An electron microscope that measures electromagnetic field information separates an electric field distribution and a magnetic field distribution of a specimen with high precision to measure the electromagnetic field information. The electron microscope is configured with an electron source 1, an electron gun deflection coil 3, converging lenses 4a and 4b, an irradiation system astigmatic compensation coil 5, irradiation system deflection coils 6a and 6b, a magnetic field application coil 8, an objective lens 11, an imaging system astigmatic compensation coil 12, imaging system deflection coils 13a and 13b, a magnifying lens 17, an electron detector 18, a control analysis apparatus 20, and the like, and the control analysis apparatus 20 repeats a plurality of times measurement of first electromagnetic field information with an output signal from the electron detector by exercising first electron beam control after a first magnetic field is applied to the specimen 10 and then measurement of second electromagnetic field information similarly by exercising second electron beam control after a second magnetic field is applied to the specimen, and separates and measures an electric field distribution and a magnetic field distribution with high precision from the obtained first and second electromagnetic field information.

Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.

Concepts and technologies are disclosed herein for an installation location noise floor evaluation device. The device can be configured to receive a radio frequency signal emitted by a radio frequency device that emits a radio frequency signal that can enter into an installation location and detect a radio frequency noise floor associated with the installation location based on the radio frequency signal. The installation location noise floor evaluation device can compare the radio frequency noise floor to a noise floor threshold associated with an operating frequency of a device, generating an indication that indicates an outcome of the comparing, and output the indicator.

An electron microscope that measures electromagnetic field information separates an electric field distribution and a magnetic field distribution of a specimen with high precision to measure the electromagnetic field information. The electron microscope is configured with an electron source 1, an electron gun deflection coil 3, converging lenses 4a and 4b, an irradiation system astigmatic compensation coil 5, irradiation system deflection coils 6a and 6b, a magnetic field application coil 8, an objective lens 11, an imaging system astigmatic compensation coil 12, imaging system deflection coils 13a and 13b, a magnifying lens 17, an electron detector 18, a control analysis apparatus 20, and the like, and the control analysis apparatus 20 repeats a plurality of times measurement of first electromagnetic field information with an output signal from the electron detector by exercising first electron beam control after a first magnetic field is applied to the specimen 10 and then measurement of second electromagnetic field information similarly by exercising second electron beam control after a second magnetic field is applied to the specimen, and separates and measures an electric field distribution and a magnetic field distribution with high precision from the obtained first and second electromagnetic field information.

Described herein are a system and method of preparing integrated circuits (ICs) so that the ICs remain electrically active and can have their active circuitry probed for diagnostic and characterization purposes using charged particle beams. The system employs an infrared camera capable of looking through the silicon substrate of the ICs to image electrical circuits therein, a focused ion beam system that can both image the IC and selectively remove substrate material from the IC, a scanning electron microscope that can both image structures on the IC and measure voltage contrast signals from active circuits on the IC, and a means of extracting heat generated by the active IC. The method uses the system to identify the region of the IC to be probed, and to selectively remove all substrate material over the region to be probed using ion bombardment, and further identifies endpoint detection means of milling to the required depth so as to observe electrical states and waveforms on the active IC.

Apparatuses including test segment circuits and methods for testing the same are disclosed. An example apparatus includes a plurality of segment lines configured to form a ring around a die and a plurality of test segment circuits, each test segment circuit coupled to at least two segment lines of the plurality of segment lines. Each test segment circuit is coupled to a portion of a first signal line, a portion of a second signal line, and a portion of a third signal line and each test segment circuit is configured to control an operation performed on at least one segment line of the plurality of segment lines.

An optical cavity is defined by a first mirror and a second mirror. The first mirror has a front surface that includes a first concave mirror. The second mirror has a front surface that includes a second concave mirror. The optical cavity has a resonant optical mode with a small focal spot size. The optical cavity may be used in a method of enhancing phase contrast in an electron beam image, and associated system for electron beam imaging or electron-beam spectroscopy, with a transmission electron beam microscope.

A particle beam device including a magnet, the device including: a particle beam source configured to emit electron and ion beams; a plurality of yokes arranged in a substantially rectangular shape; a coil set including a plurality of coils, wherein windings of the plurality of coils are uniformly distributed across and wound around the plurality of yokes, wherein the coil set is configured to produce both dipole and quadrupole fields, wherein the magnet is configured to deflect and focus electron and ion beams.

In some embodiments, a system for measuring magnetic fields produced within a microscope comprising an electromagnetic lens includes a sensor support element configured to be mounted to a distal end of an elongated support member that is configured to be inserted into the microscope, and a magnetic field sensor supported by the sensor support element, the magnetic field sensor being configured to sense magnetic fields at a position within the electron microscope at which specimens are imaged during operation of the microscope.

A particle beam device including a magnet, the device including: a particle beam source configured to emit electron and ion beams; a plurality of yokes arranged in a substantially rectangular shape; a coil set including a plurality of coils, wherein windings of the plurality of coils are uniformly distributed across and wound around the plurality of yokes, wherein the coil set is configured to produce both dipole and quadrupole fields, wherein the magnet is configured to deflect and focus electron and ion beams.