The present disclosure relates to a method of forming an integrated circuit. In some embodiments, the method may be performed by forming a lower interconnect structure within a first inter-level dielectric (ILD) layer over an upper surface of a substrate, and forming a resistive random access memory (RRAM) device over the lower interconnect structure. A second ILD layer is formed over the RRAM device. The second ILD layer is patterned to remove a part of the second ILD layer that defines a cavity. The cavity vertically extends from an upper surface of the second ILD layer to an upper surface of the RRAM device and laterally extends past opposing sidewalls of the RRAM device. An upper interconnect wire is formed within the cavity.

The present disclosure, in some embodiments, relates to an integrated circuit. The integrated circuit has a first inter-level dielectric (ILD) layer over a substrate. A lower electrode is over the first ILD layer, a data storage structure is over the lower electrode, and an upper electrode is over the data storage structure. An upper interconnect wire directly contacts an entirety of an upper surface of the upper electrode. A conductive via directly contacts an upper surface of the upper interconnect wire. The conductive via has an outermost sidewall that is directly over the upper surface of the upper interconnect wire.

A semiconductor device, includes: a substrate having a first region and a second region; a first device on the substrate, in the first region; a second device on the substrate, in the second region; a front side interconnection structure including a plurality of interconnection layers electrically connected to the first device and the second device, on a front side of the substrate; and a back side buried interconnection structure adjacently to a back side of the substrate opposing the front side. The back side buried interconnection structure includes a back side buried insulating layer in a trench recessed from a back side of the substrate toward the front side of the substrate, and a back side buried conductive layer in the back side buried insulating layer. The back side buried interconnection structure is located in the first region or the second region.

A semiconductor device, includes: a substrate having a first region and a second region; a first device on the substrate, in the first region; a second device on the substrate, in the second region; a front side interconnection structure including a plurality of interconnection layers electrically connected to the first device and the second device, on a front side of the substrate; and a back side buried interconnection structure adjacently to a back side of the substrate opposing the front side. The back side buried interconnection structure includes a back side buried insulating layer in a trench recessed from a back side of the substrate toward the front side of the substrate, and a back side buried conductive layer in the back side buried insulating layer. The back side buried interconnection structure is located in the first region or the second region.

The present disclosure, in some embodiments, relates to an integrated chip. The integrated chip includes a first interconnect within a first inter-level dielectric (ILD) layer over a substrate. A memory device is disposed over the first interconnect and is surrounded by a second ILD layer. A sidewall spacer is arranged along opposing sides of the memory device and an etch stop layer is arranged on the sidewall spacer. The sidewall spacer and the etch stop layer have upper surfaces that are vertically offset from one another by a non-zero distance. A second interconnect extends from a top of the second ILD layer to an upper surface of the memory device.

The present disclosure, in some embodiments, relates to an integrated chip. The integrated chip includes a first interconnect within a first inter-level dielectric (ILD) layer over a substrate. A memory device is disposed over the first interconnect and is surrounded by a second ILD layer. A sidewall spacer is arranged along opposing sides of the memory device and an etch stop layer is arranged on the sidewall spacer. The sidewall spacer and the etch stop layer have upper surfaces that are vertically offset from one another by a non-zero distance. A second interconnect extends from a top of the second ILD layer to an upper surface of the memory device.

Bi-stable static random access memory (SRAM) bit cells that facilitate direct writing for storage are disclosed. In one aspect, a bi-stable SRAM bit cell includes source and drain regions, and a gate region formed over a well region between the source and drain regions, which results in two (2) bipolar junction transistors (BJTs) formed within a bi-stable SRAM bit cell. A base tap region and a collector tap region are employed to provide voltages for read and write operations. The base tap region is formed beside a shallow trench isolation (STI) region having a bottom surface higher in a Y-axis direction in the well region than a bottom surface of the well region. The collector tap region is formed on one side of an STI region having a bottom surface lower in the Y-axis direction in the substrate than the bottom surface of the well region.

A two-transistor memory cell based upon a thyristor for an SRAM integrated circuit is described together with methods of operation. The memory cell can be implemented in different combinations of MOS and bipolar select transistors, or without select transistors, with thyristors in a semiconductor substrate with shallow trench isolation. Standard CMOS process technology can be used to manufacture the SRAM.

Bi-stable static random access memory (SRAM) bit cells that facilitate direct writing for storage are disclosed. In one aspect, a bi-stable SRAM bit cell includes source and drain regions, and a gate region formed over a well region between the source and drain regions, which results in two (2) bipolar junction transistors (BJTs) formed within a bi-stable SRAM bit cell. A base tap region and a collector tap region are employed to provide voltages for read and write operations. The base tap region is formed beside a shallow trench isolation (STI) region having a bottom surface higher in a Y-axis direction in the well region than a bottom surface of the well region. The collector tap region is formed on one side of an STI region having a bottom surface lower in the Y-axis direction in the substrate than the bottom surface of the well region.

A semiconductor device includes a substrate having a cell region and a peripheral region, a thyristor on the cell region, a MOS transistor on the peripheral region, and a first silicide layer on the substrate adjacent to the thyristor on the cell region. Preferably, the thyristor includes: a first semiconductor layer, a second semiconductor layer, a third semiconductor layer, and a fourth semiconductor layer on the cell region, vertical dielectric patterns in the first semiconductor layer, the second semiconductor layer, the third semiconductor layer, and the fourth semiconductor layer, and first contact plugs on the fourth semiconductor layer.