The present invention provides a packaging unit for liquid sample loading devices applied in an electron microscope. The liquid sample loading devices may be easily, rapidly, precisely and stably aligned and packaged by an engagement of an upper jig and a bottom jig as well as a first fixing pillar supported in a slide track of the packaging unit. Accordingly, efficiency and a yield of packaging the liquid sample loading devices may be improved. In addition, the packaging unit for the liquid sample loading devices of the present invention may directly package a liquid sample, and thus the liquid sample may maintain its original state.

A method for evaluating a specimen, the method can include positioning an energy dispersive X-ray (EDX) detector at a first position; scanning a flat surface of the specimen by a charged particle beam that exits from a charged particle beam optics tip and propagates through an aperture of an EDX detector tip; detecting, by the EDX detector, x-ray photons emitted from the flat surface as a result of the scanning of the flat surface with the charged particle beam; after a completion of the scanning of the flat surface, positioning the EDX detector at a second position in which a distance between the EDX detector tip and a plane of the flat surface exceeds a distance between the plane of the flat surface and the charged particle beam optics tip; and wherein a projection of the EDX detector on the plane of the flat surface virtually falls on the flat surface when the EDX detector is positioned at the first position and when the EDX detector is positioned at the second position.

A method for evaluating a specimen, the method can include positioning an energy dispersive X-ray (EDX) detector at a first position; scanning a flat surface of the specimen by a charged particle beam that exits from a charged particle beam optics tip and propagates through an aperture of an EDX detector tip; detecting, by the EDX detector, x-ray photons emitted from the flat surface as a result of the scanning of the flat surface with the charged particle beam; after a completion of the scanning of the flat surface, positioning the EDX detector at a second position in which a distance between the EDX detector tip and a plane of the flat surface exceeds a distance between the plane of the flat surface and the charged particle beam optics tip; and wherein a projection of the EDX detector on the plane of the flat surface virtually falls on the flat surface when the EDX detector is positioned at the first position and when the EDX detector is positioned at the second position.

An apparatus for analyzing and/or processing a sample with a particle beam, comprising: a sample stage for holding the sample; a providing unit for providing the particle beam comprising: an opening for guiding the particle beam to a processing position on the sample; and a shielding element for shielding an electric field generated by charges accumulated on the sample; wherein the shielding element covers the opening, is embodied in sheetlike fashion and comprises an electrically conductive material; wherein the shielding element comprises a convex section, this section being convex in relation to the sample stage; and wherein the convex section has a through opening for the particle beam to pass through to the sample.

An apparatus for analyzing and/or processing a sample with a particle beam, comprising: a sample stage for holding the sample; a providing unit for providing the particle beam comprising: an opening for guiding the particle beam to a processing position on the sample; and a shielding element for shielding an electric field generated by charges accumulated on the sample; wherein the shielding element covers the opening, is embodied in sheetlike fashion and comprises an electrically conductive material; wherein the shielding element comprises a convex section, this section being convex in relation to the sample stage; and wherein the convex section has a through opening for the particle beam to pass through to the sample.

A system and method for etching workpieces in a uniform manner are disclosed. The system includes a semiconductor processing system that generates a ribbon ion beam, and a workpiece holder that scans the workpiece through the ribbon ion beam. The workpiece holder includes a plurality of independently controlled thermal zones so that the temperature of different regions of the workpiece may be separately controlled. In certain embodiments, etch rate uniformity may be a function of distance from the center of the workpiece, also referred to as radial non-uniformity. Further, when the workpiece is scanned, there may also be etch rate uniformity issues in the translated direction, referred to as linear non-uniformity. The present workpiece holder comprises a plurality of independently controlled thermal zones to compensate for both radial and linear etch rate non-uniformity.

The invention concerns a crucible assembly for physical vapor deposition on a surface comprising: a base (22) to support and drive in rotation a crucible (18) around a rotational axis (A), the base comprising a base upper surface (34) having a first alignment relief (30), a crucible (18) comprising: at least one cavity (24) disposed at a peripheral area (38) of the crucible (18) with regard to the rotational axis (A), a crucible bottom surface (25) intended to contact the base upper surface (34) of the base (22), the crucible bottom surface (25) having a second alignment relief (32) which is complementary shaped with regard to the first alignment relief (30), the second (32) alignment relief being disposed at a central area (36) of the crucible (18) with regard to the rotation axis (A).

A system for grounding a mask using a grounding component are provided. Some embodiments of the system include a grounding component comprising a base and an extension protruding from the base and comprising a conductive prong configured to contact a conductive layer of the mask. Some embodiments of the system include a plurality of conductive prongs configured to contact multiple positions of a conductive layer of the mask. Some other embodiments of the system include an extension comprising various shapes.

A sample cartridge has a sample stand and an inclining mechanism. A sample cartridge holding apparatus has a housing part which is inclined. When the sample cartridge is inserted into the housing part, a contact portion contacts a lever of the inclining mechanism, and the sample stand is inclined by a predetermined angle. With this process, an appropriate inclination angle is realized for the sample stand.

A sample cartridge has a sample stand and an inclining mechanism. A sample cartridge holding apparatus has a housing part which is inclined. When the sample cartridge is inserted into the housing part, a contact portion contacts a lever of the inclining mechanism, and the sample stand is inclined by a predetermined angle. With this process, an appropriate inclination angle is realized for the sample stand.