear accelerator in a central booster area. The source fits into laboratories or maintenance areas. Injection, RF-acceleration, beam manipulating devices and large diagnostics systems are required once. Higher average currents stored in the spiral enhance central cone power. Bunches are limited by ion trapping and a gap clears ions. The current is increased in the spiral. Gain in central cone power increases 5 fold, assuming a gap size of half single storage ring circumference.

A compact, small foot print, light source based on electron beam acceleration for insertion devices in EUV range metrology and actinic mask inspection using coherent scattering methods includes spiral storage rings providing plane straight sections. A magnet structure generates emittance for brilliance and coherent light content. A booster feeds the storage ring by top-up injection and keeps electron beam intensity stable. A booster level below the storage ring receives the electron beam from a linear accelerator in a central booster area. The source fits into laboratories or maintenance areas. Injection, RF-acceleration, beam manipulating devices and large diagnostics systems are required once. Higher average currents stored in the spiral enhance central cone power. Bunches are limited by ion trapping and a gap clears ions. The current is increased in the spiral. Gain in central cone power increases 5 fold, assuming a gap size of half single storage ring circumference.

An EUV light generator including the following components: A. an electron storage ring including a first linear section and a second linear section; B. an electron supplier configured to supply the electron storage ring with an electron bunch; C. a high-frequency acceleration cavity disposed in the first linear section and configured to accelerate the electron bunch in such a way that a length Lez of the electron bunch satisfies 0.09 mLez3 m; and D. an undulator disposed in the second linear section and configured to output EUV light when the electron bunch enters the undulator.

An EUV light generator including the following components: A. an electron storage ring including a first linear section and a second linear section; B. an electron supplier configured to supply the electron storage ring with an electron bunch; C. a high-frequency acceleration cavity disposed in the first linear section and configured to accelerate the electron bunch in such a way that a length Lez of the electron bunch satisfies 0.09 mLez3 m; and D. an undulator disposed in the second linear section and configured to output EUV light when the electron bunch enters the undulator.