For the purpose of providing a transportable linear accelerator system which can restrain entering of losing ion beams deviated from a trajectory therefor, to thereby efficiently achieve reduction in radioactivity at low cost, and a transportable neutron source equipped therewith, a transportable linear accelerator system is configured to be provided with a beam chopper just before an inlet of a post-accelerator, thereby to cut off, from the proton beams pre-accelerated by a pre-accelerator, uncontrolled proton beams, and thus to radiate only the controlled proton beams to the post-accelerator, so that the proton beams are prevented from hitting an acceleration electrode, etc. of the post accelerator.

For the purpose of providing a transportable linear accelerator system which can restrain entering of losing ion beams deviated from a trajectory therefor, to thereby efficiently achieve reduction in radioactivity at low cost, and a transportable neutron source equipped therewith, a transportable linear accelerator system is configured to be provided with a beam chopper just before an inlet of a post-accelerator, thereby to cut off, from the proton beams pre-accelerated by a pre-accelerator, uncontrolled proton beams, and thus to radiate only the controlled proton beams to the post-accelerator, so that the proton beams are prevented from hitting an acceleration electrode, etc. of the post accelerator.

A system has a linear accelerator, ion pump and a compensating magnet. The ion pump includes an ion pump magnet position, an ion pump magnet shape, an ion pump magnet orientation, and an ion pump magnet magnetic field profile. The compensating magnet has a position, a shape, an orientation, and a magnetic field profile, where at least one of the position, shape, orientation, and magnetic field profile of the compensating magnet reduce at least one component of a magnetic field in the linear accelerator resulting from the ion pump magnet.

A system has a linear accelerator, ion pump and a compensating magnet. The ion pump includes an ion pump magnet position, an ion pump magnet shape, an ion pump magnet orientation, and an ion pump magnet magnetic field profile. The compensating magnet has a position, a shape, an orientation, and a magnetic field profile, where at least one of the position, shape, orientation, and magnetic field profile of the compensating magnet reduce at least one component of a magnetic field in the linear accelerator resulting from the ion pump magnet.

This disclosure provides systems, methods, and apparatus related to deposition techniques using laser ablation. In one aspect, an optical fiber and target of a material to be deposited on a first region of an interior surface of a hollow component are positioned in the hollow component. A first end of the optical fiber is coupled to a laser system. A second end of the optical fiber is proximate the target. The material is deposited on the first region of the interior surface of the hollow component by directing a first laser pulse from the laser system through the optical fiber to impinge on the target.

A beam guiding apparatus includes a vacuum chamber that includes a target region arranged to receive a target material for generating EUV radiation. The vacuum chamber includes a first and second opening for receiving into the vacuum chamber a first and second laser beam, respectively. The first and second laser beam have different wavelengths. The beam guiding apparatus further includes a superposition apparatus arranged to superpose the first and second laser beams entering into the vacuum chamber through the first and second openings, respectively, for common beam guidance in the direction of the target region. The superposition apparatus comprises a first optical element configured to seal the first opening of the vacuum chamber in a gas-tight manner and transmit the first laser beam, or a second optical element configured to seal off the second opening of the vacuum chamber in a gas-tight manner and transmit the second laser beam.

A beam guiding apparatus includes a vacuum chamber that includes a target region arranged to receive a target material for generating EUV radiation. The vacuum chamber includes a first and second opening for receiving into the vacuum chamber a first and second laser beam, respectively. The first and second laser beam have different wavelengths. The beam guiding apparatus further includes a superposition apparatus arranged to superpose the first and second laser beams entering into the vacuum chamber through the first and second openings, respectively, for common beam guidance in the direction of the target region. The superposition apparatus comprises a first optical element configured to seal the first opening of the vacuum chamber in a gas-tight manner and transmit the first laser beam, or a second optical element configured to seal off the second opening of the vacuum chamber in a gas-tight manner and transmit the second laser beam.

Modular data centers with modular components suitable for use with rack or shelf mount computing systems, for example, are disclosed. The modular center generally includes a modular computing module including an intermodal shipping container and computing systems mounted within the container and configured to be shipped and operated within the container and a temperature control system for maintaining the air temperature surrounding the computing systems. The intermodal shipping container may be configured in accordance to International Organization for Standardization (ISO) container manufacturing standards or otherwise configured with respect to height, length, width, weight, and/or lifting points of the container for transport via an intermodal transport infrastructure. The modular design enables the modules to be cost effectively built at a factory and easily transported to and deployed at a data center site.

A method and a novel flexure interface apparatus are provided for ultrahigh-vacuum (UHV) applications for precision nanopositioning systems. An ultrahigh-vacuum (UHV) metrology base is integrated with an ultrahigh-vacuum (UHV) flange together including a precision and compact flexure interface structure defining a UHV metrology base near-zero-length feedthrough. The UHV metrology base is directly mounted to a flange mounting surface in air with nanopositioning and thermal stability. The precision and compact flexure interface structure has sufficient strength to hold the vacuum force and sufficiently flexible to survive with the thermal expansion stress during bakeout process.

A method and a novel flexure interface apparatus are provided for ultrahigh-vacuum (UHV) applications for precision nanopositioning systems. An ultrahigh-vacuum (UHV) metrology base is integrated with an ultrahigh-vacuum (UHV) flange together including a precision and compact flexure interface structure defining a UHV metrology base near-zero-length feedthrough. The UHV metrology base is directly mounted to a flange mounting surface in air with nanopositioning and thermal stability. The precision and compact flexure interface structure has sufficient strength to hold the vacuum force and sufficiently flexible to survive with the thermal expansion stress during bakeout process.