A multilevel semiconductor device including: a first level including a first array of first memory cells and first control line; a second level including a second array of second memory cells and second control line; a third level including a third array of third memory cells and third control line, where the second level overlays the first, and where the third level overlays the second; a first, second and third access pillar; memory control circuits designed to individually control cells of the first, second and third memory cells, where the device includes an array of units, where each of the units includes a plurality of the first, second and third memory cells, and a portion of the memory control circuits, where the array of units include at least eight rows and eight columns of units, and where the memory control is designed to control independently each of the units.

A semiconductor apparatus may include a package substrate, and a plurality of semiconductor chips. Wherein the package substrate and the semiconductor chips may be configured based on a load value of the semiconductor apparatus.

An embodiment of a transistor has a semiconductor fin, a dielectric over the semiconductor fin, a control gate over the dielectric, and source/drains in the semiconductor fin and having upper surfaces below an uppermost surface of the semiconductor fin. Another embodiment of a transistor has first and second semiconductor fins, a first source/drain region in the first semiconductor fin and extending downward from an uppermost surface of the first semiconductor fin, a second source/drain region in the second semiconductor fin and extending downward from an uppermost surface of the second semiconductor fin, a dielectric between the first and second semiconductor fins and adjacent to sidewalls of the first and second semiconductor fins, and a control gate over the dielectric and between the first and second semiconductor fins and extending to a level below upper surfaces of the first and second source/drain regions.

A semiconductor device includes a ROM, a differential sense amplifier and a multiplexer logic circuit. The ROM has memory cells in rows along word lines and columns along bit lines, and a reference column having reference transistors along a reference bit line. The multiplexer logic circuit couples a selected bit line to a first differential amplifier input and couples the reference bit line to the second differential amplifier input and controls a reference current of the reference bit line to be between a first bit line current of a programmed memory cell and a second bit line current of an unprogrammed memory cell.

There is provided a monolithic three dimensional array of charge storage devices which includes a plurality of device levels, wherein at least one surface between two successive device levels is planarized by chemical mechanical polishing.

A semiconductor device may include: a substrate; a first well region formed on the substrate; a second well region formed on the substrate, the first well region and the second well region extending in a first direction and being adjacent to each other in a second direction crossing the first direction; a first active region formed in the first well region; a first power region formed in the first well region, the first active region and the first power region being separate from each other in the first direction; a second active region array formed in the second well region; a second power region formed in the second well region, the second active region array and the second power region being separate from each other in the first direction; and a first dummy active region formed in the first well region between the first active region and the first power region, the first dummy active region being separate from the first active region and the first power region in the first direction.

Integrated circuits described herein implement an x-input logic gate. The integrated circuit includes a plurality of Schottky diodes that includes x Schottky diodes and a plurality of source-follower transistors that includes x source-follower transistors. Each respective source-follower transistor of the plurality of source-follower transistors includes a respective gate node that is coupled to a respective Schottky diode. A first source-follower transistor of the plurality of source-follower transistors is connected serially to a second source-follower transistor of the plurality of source-follower transistors.

A semiconductor structure including a semiconductor substrate and at least one patterned dielectric layer is provided. The semiconductor substrate includes a semiconductor portion, at least one first device, at least one second device and at least one first dummy ring. The at least one first device is disposed on a first region surrounded by the semiconductor portion. The at least one second device and the at least one first dummy ring are disposed on a second region, and the second region surrounds the first region. The at least one patterned dielectric layer covers the semiconductor substrate.

A low cost IC solution is disclosed to provide Super CMOS microelectronics macros. Hereinafter, the Super CMOS or Schottky CMOS all refer to SCMOS. The SCMOS device solutions with a niche circuit element, the complementary low threshold Schottky barrier diode pairs (SBD) made by selected metal barrier contacts (Co/Ti) to P- and NSi beds of the CMOS transistors. A DTL like new circuit topology and designed wide contents of broad product libraries, which used the integrated SBD and transistors (BJT, CMOS, and Flash versions) as basic components. The macros include diodes that are selectively attached to the diffusion bed of the transistors, configuring them to form generic logic gates, memory cores, and analog functional blocks from simple to the complicated, from discrete components to all grades of VLSI chips. Solar photon voltaic electricity conversion and bio-lab-on-a-chip are two newly extended fields of the SCMOS IC applications.

There is provided a monolithic three dimensional array of charge storage devices which includes a plurality of device levels, wherein at least one surface between two successive device levels is planarized by chemical mechanical polishing.