A transmission electron microscopy system for imaging a sample, comprising: a pulse generator for generating an initial electron pulse towards the sample, the initial electron pulse to be propagated through the sample to obtain a transmitted electron pulse; an encoding device for encoding the transmitted electron pulse according to a predefined pattern to obtain an encoded electron pulse; a shearing device for temporally shearing the encoded electron pulse in a given direction to obtain a given electron pulse; a detector for detecting the given electron pulse to obtain a single image of the sample; and a datacube generator for determining a spatiotemporal datacube from the single image using the predefined pattern, and outputting the spatiotemporal datacube.

A plasma gate device comprises a plasma creation chamber, first through fourth dielectrics, and first through sixth electrodes. The plasma creation chamber is a space in which plasma is created from a first fluid and a second fluid. The first and second dielectrics form upper and lower boundaries on a first side of the plasma creation chamber. The third and fourth dielectrics form upper and lower boundaries on a second side of the plasma creation chamber. The first and second electrodes receive voltages to generate a first electric field which creates a first plasma on the first side of the plasma creation chamber. The third and fourth electrodes receive voltages to generate a second electric field which creates a second plasma on the second side of the plasma creation chamber. The fifth electrode extracts electrons from the first plasma. The sixth electrode injects electrons into the second plasma.

Embodiments herein provide systems and methods for multi-area selecting etching. In some embodiments, a system may include a plasma source delivering a plurality of angled ion beams to a substrate, the substrate including a plurality of devices. Each of the plurality of devices may include a first angled grating and a second angled grating. The system may further include a plurality of blocking masks positionable between the plasma source and the substrate. A first blocking mask of the plurality of blocking masks may include a first set of openings permitting the angled ion beams to pass therethrough to form the first angled gratings of each of the plurality of devices. A second blocking mask of the plurality of blocking masks may include a second set of openings permitting the angled ion beams to pass therethrough to form the second angled gratings of each of the plurality of devices.

A system for defect review and classification is disclosed. The system may include a controller, wherein the controller may be configured to receive one or more training images of a specimen. The one or more training images including a plurality of training defects. The controller may be further configured to apply a plurality of difference filters to the one or more training images, and receive a signal indicative of a classification of a difference filter effectiveness metric for at least a portion of the plurality of difference filters. The controller may be further configured to generate a deep learning network classifier based on the received classification and the attributes of the plurality of training defects. The controller may be further configured to extract convolution layer filters of the deep learning network classifier, and generate one or more difference filter recipes based on the extracted convolution layer filters.

A transmission electron microscopy system for imaging a sample, comprising: a pulse generator for generating an initial electron pulse towards the sample, the initial electron pulse to be propagated through the sample to obtain a transmitted electron pulse; an encoding device for encoding the transmitted electron pulse according to a predefined pattern to obtain an encoded electron pulse; a shearing device for temporally shearing the encoded electron pulse in a given direction to obtain a given electron pulse; a detector for detecting the given electron pulse to obtain a single image of the sample; and a datacube generator for determining a spatiotemporal datacube from the single image using the predefined pattern, and outputting the spatiotemporal datacube.

A plasma gate device comprises a plasma creation chamber, first through fourth dielectrics, and first through sixth electrodes. The plasma creation chamber is a space in which plasma is created from a first fluid and a second fluid. The first and second dielectrics form upper and lower boundaries on a first side of the plasma creation chamber. The third and fourth dielectrics form upper and lower boundaries on a second side of the plasma creation chamber. The first and second electrodes receive voltages to generate a first electric field which creates a first plasma on the first side of the plasma creation chamber. The third and fourth electrodes receive voltages to generate a second electric field which creates a second plasma on the second side of the plasma creation chamber. The fifth electrode extracts electrons from the first plasma. The sixth electrode injects electrons into the second plasma.

The present disclosure relates to a collimator. The collimator may include a motor, a transmission unit having a first end and a second end, and a leaf unit having a leaf. The first end of the transmission unit may be connected to the motor and the second end of the transmission unit may be connected to the leaf. The present disclosure also relates to a collimator system. The collimator system may include a leaf module having a leaf, a driving module having a motor configured to drive the leaf, and a processing module to generate a movement profile of the leaf. The movement profile of the leaf may include a first speed during a first stage, a second speed of the leaf during a second stage, and a third speed of the leaf during a third stage.

The invention comprises an alignment guide apparatus and a method of use thereof for aligning an imaging beam, longitudinally passing through an exit nozzle of an imaging system, to an imaging zone of a sample, includes the steps of: (1) providing an alignment guide, the alignment guide comprising: (a) a guide wall at least partially circumferentially enclosing an aperture, (b) a first laser element connected to the guide wall, and (c) a second laser element connected to the guide wall; (2) inserting the exit nozzle of the imaging system into the aperture; (3) projecting a first line from the first laser element onto the sample; (4) projecting a second line from the second laser element onto the sample; and (5) moving the sample relative to the exit nozzle of the imaging system to position an intersection of the first line and the second line at the imaging zone to align the imaging beam to the imaging zone.

The present disclosure relates to a collimator. The collimator may include a motor, a transmission unit having a first end and a second end, and a leaf unit having a leaf. The first end of the transmission unit may be connected to the motor and the second end of the transmission unit may be connected to the leaf. The present disclosure also relates to a collimator system. The collimator system may include a leaf module having a leaf, a driving module having a motor configured to drive the leaf, and a processing module to generate a movement profile of the leaf. The movement profile of the leaf may include a first speed during a first stage, a second speed of the leaf during a second stage, and a third speed of the leaf during a third stage.

The present invention relates to adjustment of a mask position by driving an R-axis of an electron microscope in order to adjust the mask position with high accuracy while performing observation by the electron microscope without providing a heat generation source inside the electron microscope. The R-axis originally exists in a sample chamber of the electron microscope, which enables control with high accuracy. The R-axis driving of a sample stage can be substituted by raster rotation, therefore, the mask position can be adjusted with high accuracy while performing observation by the electron microscope according to the present invention.