Patent classifications
H10K71/20
DISPLAY DEVICE AND DISPLAY DEVICE PRODUCTION METHOD
A display device provided with a display region including a plurality of pixels and a frame region surrounding the display region includes a thin film transistor layer, a light-emitting element layer including a plurality of light-emitting elements, each including a first electrode, a light emitting layer, and a second electrode, and each having a different luminescent color. In the light-emitting layer, an oxetane monomer, an epoxy monomer, and a radical polymerization initiator are used.
DISPLAY DEVICE AND DISPLAY DEVICE PRODUCTION METHOD
A display device provided with a display region including a plurality of pixels and a frame region surrounding the display region includes a thin film transistor layer, a light-emitting element layer including a plurality of light-emitting elements, each including a first electrode, a light emitting layer, and a second electrode, and each having a different luminescent color. In the light-emitting layer, an oxetane monomer, an epoxy monomer, and a radical polymerization initiator are used.
PATTERNED LIGHT-EMITTING DEVICE
A light-emitting structure comprises a substrate, a sub-pixel stack patterned over the substrate, an insulating material patterned to surround the emissive stack, and a bank patterned to surround the sub-pixel stack and the insulating material. The sub-pixel stack comprises an emissive stack between a first electrode layer and a second electrode layer.
Method of forming memory cell
A memory cell includes a first conductive line, a lower electrode, a carbon nano-tube (CNT) layer, a middle electrode, a resistive layer, a top electrode and a second conductive line. The first conductive line is disposed over a substrate. The lower electrode is disposed over the first conductive line. The carbon nano-tube (CNT) layer is disposed over the lower electrode. The middle electrode is disposed over the carbon nano-tube layer, thereby the lower electrode, the carbon nano-tube (CNT) layer and the middle electrode constituting a nanotube memory part. The resistive layer is disposed over the middle electrode. The top electrode is disposed over the resistive layer, thereby the middle electrode, the resistive layer and the top electrode constituting a resistive memory part. The second conductive line is disposed over the top electrode.
Display panel and method for manufacturing same
Embodiments of the present disclosure provide a display panel and a method for manufacturing the same. In the embodiments, multiple layers in a functional area are removed through an etching process which is milder than a traditional cutting process and is not easy to introduce cracks into an inorganic material layer, so that a damage of components inside the display panel caused by moisture and oxygen is prevented, resulting in yield improvement of the display panel and cost saving.
DISPLAY DEVICE AND DISPLAY DEVICE PRODUCTION METHOD
A display device includes a thin film transistor layer, a light-emitting element layer including a plurality of light-emitting elements, each including a first electrode, a function layer, and a second electrode, and each having a different luminescent color. The function layer includes a light-emitting layer and a pair of holding layers sandwiching the light-emitting layer and each including a photosensitive material. One of the first electrode and the second electrode is an anode electrode and the other is a cathode electrode. The function layer includes a hole transport layer provided between the anode electrode and one holding layer of the pair of holding layers, and an electron transport layer provided between the cathode electrode and the other holding layer of the pair of holding layers.
PHOTOELECTRIC DEVICE AND MANUFACTURING METHOD THEREOF
An optoelectronic device includes a semiconductor substrate, wherein a first transport layer is formed on a first partial region of the semiconductor substrate; a first insulation layer is formed on a second partial region around the first partial region; the first transport layer is formed on the first insulation layer; an interface layer is formed on the first transport layer; a light-emitting material layer containing perovskite material is formed on the interface layer; a second insulation layer is formed on the light-emitting material layer in the second partial region and on the light-emitting material layer near a second partial region side in the first partial region, so that the characteristic size of a single light-emitting pixel or effective working region is adjustable.
PEROVSKITE DISPLAYS AND METHODS OF FORMATION
A method includes forming a barrier layer on a substrate, removing a portion of the barrier layer to yield a patterned barrier layer and an exposed portion of the substrate within a hole in the patterned barrier layer, forming a first portion of a perovskite on the patterned barrier layer and a second portion of the perovskite on the exposed portion of the substrate, and removing the patterned barrier layer, thereby removing the first portion of the perovskite.
Photoelectric conversion device and manufacturing method thereof
A photoelectric conversion device in an embodiment includes a first photoelectric conversion part including a first transparent electrode, a first photoelectric conversion layer, and a first counter electrode and a second photoelectric conversion part including a second transparent electrode, a second photoelectric conversion layer, and a second counter electrode, the first photoelectric conversion part and the second photoelectric conversion part being provided on a transparent substrate. The first counter electrode and the second transparent electrode are electrically connected by a connection part. As for the first photoelectric conversion layer and the second photoelectric conversion layer, adjacent portions of the adjacent first and second photoelectric conversion layers are electrically separated by an inactive region having electrical resistance higher than that of the first and second photoelectric conversion layers.
MASK ASSEMBLY AND METHOD FOR MANUFACTURING THE SAME
A mask assembly includes a frame including a frame opening, and a mask disposed on the frame. The mask includes a body portion including an upper surface and a lower surface opposing each other and deposition openings spaced apart from each other, protrusions protruding from the upper surface and surrounding the corresponding deposition openings, and at least one step formation pattern overlapping the protrusions in a plan view and disposed in the body portion.