An example device includes a magnetic device, a first magnetic shielding, and a second magnetic shielding. The magnetic device is configured to determine a perpendicular magnetization that extends along a z-axis. The first magnetic shielding comprises a first magnetic material, the first magnetic shielding extending at least partially between a first surface of the magnetic device and a second surface of the magnetic device in the z-axis. The first surface is on an opposite side of the magnetic device from the second surface of the magnetic device. The second magnetic shielding comprises a second magnetic material, the second magnetic shielding extending at least partially between a third surface of the magnetic device and a fourth surface of the magnetic device in an x-axis. The fourth surface is on an opposite side of the magnetic device from the third surface of the magnetic device.

A method of manufacturing one or more interconnects to magnetoresistive structure comprising (i) depositing a first conductive material in a via; (2) etching the first conductive material wherein, after etching the first conductive material a portion of the first conductive material remains in the via, (3) partially filling the via by depositing a second conductive material in the via and directly on the first conductive material in the via; (4) depositing a first electrode material in the via and directly on the second conductive material in the via; (5) polishing a first surface of the first electrode material wherein, after polishing, the first electrode material is (i) on the second conductive material in the via and (ii) over the portion of the first conductive material remaining in the via; and (6) forming a magnetoresistive structure over the first electrode material.

A magnetoresistance effect element has a first ferromagnetic metal layer, a second ferromagnetic metal layer, and a tunnel barrier layer that is sandwiched between the first and second ferromagnetic metal layers, and the tunnel barrier layer has a spinel structure represented by a composition formula of AIn.sub.2O.sub.x (0<x≤4), and an A-site is a non-magnetic divalent cation which is one or more selected from a group consisting of magnesium, zinc and cadmium.

A magnetoresistance effect element has a first ferromagnetic metal layer, a second ferromagnetic metal layer, and a tunnel barrier layer that is sandwiched between the first and second ferromagnetic metal layers, and the tunnel barrier layer has a spinel structure represented by a composition formula of AIn.sub.2O.sub.x (0<x≤4), and an A-site is a non-magnetic divalent cation which is one or more selected from a group consisting of magnesium, zinc and cadmium.

The present disclosure provides a semiconductor structure. The semiconductor structure includes a substrate, a transistor region, a first and a second contact plug, a first metal via, a magnetic tunneling junction (MTJ) structure, and a metal interconnect. The transistor region includes a gate over the substrate, and a first and a second doped regions at least partially in the substrate. The first and the second contact plug are over the transistor region. The first and the second contact plug include a coplanar upper surface. The first metal via and the MTJ structure are over the first and the second contact plug, respectively. The first metal via is leveled with the MTJ structure. The metal interconnect is over the first metal via and the MTJ structure, and the metal interconnect includes at least two second metal vias in contact with the first metal via and the MTJ structure, respectively.

A magnetoresistive stack/structure and method of manufacturing same comprising wherein the stack/structure includes a seed region, a fixed magnetic region disposed on and in contact with the seed region, a dielectric layer(s) disposed on the fixed magnetic region and a free magnetic region disposed on the dielectric layer(s). In one embodiment, the seed region comprises an alloy including nickel and chromium having (i) a thickness greater than or equal to 40 Angstroms (+/−10%) and less than or equal to 60 Angstroms (+/−10%), and (ii) a material composition or content of chromium within a range of 25-60 atomic percent (+/−10%) or 30-50 atomic percent (+/−10%).

A magnetoresistive stack/structure and method of manufacturing same comprising wherein the stack/structure includes a seed region, a fixed magnetic region disposed on and in contact with the seed region, a dielectric layer(s) disposed on the fixed magnetic region and a free magnetic region disposed on the dielectric layer(s). In one embodiment, the seed region comprises an alloy including nickel and chromium having (i) a thickness greater than or equal to 40 Angstroms (+/−10%) and less than or equal to 60 Angstroms (+/−10%), and (ii) a material composition or content of chromium within a range of 25-60 atomic percent (+/−10%) or 30-50 atomic percent (+/−10%).

A semiconductor storage according to an embodiment of the present disclosure includes two power source paths, and a connection path that connects the power source paths. Each of the power source paths includes a power gate transistor and a current source transistor which are coupled in series. The connection path connects ends of the respective power source paths on a side of the current source transistor. The semiconductor storage further includes a storage element, and a switch element inserted between the connection path and the storage element. A back gate is coupled to an internal node in the current source transistor provided in a low-side path of the two power source paths.

A semiconductor storage according to an embodiment of the present disclosure includes two power source paths, and a connection path that connects the power source paths. Each of the power source paths includes a power gate transistor and a current source transistor which are coupled in series. The connection path connects ends of the respective power source paths on a side of the current source transistor. The semiconductor storage further includes a storage element, and a switch element inserted between the connection path and the storage element. A back gate is coupled to an internal node in the current source transistor provided in a low-side path of the two power source paths.

A device including a multi-layered structure that includes: a first layer that includes a first magnetic Heusler compound; a second layer that is non-magnetic at room temperature and includes both Ru and at least one other element E, wherein the composition of the second layer is represented by Ru1−xEx, with x being in the range from 0.45 to 0.55; and a third layer including a second magnetic Heusler compound. The multi-layered structure may overlay a substrate. The device may include a tunnel barrier overlying the multi-layered structure.