Transistors might include first and second semiconductor fins, a first source/drain region in the first semiconductor fin and extending downward from an uppermost surface of the first semiconductor fin, a second source/drain region in the second semiconductor fin and extending downward from an uppermost surface of the second semiconductor fin, a dielectric between the first and second semiconductor fins and adjacent to sidewalls of the first and second semiconductor fins, and a control gate over the dielectric and between the first and second semiconductor fins and extending to a level below upper surfaces of the first and second source/drain regions.

A semiconductor device capable of reducing electric power consumption while suppressing deterioration in reliability is provided. The semiconductor device includes a flash memory, a SRAM formed on a SOI substrate, oscillation circuits generating a signal of a first frequency and a signal of a second frequency lower than the first frequency, and a processor operating in synchronization with a system clock. The processor performs steps of turning on a power supply of the flash memory, lowering a threshold voltage of the SRAM, transferring a program from the flash memory to the SRAM by using the signal of the first frequency as the system clock, turning off the power supply of the flash memory, heightening the threshold voltage of the SRAM, and executing the program stored in the SRAM by using the signal of the second frequency as the system clock.

Various implementations described herein relate to a device with a multi-transistor logic structure for use in memory architecture. In some applications, the multi-transistor logic structure may have a pair of P-type transistors that are arranged in a P-over-P multi-transistor stack. In other applications, the multi-transistor logic structure may have a pair of N-type transistors that are arranged in an N-over-N multi-transistor stack.

A memory device includes a substrate and an eFuse structure. The substrate includes an array region and an eFuse region and the eFuse region of the substrate has an eFuse trench. The eFuse structure includes a first gate oxide layer, a plurality of doped regions, a dummy buried word line, and an eFuse gate electrode. The first gate oxide layer is conformally formed on a surface of the eFuse trench. The doped regions are respectively formed in the substrate on opposite sides outside the eFuse trench, and in contact with the first gate oxide layer. The dummy buried word line is formed on the first gate oxide layer. The eFuse gate electrode is formed on the dummy buried word line and in contact with the first gate oxide layer. The dummy buried word line is electrically isolated from the eFuse gate electrode.

A semiconductor device includes: a substrate; a memory cell region provided over the substrate; a peripheral region provided over the substrate and adjacent to the memory cell region; a plurality of word-lines extending across the memory cell region and the peripheral region; and a plurality of contacts connected to edge portions of even numbered ones of the plurality of word-lines in the peripheral region, respectively; wherein a side of each of the edge portions of the even numbered ones of the plurality of word-lines is adjacent a portion missing an odd numbered word-line; and wherein another side of each of the edge portions of the even numbered ones of the plurality of word-lines is adjacent an offcut of another odd numbered word-line.

A semiconductor memory device includes a first word line formed over a first active region. In some embodiments, a first metal line is disposed over and perpendicular to the first word line, where the first metal line is electrically connected to the first word line using a first conductive via, and where the first conductive via is disposed over the first active region. In some examples, the semiconductor memory device further includes a second metal line and a third metal line both parallel to the first metal line and disposed on opposing sides of the first metal line, where the second metal line is electrically connected to a source/drain region of the first active region using a second conductive via, and where the third metal line is electrically connected to the source/drain region of the first active region using a third conductive via.

Integrated circuits described herein implement multiplexer (MUX) gate system. An integrated circuit includes a plurality of inputs coupled with a first stage of the integrated circuit. The first stage includes a plurality of first Schottky diodes and a plurality of N-type transistors. Each input is coupled with a respective first Schottky diode and N-type transistor. The integrated circuit also includes a plurality of outputs of the first stage coupled with a second stage of the integrated circuit. The second stage includes a plurality of second Schottky diodes and a plurality of P-type transistors. Each output coupled with a respective second Schottky diode and P-type transistor. The integrated circuit further includes a plurality of outputs of the second stage coupled with a set of transistors including a P-type transistor and an N-type transistor, and an output of the set of transistors coupled with an output of the MUX gate system.

A semiconductor structure including a semiconductor substrate and at least one patterned dielectric layer is provided. The semiconductor substrate includes a semiconductor portion, at least one first device, at least one second device and at least one first dummy ring. The at least one first device is disposed on a first region surrounded by the semiconductor portion. The at least one second device and the at least one first dummy ring are disposed on a second region, and the second region surrounds the first region. The at least one patterned dielectric layer covers the semiconductor substrate.

A semiconductor device includes core circuits configured to operate at a core bias potential, input/output (I/O) circuits configured to operate at an I/O bias potential higher than the core bias potential, and a non-volatile memory having a peripheral circuit configured to operate at a memory program bias potential that is higher than the I/O bias potential. The peripheral circuit is also configured to operate at the core bias potential. The peripheral circuit has an input buffer; a threshold potential at an input buffer input node of the input buffer is less than the core bias potential. The peripheral circuit may be manifested as a low voltage supply detection circuit. The peripheral circuit may be manifested as a level shifter circuit. The peripheral circuit may be manifested as a sense circuit. The input buffer may include a drain extended core transistor to provide the desired threshold potential.

A semiconductor memory device includes a first word line formed over a first active region. In some embodiments, a first metal line is disposed over and perpendicular to the first word line, where the first metal line is electrically connected to the first word line using a first conductive via, and where the first conductive via is disposed over the first active region. In some examples, the semiconductor memory device further includes a second metal line and a third metal line both parallel to the first metal line and disposed on opposing sides of the first metal line, where the second metal line is electrically connected to a source/drain region of the first active region using a second conductive via, and where the third metal line is electrically connected to the source/drain region of the first active region using a third conductive via.