A plasma source is provided. The plasma source includes a chamber body, a supply passage, a vacuum connector, an antenna, a first insulator, a second insulator, and a conductor. The chamber body has an opening for emitting ions or electrons. The supply passage penetrates through a first peripheral wall of the chamber body. The vacuum connector is provided in a second peripheral wall of the chamber body at a position opposed to the opening. The antenna has a base end connected to the vacuum connector, and extends inside the chamber body toward the opening. The first insulator covers a first region of the antenna at a distal end of the antenna inside the chamber body. The second insulator covers a second region of the antenna at the base end of the antenna inside the chamber body. The conductor covers the second insulator.

According to one embodiment, an X-ray tube includes a cathode including a filament, an anode target, and an envelope. The cathode includes a metal lead wire supporter which is exposed outside the envelope, which is configured as a part of the envelope, and to which a lead wire as a power supplier to the filament is attached such that the lead wire passes both inside and outside of the envelope, and a metal filament supporter fixed on the lead wire supporter, being in contact with the lead wire supporter, and supporting the filament.

A charged particle device includes an electron emitting part for emitting electrons, an electron irradiated part configured to be irradiated with the electrons emitted from the electron emitting part, a container part configured to evacuate an interior thereof and contain the electron irradiated part in the interior thereof, an electric wire containing part configured to be inserted from an outside of the container part via an insertion part provided in the container part to contain an electric wire through which electricity is conducted to the electron irradiated part contained in the container part, and an insertion-part-side protrusion part configured to surround the electric wire containing part and protrude from a vicinity of the insertion part on an inner wall of the container part to an interior of the container part.

A plasma source is provided. The plasma source includes a chamber body, a supply passage, a vacuum connector, an antenna, a first insulator, a second insulator, and a conductor. The chamber body has an opening for emitting ions or electrons. The supply passage penetrates through a first peripheral wall of the chamber body. The vacuum connector is provided in a second peripheral wall of the chamber body at a position opposed to the opening. The antenna has a base end connected to the vacuum connector, and extends inside the chamber body toward the opening. The first insulator covers a first region of the antenna at a distal end of the antenna inside the chamber body. The second insulator covers a second region of the antenna at the base end of the antenna inside the chamber body. The conductor covers the second insulator.

An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

A multi-column scanning electron microscopy (SEM) system is disclosed. The SEM system includes a source assembly. The source assembly includes two or more electron beam sources configured to generate a plurality of electron beams. The source assembly also includes two or more sets of positioners configured to actuate the two or more electron beam sources. The SEM system also includes a column assembly. The column assembly includes a plurality of substrate arrays. The column assembly also includes two or more electron-optical columns formed by a set of column electron-optical elements bonded to the plurality of substrate arrays. The SEM system also includes a stage configured to secure a sample that at least one of emits or scatters electrons in response to the plurality of electron beams directed by the two or more electron-optical columns to the sample.

A low profile extraction electrode assembly including an insulator having a main body, a plurality of spaced apart mounting legs extending from a first face of the main body, a plurality of spaced apart mounting legs extending from a second face of the main body opposite the first face, the plurality of spaced apart mounting legs extending from the second face offset from the plurality of spaced apart mounting legs extending from the first face in a direction orthogonal to an axis of the main body, the low profile extraction electrode assembly further comprising a ground electrode fastened to the mounting legs extending from the first face, and a suppression electrode fastened to the mounting legs extending from the second face, wherein a tracking distance between the ground electrode and the suppression electrode is greater than a focal distance between the ground electrode and the suppression electrode.

Disclosed is an x-ray tube including a hybrid electron emission source, which uses, as an electron emission source, a cathode including both a field electron emission source and a thermal electron emission source. An x-ray tube includes an electron emission source emitting an electron beam, and a target part including a target material that emits an x-ray as the emitted electron beam collides with the target part, wherein the electron emission source includes a thermal electron emission source and a field electron emission source, and emits the electron beam by selectively using at least one of the thermal electron emission source and the field electron emission source.

A low profile extraction electrode assembly including an insulator having a main body, a plurality of spaced apart mounting legs extending from a first face of the main body, a plurality of spaced apart mounting legs extending from a second face of the main body opposite the first face, the plurality of spaced apart mounting legs extending from the second face offset from the plurality of spaced apart mounting legs extending from the first face in a direction orthogonal to an axis of the main body, the low profile extraction electrode assembly further comprising a ground electrode fastened to the mounting legs extending from the first face, and a suppression electrode fastened to the mounting legs extending from the second face, wherein a tracking distance between the ground electrode and the suppression electrode is greater than a focal distance between the ground electrode and the suppression electrode.

An X-ray generation device which can be efficiently used is provided. The X-ray generation device has an electron gun, a target unit, a tubular portion, a reflected electron detector, and a coil unit. The target unit includes a plurality of targets and a plurality of mark portions having a predetermined relationship with the targets, wherein each mark portion having a surface area larger than a surface area of the target when said target unit is viewed from a direction which is normal to principal faces of the target unit.