A charged particle acceleration device, which eliminates the need for repeating alignment adjustment even in the case of repeating installation of the controllers, is provided, and a method for adjusting the same is provided. A charged particle acceleration device 10A includes: controllers 15,15a,15b,15c configured to control a beam trajectory 12 of charged particles that pass through a duct 11 to be inserted through the controllers 15; and a stage 20 that is supported by a frame 16 fixed to a base and reversibly moves the controllers 15 in a direction of intersecting the beam trajectory 12.

A target structure for generation of x-ray radiation may include a heat sink; and a target element for electrons to strike, the target element being in the heat sink to cool the target element, wherein the heat sink includes a metal-diamond composite material.

A target structure for generation of x-ray radiation may include a heat sink; and a target element for electrons to strike, the target element being in the heat sink to cool the target element, wherein the heat sink includes a metal-diamond composite material.

This disclosure provides systems, methods, and apparatus related to deposition techniques using laser ablation. In one aspect, an optical fiber and target of a material to be deposited on a first region of an interior surface of a hollow component are positioned in the hollow component. A first end of the optical fiber is coupled to a laser system. A second end of the optical fiber is proximate the target. The material is deposited on the first region of the interior surface of the hollow component by directing a first laser pulse from the laser system through the optical fiber to impinge on the target.

What is shown is a cyclic accelerator for accelerating charge carriers. The cyclic accelerator includes a charge carrier source configured to generate free charge carriers, a vacuum chamber configured to receive the free charge carriers, wherein the vacuum chamber is produced by means of MEMS technology, and wherein at least a main surface region of the vacuum chamber has a semiconductor material. In addition, the cyclic accelerator has electrodes configured to accelerate the free charge carriers in the vacuum chamber by means of an alternating current field, and a magnetic field generator configured to generate a magnetic field perpendicularly to the direction of movement of the charge carriers.

What is shown is a cyclic accelerator for accelerating charge carriers. The cyclic accelerator includes a charge carrier source configured to generate free charge carriers, a vacuum chamber configured to receive the free charge carriers, wherein the vacuum chamber is produced by means of MEMS technology, and wherein at least a main surface region of the vacuum chamber has a semiconductor material. In addition, the cyclic accelerator has electrodes configured to accelerate the free charge carriers in the vacuum chamber by means of an alternating current field, and a magnetic field generator configured to generate a magnetic field perpendicularly to the direction of movement of the charge carriers.

System includes a target assembly having a production chamber. The target assembly includes an electrode and a conductive base exposed to the production chamber. The target assembly has fluidic ports that provide access to the production chamber. The system also includes a fluidic-control system having a storage vessel and fluidic lines that connect to the fluidic ports. The storage vessel and the production chamber are in flow communication through at least one of the fluidic lines. The system also includes a power source that is configured to be electrically connected to the electrode and the conductive base. The production chamber, the electrode, and the conductive base form an electrolytic cell when an electrolytic solution is disposed in the production chamber. The power source is configured to apply voltage to the electrode and the conductive base to deposit a solid target along conductive base.

System includes a target assembly having a production chamber. The target assembly includes an electrode and a conductive base exposed to the production chamber. The target assembly has fluidic ports that provide access to the production chamber. The system also includes a fluidic-control system having a storage vessel and fluidic lines that connect to the fluidic ports. The storage vessel and the production chamber are in flow communication through at least one of the fluidic lines. The system also includes a power source that is configured to be electrically connected to the electrode and the conductive base. The production chamber, the electrode, and the conductive base form an electrolytic cell when an electrolytic solution is disposed in the production chamber. The power source is configured to apply voltage to the electrode and the conductive base to deposit a solid target along conductive base.

Cyclotron includes an acceleration chamber, a vacuum system, an ion source system, and a control system that is configured to determine at least one operating parameter as a particle beam is directed along a beam path of the cyclotron. The control system is configured to decrease a supply of the charged particles for the particle beam based on the at least one operating parameter. The particle beam continues after decreasing the supply of the charged particles. The control system is also configured to increase the supply of the charged particles for the particle beam after a predetermined time period or in response to determining that an amount of gas molecules has reduced based on the at least one operating parameter.

Cyclotron includes an acceleration chamber, a vacuum system, an ion source system, and a control system that is configured to determine at least one operating parameter as a particle beam is directed along a beam path of the cyclotron. The control system is configured to decrease a supply of the charged particles for the particle beam based on the at least one operating parameter. The particle beam continues after decreasing the supply of the charged particles. The control system is also configured to increase the supply of the charged particles for the particle beam after a predetermined time period or in response to determining that an amount of gas molecules has reduced based on the at least one operating parameter.