Systems, apparatuses, and methods may provide for technology for forming a pre-offset platform on top of a substrate. A memory block is formed, where the memory block includes a staircase area and a memory array area located adjacent the staircase area. The memory array area includes a plurality of memory pillars extending into the memory block. The staircase area has a first height, the memory array area has a second height, and a tier expansion height is defined as a difference between the second height and the first height. The pre-offset platform is located between the substrate and the staircase area of the memory block. The pre-offset platform is oriented and arranged to offset the tier expansion height so that an upper surface of the staircase area and an upper surface of the memory array area are located in a same plane.

Systems, apparatuses, and methods may provide for technology for forming a pre-offset platform on top of a substrate. A memory block is formed, where the memory block includes a staircase area and a memory array area located adjacent the staircase area. The memory array area includes a plurality of memory pillars extending into the memory block. The staircase area has a first height, the memory array area has a second height, and a tier expansion height is defined as a difference between the second height and the first height. The pre-offset platform is located between the substrate and the staircase area of the memory block. The pre-offset platform is oriented and arranged to offset the tier expansion height so that an upper surface of the staircase area and an upper surface of the memory array area are located in a same plane.

Systems, apparatuses, and methods may provide for technology that arranges stair wells for memory devices. The memory device includes a memory array and a memory block coupled to the memory array. The memory block includes a first through array via area and a first staircase area coupled to a plurality of decks. The first staircase area includes a first stair well and a second stair well located contiguous to the first stair well.

Systems, apparatuses, and methods may provide for technology that arranges stair wells for memory devices. The memory device includes a memory array and a memory block coupled to the memory array. The memory block includes a first through array via area and a first staircase area coupled to a plurality of decks. The first staircase area includes a first stair well and a second stair well located contiguous to the first stair well.

The present technology includes a semiconductor memory device and a method of manufacturing the same. The semiconductor memory device includes a first semiconductor layer, a cell stack and a peripheral stack each disposed on the first semiconductor layer, a first slit structure extending in a first direction and penetrating the cell stack and the peripheral stack, a penetration structure penetrating the peripheral stack and being spaced apart from the first slit structure, and a support structure penetrating the peripheral stack. The support structure includes first sidewall portions spaced apart from each other and a second sidewall portion connecting the first sidewall portions to each other, and the penetration structure is disposed between the first sidewall portions.

A three-dimensional non-volatile memory structure including a substrate, a stacked structure, a charge storage pillar, a channel pillar, and a ferroelectric material pillar is provided. The stacked structure is disposed on the substrate and includes a plurality of conductive layers and a plurality of first dielectric layers, and the conductive layers and the first dielectric layers are alternately stacked. The charge storage pillar is disposed in the stacked structure. The channel pillar is disposed inside the charge storage pillar. The ferroelectric material pillar is disposed inside the channel pillar.

A semiconductor device, the device comprising: a plurality of transistors, wherein at least one of said plurality of transistors comprises a first single crystal source, channel, and drain, wherein at least one of said plurality of transistors comprises a second single crystal source, channel, and drain, wherein said second single crystal source, channel, and drain is disposed above said first single crystal source, channel, and drain, wherein at least one of said plurality of transistors comprises a third single crystal source, channel, and drain, wherein said third single crystal source, channel, and drain is disposed above said second single crystal source, channel, and drain, wherein at least one of said plurality of transistors comprises a fourth single crystal source, channel, and drain, and wherein said third single crystal channel is self-aligned to said fourth single crystal channel being processed following the same lithography step.

A semiconductor device, the device comprising: a plurality of transistors, wherein at least one of said plurality of transistors comprises a first single crystal source, channel, and drain, wherein at least one of said plurality of transistors comprises a second single crystal source, channel, and drain, wherein said second single crystal source, channel, and drain is disposed above said first single crystal source, channel, and drain, wherein at least one of said plurality of transistors comprises a third single crystal source, channel, and drain, wherein said third single crystal source, channel, and drain is disposed above said second single crystal source, channel, and drain, wherein at least one of said plurality of transistors comprises a fourth single crystal source, channel, and drain, and wherein said third single crystal channel is self-aligned to said fourth single crystal channel being processed following the same lithography step.

A method for producing a 3D semiconductor device including: providing a first level including a first single crystal layer; forming a first metal layer on top of first level; forming a second metal layer on top of the first metal layer; forming at least one second level above the second metal layer; performing a first lithography step on the second level; forming a third level on top of the second level; performing a second lithography step on the third level; perform processing steps to form first memory cells within the second level and second memory cells within the third level, where first memory cells include at least one second transistor, and the second memory cells include at least one third transistor; and deposit a gate electrode for the second and the third transistors simultaneously.

A method for producing a 3D semiconductor device including: providing a first level including a first single crystal layer; forming a first metal layer on top of first level; forming a second metal layer on top of the first metal layer; forming at least one second level above the second metal layer; performing a first lithography step on the second level; forming a third level on top of the second level; performing a second lithography step on the third level; perform processing steps to form first memory cells within the second level and second memory cells within the third level, where first memory cells include at least one second transistor, and the second memory cells include at least one third transistor; and deposit a gate electrode for the second and the third transistors simultaneously.