A sample holder reliably holds a liquid or gel sample, and the yield of observation with a charged particle beam device is improved. A sample holder 101 includes a first member 102 that has a lid member 111 and a first chip 105 provided with a first window 123 where a laminated film including a first insulating thin film 104 is formed, and a second member 103 that has a base material 127 having a first bottom seal surface 203 and a second bottom seal surface 200, an electrode 108 disposed on the base material, and a second chip 107 provided with a second window 124 where a second insulating thin film 106 is formed and held on the second bottom seal surface via a second seal material 119 such that the second window faces the electrode, in which a region inside a first seal material is maintained airtightly from a region outside the first seal material by the first member and the second member being combined and the first seal material being crushed between the first bottom seal surface and an upper seal surface of the lid member.

A workstation is described for mounting specimens into a cryotransfer holder at cryogenic temperature. The workstation allows rotation about the cryotransfer holder axis to improve access to the sample placement area on the holder and to facilitate easy removal and retrieval of the sample after imaging. The cryotransfer holder includes a cylindrical dewar configured to maintain a constant center of mass about the holder axis regardless of orientation of the dewar.

A cryotransfer holder for mounting a specimen held at cryogenic temperature in an electron microscope is described. The holder includes a cylindrical dewar configured to maintain a constant center of mass about the holder axis regardless of orientation of the dewar. The holder further includes a sample shutter control mechanism that can be decoupled from the shutter to reduce vibration during imaging. There is also described a workstation for mounting specimens into the cryotransfer holder at cryogenic temperature. The workstation allows rotation about the cryotransfer holder axis to improve access to the sample placement area on the holder and to facilitate easy removal and retrieval of the sample after imaging.

The purpose of the present invention is to provide a specimen holder having a structure capable of maintaining a seal surface regardless of a change of environment. A specimen holder according to the present invention is characterized by comprising a specimen holder axis part having a specimen and/or a specimen mesh setting part, an external cylinder part capable of housing the specimen holder axis part, and a seal part for sealing the specimen and/or the specimen mesh setting part from atmosphere wherein the seal part is set to a step part which is set to a portion of the external cylinder part. Further, in a referred embodiment of a specimen holder according to the present invention, it is characterized in that the seal part set to the step part is as a first seal part, further the specimen holder has a second seal part which exists in a tip part of the specimen holder and exists in a direction of a central axis of an electron microscope comparing to the specimen and/or the specimen mesh setting part.

Provided is an apparatus for treating a substrate. The apparatus for treating the substrate includes a housing defining a treatment space formed by a combination of an upper housing and a lower housing, a gas supply unit configured to supply gas to the treatment space, a support unit including a chuck configured to support the substrate in the treatment space and an upper electrode provided to surround the check when viewed from a top view, a dielectric plate unit including a dielectric plate arranged to oppose the substrate supported by the support unit in the treatment space, and an upper electrode unit coupled to the dielectric plate unit and including an upper electrode arranged to oppose the lower electrode, in which the upper electrode unit is coupled to the lower housing.

A plasma processing apparatus includes: a plasma processing chamber; a base support disposed within the plasma processing chamber; a base having a first through hole penetrating from an upper surface of the base to a lower surface of the base and disposed on the base support; an electrostatic chuck having a second through hole communicating with the first through hole by penetrating from a substrate support surface or a ring support surface to a lower surface of the electrostatic chuck and disposed on the base; a first insulating member disposed within the first through hole; a second insulating member disposed within the first through hole to surround at least a portion of the first insulating member; a first sealing member disposed between the first insulating member and the electrostatic chuck; and a second sealing member disposed between the first insulating member and an insulating support member.

There is provided a technique that includes: an upper container; a lower container provided below the upper container and constituting a processing chamber between the lower container and the upper container; a first seal portion disposed in a boundary region between the upper container and the lower container, the first seal portion including a first seal member and a second seal member; and a support that includes a support face disposed at a highest position below the upper container, is provided between the first seal member and the second seal member in a horizontal direction, and is made of a material harder than the first seal member and the second seal member.

Apparatuses and systems for pedestals are provided. An example pedestal may have a body with an upper annular seal surface that is planar, perpendicular to a vertical center axis of the body, and has a radial thickness, a lower recess surface offset from the upper annular seal surface, and a plurality of micro-contact areas (MCAs) protruding from the lower recess surface, each MCA having a top surface offset from the lower recess surface by a second distance less, and one or more electrodes within the body. The upper annular seal surface may be configured to support an outer edge of a semiconductor substrate when the semiconductor substrate is being supported by the pedestal, and the upper annular seal surface and the tops of the MCAs may be configured to support the semiconductor substrate when the semiconductor substrate is being supported by the pedestal.

The purpose of the present invention is to provide a specimen holder having a structure capable of maintaining a seal surface regardless of a change of environment. A specimen holder according to the present invention is characterized by comprising a specimen holder axis part having a specimen and/or a specimen mesh setting part, an external cylinder part capable of housing the specimen holder axis part, and a seal part for sealing the specimen and/or the specimen mesh setting part from atmosphere wherein the seal part is set to a step part which is set to a portion of the external cylinder part. Further, in a referred embodiment of a specimen holder according to the present invention, it is characterized in that the seal part set to the step part is as a first seal part, further the specimen holder has a second seal part which exists in a tip part of the specimen holder and exists in a direction of a central axis of an electron microscope comparing to the specimen and/or the specimen mesh setting part.

There are provided a sample holder that allows in-situ observation of a sample such as a gas or liquid under light irradiation and an electron microscope. An environment cell is formed in combination of two silicon chips, each including a membrane and a frame supporting the membrane, the frame being provided on the opening. The environment cell is accommodated in a main body of the sample holder, and fixed by a lid. The openings of the lid, the two silicon chips, and the main body are placed so as to overlap with each other along the optical axis of an electron beam of an electron microscope. A light emitting element is placed at a position where any one of the openings of the two silicon chips is allowed to be irradiated with light.