H01J2237/2005

Micro-chamber for inspecting sample material

A micro-chamber for inspecting sample material can be filled with sample material immersed in a liquid without the need of applying vacuum tubing's to the micro-chamber. The micro-chamber includes an inspection volume for holding the sample material for observation. The inspection volume is defined by a first rigid layer, a second rigid layer spaced from the first rigid layer, and a hermetic seal between the first and the second rigid layers. One of the rigid layers includes thin part can be punctured. The liquid with immersed sample material, when placed upon the thin part, is sucked into the evacuated inspection volume when the thin part is punctured.

ELECTROSTATIC CHUCK WITH SEAL SURFACE

Apparatuses and systems for pedestals are provided. An example pedestal may have a body with an upper annular seal surface that is planar, perpendicular to a vertical center axis of the body, and has a radial thickness, a lower recess surface offset from the upper annular seal surface, and a plurality of micro-contact areas (MCAs) protruding from the lower recess surface, each MCA having a top surface offset from the lower recess surface by a second distance less, and one or more electrodes within the body. The upper annular seal surface may be configured to support an outer edge of a semiconductor substrate when the semiconductor substrate is being supported by the pedestal, and the upper annular seal surface and the tops of the MCAs may be configured to support the semiconductor substrate when the semiconductor substrate is being supported by the pedestal.

MICRO-CHAMBER FOR INSPECTING SAMPLE MATERIAL

A micro-chamber for inspecting a sample material immersed in a liquid and a method for filling such a chamber are described. The sample chamber includes an inspection volume for holding the sample material, the inspection volume defined by first and second rigid layers, with a hermetic seal between the layers. The inspection volume within the sample chamber is evacuated. Prior to filling the inspection volume, a thin part of at least one of the rigid layers separates the inspection volume from the outside, the thin part being equipped to be punctured. The liquid with immersed sample material is placed upon the thin part and the thin part is then punctured, resulting in sample material entering the inspection volume.

Sample holder, intermembrane distance adjustment mechanism, and charged particle beam device

A sample holder reliably holds a liquid or gel sample, and the yield of observation with a charged particle beam device is improved. A sample holder 101 includes a first member 102 that has a lid member 111 and a first chip 105 provided with a first window 123 where a laminated film including a first insulating thin film 104 is formed, and a second member 103 that has a base material 127 having a first bottom seal surface 203 and a second bottom seal surface 200, an electrode 108 disposed on the base material, and a second chip 107 provided with a second window 124 where a second insulating thin film 106 is formed and held on the second bottom seal surface via a second seal material 119 such that the second window faces the electrode, in which a region inside a first seal material is maintained airtightly from a region outside the first seal material by the first member and the second member being combined and the first seal material being crushed between the first bottom seal surface and an upper seal surface of the lid member.

Apparatus for treating substrate and method for aligning dielectric plate using the same
12417901 · 2025-09-16 · ·

Provided is an apparatus for treating a substrate. The apparatus for treating the substrate includes a housing defining a treatment space formed by a combination of an upper housing and a lower housing, a gas supply unit configured to supply gas to the treatment space, a support unit including a chuck configured to support the substrate in the treatment space and an upper electrode provided to surround the check when viewed from a top view, a dielectric plate unit including a dielectric plate arranged to oppose the substrate supported by the support unit in the treatment space, and an upper electrode unit coupled to the dielectric plate unit and including an upper electrode arranged to oppose the lower electrode, in which the upper electrode unit is coupled to the lower housing.

DEVICE FOR HOLDING A SAMPLE, SYSTEM AND MANUFACTURING METHOD

The invention relates to a device for holding a sample for use with an optical appliance, a system, a method for manufacturing a device and a method for holding a sample in an optical appliance. A device (10) for holding a sample for use with an optical appliance, in particular an electron microscope, comprises a sample area (12) for arranging a sample, a light source (14) for illuminating the sample arranged in the sample area (12), a holding section (16) which enables the device (10) to be held by a sample holder of the optical appliance, and a contact section (18). The contact section (18) has at least two electrical contacts (20) for establishing an electrical connection with the sample holder to power the light source (14).

Wafer placement table

A wafer placement table is a wafer placement table that includes a refrigerant flow channel through which refrigerant is flowed and includes a top base including a ceramic base incorporating an electrode and having a wafer placement surface on a top surface of the ceramic base, a bottom base on a top surface of which a flow channel groove defining a side wall and a bottom of the refrigerant flow channel is provided, and a seal member disposed between the top base and the bottom base so as to seal the refrigerant flow channel from an outside.

ELECTROSTATICALLY SECURED SUBSTRATE SUPPORT ASSEMBLY
20250385081 · 2025-12-18 ·

A substrate support assembly includes a cooling plate. The substrate support assembly further includes a chuck disposed on the cooling plate. The chuck includes one or more clamp electrodes to electrostatically secure the chuck to the cooling plate. The substrate support assembly further includes multiple mesas formed on a bottom surface of the chuck or formed on a top surface of the cooling plate to separate the chuck from the cooling plate.

SELF-COMPLIANT SEAL ASSEMBLY

A process station is provided. The process station includes a chamber body defining a chamber volume. The process station also includes a pumping plate disposed in the chamber body. Further, the process station includes a substrate support disposed in the chamber body. The substrate support includes a seal plate and a self-compliant seal assembly. The self-compliant seal assembly includes a compliant diaphragm having an inner rim and an outer rim, the inner rim being coupled with the seal plate and the outer rim forming a cavity; a spring element disposed in the cavity; and a compliant sheet disposed between the seal plate and the inner rim and between the outer rim and the pumping plate. The spring element is arranged to bias the compliant sheet toward the pumping plate to form a compliant seal that isolates a first region from a second region of the chamber volume.