A gas feed device includes a feed unit that feeds a gaseous state of a first precursor and/or a gaseous state of a second precursor, a first line device that conducts the gaseous state of the first precursor to the feed unit and a second line device that conducts the gaseous state of the second precursor to the feed unit. A first valve is arranged between the first line device and the feed unit. A second valve is arranged between the second line device and the feed unit. A control valve is connected to the first valve and is arranged between the first valve and the feed unit. The control valve is connected to the second valve and is arranged between the second valve and the feed unit. The first valve, the second valve and/or the control valve may be magnetic valve(s).

An ion source is configured to form an ion beam and has an arc chamber enclosing an arc chamber environment. A reservoir apparatus can be configured as a repeller and provides a liquid metal to the arc chamber environment. A biasing power supply electrically biases the reservoir apparatus with respect to the arc chamber to vaporize the liquid metal to form a plasma in the arc chamber environment. The reservoir apparatus has a cup and cap defining a reservoir environment for the liquid metal that is fluidly coupled to the arc chamber environment by holes in the cap. Features extend from the cup into the reservoir and contact the liquid metal to feed the liquid metal toward the arc chamber environment by capillary action. A structure, surface area, roughness, and material modifies the capillary action. The feature can be an annular ring, rod, or tube extending into the liquid metal.

The invention relates to a gas reservoir (3000) for receiving a precursor (3035). The gas reservoir (3000) has a gas-receiving unit (3004) which is arranged in a first receiving unit (3002) of a basic body (3001), and a sliding unit (3007) which is arranged movably in a second receiving unit (3003) of the basic body (3001). The gas-receiving unit (3004) has a movable closure unit (3006) for opening or closing a gas outlet opening (3005) of the gas-receiving unit (3004). In a first position of the sliding unit (3007), both a first opening (3009) of a sliding-unit line device (3008) is fluidically connected to a first basic body opening (3011) and a second opening (3010) of the sliding-unit line device (3008) is fluidically connected to a second basic body opening (3012). In the second position of the sliding unit (3007), both the first opening (3009) is arranged at an inner wall (3015) of the second receiving unit (3003) and the second opening (3010) is arranged at the movable closure unit (3006).

An apparatus may include an exciter, disposed within a resonance chamber, to generate an RF power signal. The apparatus may include a resonator coil, disposed within the resonance chamber, to receive the RF power signal, and generate an RF output signal; and a pickup loop assembly, to receive the RF output signal and output a pickup voltage signal. The pickup loop assembly may include a pickup loop, disposed within the resonance chamber; and a variable attenuator, disposed at least partially between the resonator coil and the pickup loop. The variable attenuator may include a configurable portion, movable from a first position, attenuating a first amount of the RF output signal, to a second position, attenuating a second amount of the RF output signal, different from the first amount.

A standard reference plate is configured for insertion into an additive manufacturing apparatus for calibrating an electron beam of the additive manufacturing apparatus. The standard reference plate includes a lower plate and an upper plate being essentially in parallel and attached spaced apart from each other, the upper plate including a plurality of holes. A predetermined hollow pattern is provided inside the holes, and a spacing between the holes and the size of the holes and a distance between the upper plate and the lower plate and a position of an x-ray sensor of the additive manufacturing apparatus with respect to the standard reference plate are arranged so that x-rays emanating from the lower plate, when the electron beam is passing through a hollow part of the hollow pattern, will not pass directly from the lower plate through any one of the holes to the x-ray sensor.

An electrostatic beam transfer lens for a multi-beam apparatus that includes a series of multiple, successive electrodes, such that an aperture bore of each electrode is aligned along an electron gun axis and is configured to allow multiple beams to pass therethrough. The first electrode in the series is a cylindrical electrode configured to receive the multiple beams at an entrance plane. The first electrode has a bore length and a bore diameter such that a ratio of bore diameter/bore length<0.3. The shape of the first electrode defines the electrostatic field penetration to the entrance plane of the first electrode to prevent lens focusing fields of the electrostatic beam transfer lens from extending through the first electrode and beyond the entrance plane, thus providing a uniform, flat electric field at the entrance area of the electrostatic transfer lens.

A beam position monitor is provided, for measuring a position of a beam of charged particles passing through a chamber, the beam position monitor including a first magnetic field sensor and a second magnetic field sensor configured to be installed in the chamber on either side of the beam of charged particles, each magnetic field sensor including a conductive loop, the conductive loop of the first magnetic field sensor and the conductive loop of the second magnetic field sensor being configured to have inductances different from one another. A measurement system and a particle accelerator are also provided.

An ion source can include a magnetic field generator configured to generate a magnetic field in a direction parallel to a direction of the electron beam and coincident with the electron beam. However, this magnetic field can also influence the path of ionized sample constituents as they pass through and exit the ion source. An ion source can include an electric field generator to compensate for this effect. As an example, the electric field generator can be configured to generate an electric field within the ion source chamber, such that an additional force is imparted on the ionized sample constituents, opposite in direction and substantially equal in magnitude to the force imparted on the ionized sample constituents by the magnetic field.

An electrostatic beam transfer lens for a multi-beam apparatus that includes a series of multiple, successive electrodes, such that an aperture bore of each electrode is aligned along an electron gun axis and is configured to allow multiple beams to pass therethrough. The first electrode in the series is a cylindrical electrode configured to receive the multiple beams at an entrance plane. The first electrode has a bore length and a bore diameter such that a ratio of bore diameter/bore length<0.3. The shape of the first electrode defines the electrostatic field penetration to the entrance plane of the first electrode to prevent lens focusing fields of the electrostatic beam transfer lens from extending through the first electrode and beyond the entrance plane, thus providing a uniform, flat electric field at the entrance area of the electrostatic transfer lens.

A system for melting, sintering, or heat treating a material is provided. The system includes a cathode, an anode, and a focus coil assembly having a quadrupole magnet. The quadrupole magnet includes four poles and a yoke. The four poles are spaced apart and surround a beam cavity. Each of the four poles includes a pole face proximate the beam cavity and an end opposite the pole face. The first and third poles are aligned along an x-axis and configured to have a first magnetic polarity at their respective pole faces and a second magnetic polarity opposite the first magnetic polarity at their respective ends. The second and fourth poles are aligned along a y-axis and configured to have the second magnetic polarity at their respective pole faces and the first magnetic polarity at their respective ends. The yoke surrounds the poles and is coupled to the poles.