H01J61/86

Light irradiation device and method for patterning self assembled monolayer

Disclosed herein a vacuum ultra violet light source device that is capable of suppressing an amount of ozone generation when the vacuum ultra violet light is emitted into an atmosphere containing oxygen, a light irradiation device incorporating the vacuum ultra violet light device, and a method of patterning a self-assembled monolayer employing the light irradiation device. The light irradiation device is configured to irradiate a self-assembled monolayer (SAM) formed on a workpiece with light containing vacuum ultra violet light through a mask M on which a prescribed pattern is formed so as to perform a patterning process of the SAM. The light containing the vacuum ultra violet light to be irradiated onto the SAM is light that is pulsed light and has a duty ratio of light emission equal to or greater than 0.00001 and equal to or less than 0.01.

DC gas discharge lamp having a thorium-free cathode
10056245 · 2018-08-21 · ·

A DC gas discharge lamp includes an anode and a cathode having a first cathode segment, which forms the surface of the cathode at least in a region of the cathode which faces the anode and has an arc attachment region, within which an arc burning between the cathode and the anode attaches during lamp operation as intended. The first cathode segment consists of tungsten with at least one emitter material for reducing the work function of electrons from the cathode. The cathode is embodied in a manner free of thorium. The at least one emitter material has a melting point of less than 3200 K. At least one part of the surface of the cathode outside the arc attachment region is formed by a diffusion barrier for the at least one emitter material.

DC gas discharge lamp having a thorium-free cathode
10056245 · 2018-08-21 · ·

A DC gas discharge lamp includes an anode and a cathode having a first cathode segment, which forms the surface of the cathode at least in a region of the cathode which faces the anode and has an arc attachment region, within which an arc burning between the cathode and the anode attaches during lamp operation as intended. The first cathode segment consists of tungsten with at least one emitter material for reducing the work function of electrons from the cathode. The cathode is embodied in a manner free of thorium. The at least one emitter material has a melting point of less than 3200 K. At least one part of the surface of the cathode outside the arc attachment region is formed by a diffusion barrier for the at least one emitter material.

Manufacturing method of high-pressure discharge lamp and sealed part structure for high-pressure discharge lamp

A method of manufacturing a high-pressure discharge lamp, comprising the steps of: inserting a mount into an interior of a glass tube having an outer diameter smaller than an inner diameter of an end part of a sealed container; radially constricting the glass tube at a first position located away from a metallic foil toward a tip of an electrode; sealing the mount by a region of the glass tube that ranges from the first position to at least the other end of the metallic foil; protruding the electrode out of the glass tube located away from the first position toward the tip of the electrode to form a glass-tube air-tightly sealed mount; inserting the sealed mount into the end part of the sealed container; and radially constricting the end part of the sealed container to sealing the glass tube of the sealed mount by the end part.

Arc lamp with forming gas for thermal processing systems

Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.

Arc lamp with forming gas for thermal processing systems

Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.

DISCHARGE LAMP DRIVER, LIGHT SOURCE, PROJECTOR, AND METHOD OF DRIVING DISCHARGE LAMP
20180129128 · 2018-05-10 · ·

A discharge lamp driver includes a discharge lamp drive unit, a control unit, and a voltage detection part. When an inter-electrode voltage is smaller than a first predetermined value, the control unit controls the discharge lamp drive unit to provide a mixed period in which a first period and a second period are alternately repeated and a third period alternately including a first direct-current period and a second direct-current period. A length of the first direct-current period is larger than a length of the second direct-current period. The length of the second direct-current period is smaller than 0.5 ms. A total of the lengths of the first direct-current periods in the third period is larger than a length of the second period. When the inter-electrode voltage is smaller than the first predetermined value, the control unit is configured to increase the length of the third period in a stepwise manner.

Cooling apparatus, illumination optical system, exposure apparatus, and method of manufacturing article

A cooling apparatus for cooling a light source unit is provided. The cooling apparatus includes a cooling unit provided outside a path of light from the light source unit, and a heat pipe configured to connect a heat generating portion of the light source unit and the cooling unit. The heat pipe also serves as an electrode wire of the light source unit.

Discharge lamp, light source device, and projector
09952489 · 2018-04-24 · ·

The disclosure relates to a discharge lamp including a light emitting tube having a discharge space therein, and a pair of electrodes disposed in the discharge space so as to be opposed to each other, wherein a changing rate of a cross-sectional area is equal to or lower than 200%. The changing rate is a rate of change of the cross-sectional area in every 0.25 mm in a direction along an optical axis of the light emitting tube. The cross-sectional area is an area of a plane perpendicular to the optical axis in a space between an outside shape of at least one of the pair of electrodes and an inside wall of the light emitting tube.

Discharge lamp, light source device, and projector
09952489 · 2018-04-24 · ·

The disclosure relates to a discharge lamp including a light emitting tube having a discharge space therein, and a pair of electrodes disposed in the discharge space so as to be opposed to each other, wherein a changing rate of a cross-sectional area is equal to or lower than 200%. The changing rate is a rate of change of the cross-sectional area in every 0.25 mm in a direction along an optical axis of the light emitting tube. The cross-sectional area is an area of a plane perpendicular to the optical axis in a space between an outside shape of at least one of the pair of electrodes and an inside wall of the light emitting tube.