The present invention provides an organic light-emitting diode (OLED) display panel including a substrate, a thin-film transistor, an insulating layer, an auxiliary electrode, an organic light-emitting layer, a shielding stage, and a common electrode. The common electrode is electrically connected to the auxiliary electrode. The shielding stage includes at least one organic material layer. An angle between the shielding stage and the substrate is a threshold value.

The present invention provides an organic light-emitting diode (OLED) display panel including a substrate, a thin-film transistor, an insulating layer, an auxiliary electrode, an organic light-emitting layer, a shielding stage, and a common electrode. The common electrode is electrically connected to the auxiliary electrode. The shielding stage includes at least one organic material layer. An angle between the shielding stage and the substrate is a threshold value.

An opto-electronic device includes: (1) a substrate including a first region and a second region; and (2) a conductive coating covering the second region of the substrate. The first region of the substrate is exposed from the conductive coating, and an edge the conductive coating adjacent to the first region of the substrate has a contact angle that is greater than about 20 degrees.

A display panel, a mask plate, and a manufacturing method of the display panel are provided. The display area includes an installation area and a non-installation area. The installation area is configured to install a preset component. The display panel further includes a pixel layer. The pixel layer includes a plurality of first sub-pixels disposed in the non-installation area and a plurality of second sub-pixels disposed in the installation area. Each of the plurality of first sub-pixels includes a first cathode, and each of the plurality of second sub-pixels includes a second cathode, wherein a thickness of the second cathode is less than a thickness of the first cathode.

A display panel, a mask plate, and a manufacturing method of the display panel are provided. The display area includes an installation area and a non-installation area. The installation area is configured to install a preset component. The display panel further includes a pixel layer. The pixel layer includes a plurality of first sub-pixels disposed in the non-installation area and a plurality of second sub-pixels disposed in the installation area. Each of the plurality of first sub-pixels includes a first cathode, and each of the plurality of second sub-pixels includes a second cathode, wherein a thickness of the second cathode is less than a thickness of the first cathode.

An apparatus and a method for manufacturing a display device are provided. The apparatus includes a plasma generator disposed outside a chamber, an adapter of the chamber, the adapter connecting the plasma generator to the chamber, a cooler connected to the adapter, an insulator connected to the cooler, and a diffuser connected to the insulator. A plasma generated by the plasma generator is supplied into the chamber through a flow path passing through the adapter, the cooler, the insulator, and the diffuser.

A method of reducing color breakup of reflection of ambient light in a display panel having a color breakup-prevention structure is provided. The color breakup-prevention structure includes a high refractive index lens layer on a side of a plurality of light emitting elements away from a base substrate; a low refractive index modulation layer on a side of the high refractive index lens layer away from the base substrate; a first color filter layer in a plurality of subpixel regions, and spaced apart from the high refractive index lens layer by the low refractive index modulation layer; and a first black matrix layer in an inter-subpixel region, and spaced apart from the high refractive index lens layer by the low refractive index modulation layer. The high refractive index lens layer includes a plurality of lens portions spaced apart from each other and respectively in the plurality of subpixels.

A method of reducing color breakup of reflection of ambient light in a display panel having a color breakup-prevention structure is provided. The color breakup-prevention structure includes a high refractive index lens layer on a side of a plurality of light emitting elements away from a base substrate; a low refractive index modulation layer on a side of the high refractive index lens layer away from the base substrate; a first color filter layer in a plurality of subpixel regions, and spaced apart from the high refractive index lens layer by the low refractive index modulation layer; and a first black matrix layer in an inter-subpixel region, and spaced apart from the high refractive index lens layer by the low refractive index modulation layer. The high refractive index lens layer includes a plurality of lens portions spaced apart from each other and respectively in the plurality of subpixels.

A manufacturing method of a display device includes: stacking a release layer over a first substrate; forming a conductor pattern over the release layer; forming a sacrificial layer over the conductor pattern; forming a second substrate including a polymer layer over the sacrificial layer; forming an electronic element including a conductor over the second substrate; forming a pattern corresponding to the conductor pattern in the sacrificial layer; transferring the conductor pattern from the release layer to a surface of the second substrate; and removing the first substrate, the release layer, and the sacrificial layer.

A laminate which allows to obtain an organic thin-film solar cell having excellent output characteristics and transparency is provided. The laminate as above has a titanium oxide layer that is disposed on the member serving as a light-transmissive electrode layer and serves as an electron transport layer. The titanium oxide layer has a thickness of not less than 1.0 nm and not more than 200.0 nm. The titanium oxide layer contains indium oxide and metallic indium, InOx/Ti is not less than 0.50 and not more than 20.00 in atomic ratio, and InM/Ti is less than 0.100 in atomic ratio, where an elemental titanium content is represented by Ti, an indium oxide content is represented by InOx, and a metallic indium content is represented by InM.