There is provided a photoreactor for the remediation of gaseous emissions and/or contaminated water using ultraviolet (UV) or vacuum ultraviolet (VUV). There is also provided an emission source for generating UV and/or VUV, the source comprising: a microwave generator; a chamber arranged to receive microwaves generated by the microwave generator, the chamber comprising: a gas comprising species for forming excimers; a resonator arranged to receive the microwaves in the chamber and generate a plasma; a first electrode spaced apart from the resonator; and a voltage source configured to generate an electric field between the resonator and the first electrode, wherein, on application of the electric field, the electric field drives electrons and/or ions from the plasma to generate excimers and produce vacuum ultraviolet or ultraviolet emission. There are also provided methods of generating UV and/or VUV, and methods of remediating fluids.

Multilayer articles are provided, including an absorbent layer and an ultraviolet mirror containing at least a plurality of alternating first and second optical layers. The absorbent layer absorbs ultraviolet light having a wavelength between at least 230 nanometers (nm) and 400 nm. The ultraviolet mirror reflects ultraviolet light in a wavelength range from 190 nm to 240 nm. Systems are also provided including a broadband UVC light source and a multilayer article. Devices are provided including a chamber, a broadband UVC light source located within the chamber, an absorbent layer in the chamber, and an ultraviolet mirror between the light source and absorbent layer. Methods of disinfecting a material are further provided, including obtaining a system or device, directing UVC light at the ultraviolet mirror, and exposing the material to ultraviolet light in a wavelength range from 190 nm to 240 nm, reflected by the ultraviolet mirror towards the material.

An excimer bulb assembly including a krypton/chlorine excimer bulb and a pass filter. The excimer bulb assembly does not emit substantial UV C radiation in wavelengths longer than deadly 240 nm through UV C wavelengths. The pass filter is adapted to block substantial UV C radiation in wavelengths in the range of 240 nm-280 nm. The assembly may include a captured reflector, a smart chip, and/or a heat sink. The bulb and its electrical connectors may form a cartridge. The assembly may include a housing and the cartridge may swivel in the housing.

A can type fixture including a housing adapted for insertion into a hole in a ceiling. An excimer bulb or plurality of excimer bulbs supported in the housing and adapted for emitting Far UV C radiation at a plurality of wavelengths. A filter or a plurality of filters adapted for removing Far UV C wavelengths harmful to humans. A reflector and/or a diffusion layer. A driver/power supply is supported by the housing. The driver/power supply is adapted for providing electrical power to the excimer bulb(s) and is in electrical communication with the excimer bulb(s). The driver/power supply may be adapted to dim the excimer bulb(s). An illumination element, such as an LED array may be supported in the housing. The fixture may also include a motion sensor, crowd density sensor, proximity sensor, and/or distance sensor and may communicate via IoT.

A broadband radiation source is disclosed. The source may include a gas containment vessel configured to maintain a plasma and emit broadband radiation. The source may also include a recirculation gas loop fluidically coupled to the gas containment vessel. The recirculation gas loop may be configured to transport gas from one or more gas boosters configured to pressurize the low-pressure gas into a high-pressure gas and transport the high-pressure gas to the recirculation loop via an outlet. The system includes a pressurized gas reservoir fluidically coupled to the outlet of the one or more gas boosters and is configured to receive and store high pressure gas from the one or more gas boosters. The source includes a pressurized gas reservoir located between the one or more gas boosters and the gas containment vessel and is configured to receive and store high pressure gas from the one or more gas boosters.

A light emitting unit includes a light emitting sealed body and a voltage application circuit. The light emitting sealed body includes a container to which laser light for maintaining plasma is incident and from which light from the plasma is emitted, a first electrode which includes a first discharge portion, and a second electrode which includes a second discharge portion. An end portion of the first discharge portion has a shape in which a thickness is thinned as it goes toward the second discharge portion and an end surface of the second discharge portion extends along a plane perpendicular to an extending direction of the first discharge portion. The voltage application circuit controls a potential difference between the first electrode and the second electrode by adjusting a voltage applied to at least the first electrode.

An excimer bulb assembly, with an excimer bulb, at least one integral captured reflector, and an integral filter such that the excimer bulb only emits substantial UV radiation between 200 nm and 230 nm, using a filter that passes light from about 200 nm to 234 nm (+/−2 nm).

An excimer bulb assembly including an excimer bulb emitting a beam of UV light at a wavelength of 222 nm. The excimer bulb may include a filter that blocks any unwanted wavelengths of UV light. The assembly includes a focusing lens positioned a distance from the excimer bulb such that the emitted beam of UV light strikes the focusing lens at an angle. The distance between the excimer bulb and the focusing lens may be varied such that the angle changes when the distance is varied. A plurality of excimer bulbs emitting a beam of UV light at a wavelength of 222 nm in a pattern may be including in a fixture. The fixture may include a housing with the plurality of excimer bulbs are secured in the housing. At least one of the plurality of excimer bulbs may be adapted to independently swivel with respect to the housing so as to change the pattern of the emitted beam of UV light. Each of the plurality of excimer bulbs may be adapted to independently tilt with respect to the housing.

An excimer bulb fixture including an excimer bulb emitting a beam of UV light at a far UV C wavelength. The fixture includes a krypton/chloride bulb, a band pass filter and a diffusion layer or lens. The krypton/chloride bulb is adapted to project a beam of far UV C light through the filter and then through the diffusion layer or lens. The band pass filter is adapted to block substantial UV radiation wavelengths longer than 234 nm. The diffusion layer or lens is adapted to widen the beam of far UV C light. A method far widening a beam of far UV C light includes the steps of projecting a beam of far UV C light produced by a krypton/chloride bulb through a band pass filter; blocking substantially UV C radiation longer than 234 nm; projecting the filtered beam through a diffusion filter or lens; and, widening the filtered beam.

An excimer bulb assembly including a krypton/chlorine excimer bulb and a pass filter. The excimer bulb assembly does not emit substantial UV C radiation in wavelengths longer than deadly 240 nm through UV C wavelengths. The pass filter is adapted to block substantial UV C radiation in wavelengths in the range of 240 nm-280 nm. The assembly may include a captured reflector, a smart chip, and/or a heat sink. The bulb and its electrical connectors may form a cartridge. The assembly may include a housing and the cartridge may swivel in the housing.