The present disclosure provides a thruster device. The device includes a force-generating element mounted to a housing. The element is configured to generate a thrust force for propelling the housing. The element including a first electrode connected to a first input terminal of a power source. A second electrode is spaced apart by a predetermined distance from the first electrode and connected to a second input terminal of the power source. The second electrode includes a second longitudinal axis oriented parallelly to a first longitudinal axis. A dielectric medium is disposed between the electrodes. Upon receiving field emission condition, charged particles available at the first electrode accelerate towards the second electrode for generating a thrust force along a direction of movement of the charged particles. The thrust force is generated when the predetermined distance between the electrodes is shorter than a Rindler horizon defined by the charged particles during acceleration.

A beam injector may include a cathode emitter to emit electrons and an electrode to bias at least a portion of the electrons to remain on the cathode emitter and focus the emitted electrons into an electron beam. The beam injector may also include a resistor coupled between the cathode emitter and the electrode and configured to allow self-regulation of a voltage potential on the electrode based at least in part on a current of the electron beam.

A filament assembly can include: a button having a planar emitter region with one or more apertures extending from an emission surface of the planar emitter region to an internal surface opposite of the emission surface; an inlet electrical lead coupled to the button at a first side; an outlet electrical lead coupled to the button at a second side opposite of the first side; and a low work function object positioned adjacent to the internal surface of the planar emitter region and retained to the button. The planar emitter region can include a plurality of apertures. The low work function object can include a porous ceramic material having the barium, and may have a polished external surface. An electron gun can include the filament assembly. An additive manufacturing system can include the electron gun having the filament assembly.

A filament assembly can include: a button having a planar emitter region with one or more apertures extending from an emission surface of the planar emitter region to an internal surface opposite of the emission surface; an inlet electrical lead coupled to the button at a first side; an outlet electrical lead coupled to the button at a second side opposite of the first side; and a low work function object positioned adjacent to the internal surface of the planar emitter region and retained to the button. The planar emitter region can include a plurality of apertures. The low work function object can include a porous ceramic material having the barium, and may have a polished external surface. An electron gun can include the filament assembly. An additive manufacturing system can include the electron gun having the filament assembly.

An image intensifier sensor for acquiring, amplifying and displaying images and including a vacuum envelope, the image intensifier sensor including a photocathode arranged for releasing photoelectrons into the vacuum envelope upon electromagnetic radiation acquired from the images which impinges the photocathode, an anode, spaced apart from and in facing relationship with the photocathode, arranged for receiving the photoelectrons and converting the photoelectrons for displaying the images on the basis thereof, and a power supply unit for providing power to the image intensifier sensor, wherein the image intensifier sensor further includes potting material, wherein the potting material comprises a foam compound.

An electron beam source is provided that includes a vessel forming a chamber, a cathode disposed within the chamber, the cathode comprising a low dimensional electrically conductive material having an anisotropic restricted thermal conductivity, an electrode disposed in the chamber, the electrode being connectable to a power source for applying a positive voltage to the electrode relative to the cathode for accelerating free electrons away from the cathode to form an electron beam when the cathode is illuminated by electromagnetic (EM) radiation such that the cathode thermionically emits free electrons, and an electron emission window in the chamber for passing a generated electron beam out of the chamber. An electron microscope that incorporates the electron beam source is also provided.

An electron beam source is provided that includes a vessel forming a chamber, a cathode disposed within the chamber, the cathode comprising a low dimensional electrically conductive material having an anisotropic restricted thermal conductivity, an electrode disposed in the chamber, the electrode being connectable to a power source for applying a positive voltage to the electrode relative to the cathode for accelerating free electrons away from the cathode to form an electron beam when the cathode is illuminated by electromagnetic (EM) radiation such that the cathode thermionically emits free electrons, and an electron emission window in the chamber for passing a generated electron beam out of the chamber. An electron microscope that incorporates the electron beam source is also provided.

Disclosed are methods and devices suitable for producing an electron beam.

Novel and advantageous systems and methods for performing X-ray imaging by using an X-ray source with source grating functionality incorporated therein are provided. An electron beam can be electromagnetically manipulated such that the X-ray source emits radiation in a pattern that is the same as if the radiation had already passed through a source grating.

An apparatus for coupling to an input connection of an electron gun, the input connection having a heater terminal and a cathode terminal, includes: a connector having a first end and a second end; wherein the first end of the connector is configured to attach to a cable; wherein the second end of the connector is configured to connect to the input connection of the electron gun; and wherein the connector comprises an opening configured to receive the heater terminal of the input connection of the electron gun.