Patent classifications
H01J2237/2008
IMAGE FORMING METHOD AND IMPEDANCE MICROSCOPE
An image forming method includes: arranging a sample between a first main surface of an insulating thin film and a counter electrode, measuring an impedance value by inputting an AC potential signal to the counter electrode, scanning a physical beam while focusing and irradiating a conductive thin film given to cover a second main surface of the insulating thin film with the physical beam to lower an insulation property of the insulating thin film directly below an irradiation position, guiding the AC potential signal to the irradiation position, and forming an image from the impedance value corresponding to the irradiation position.
Radio-frequency (RF) transmission systems, devices, and methods for in situ transmission electron microscopy
A sample carrier for in situ transmission electron microscopy (TEM) has a dielectric substrate with a conductive layer that forms a coplanar waveguide. The coplanar waveguide has a first and second leads formed by the conductive layer. The first lead is between an adjacent pair of second leads and is spaced from the second leads by a respective gap. The coplanar waveguide is configured to transmit an electrical signal to a specimen held by the sample carrier, in particular, an electrical signal having a frequency in the radio-frequency (RF) regime (3 kHz-300 GHz), for example, up to 100 GHz. The sample carrier may be mounted to a TEM sample holder, which supports the sample carrier within a vacuum chamber of the microscope and provides electrical connection between the leads of the sample carrier and an RF source external to the vacuum chamber.
METHOD AND SYSTEM FOR INSPECTING AN EUV MASK
A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EU mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.
LIQUID CHIP FOR ELECTRON MICROSCOPE INCLUDING ELECTRODE
The present disclosure relates to a liquid chip for an electron microscope including a lower chip, an upper chip, and a waterway space part for supplying a liquid sample, and may attach a transmissive thin film layer made of a graphene material having an excellent bulging resistance property to a plurality of holes formed in a waterway space part to increase the thickness of a support not operating as a transmissive window to be larger than the conventional one, thereby supplying the liquid sample more stably and minimizing the loss of a spatial resolution and also suppressing the bulging phenomenon of the transmissive window.
To this end, according to the present disclosure, the lower chip includes a lower substrate formed with a lower cavity; a lower support disposed on the upper surface of the lower substrate, and formed with a plurality of lower holes in the lower cavity region; a spacer located on both ends of the lower support of the lower hole; and a lower transmissive thin film layer attached on the lower support so as to cover the lower hole, the upper chip includes an upper substrate formed with an upper cavity; an upper support disposed on the upper surface of the upper substrate, and formed with a plurality of upper holes in the upper cavity region; and an upper transmissive thin film layer having a constant bulging resistance property attached on the upper support so as to cover the plurality of upper holes, the waterway space part is formed by laminating the upper support disposed on the upper surface of the upper substrate on the spacer of the lower chip, and the transmissive thin film layer is located inside the waterway space part.
Membraneless platform for correlated analysis of nanomaterials
A multipurpose membraneless sample platform for supporting a target material, includes a substrate; a dielectric layer formed over a side of the substrate; first and second electrodes formed over the dielectric layer; and a window formed through the substrate and the dielectric layer. There is no material covering the window.
Dynamic response analysis prober device
The present invention relates to a prober device that shapes an input waveform of a dynamic electric signal to be input to one of probes, and observes an output waveform of the dynamic electric signal output through a sample, or preferably shapes the input waveform such that the output waveform of the dynamic electric signal output through the sample becomes approximately a pulse shape, when a response analysis of a dynamic signal is performed with respect to a fine-Structured device. With this, the response analysis of a high-speed dynamic signal equal to or greater than a megahertz level can be performed with respect to the fine-Structured device such as a minute transistor configuring an LSI.
Method and system for inspecting an EUV mask
A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.
RADIO-FREQUENCY (RF) TRANSMISSION SYSTEMS, DEVICES, AND METHODS FOR IN SITU TRANSMISSION ELECTRON MICROSCOPY
A sample carrier for in situ transmission electron microscopy (TEM) has a dielectric substrate with a conductive layer that forms a coplanar waveguide. The coplanar waveguide has a first and second leads formed by the conductive layer. The first lead is between an adjacent pair of second leads and is spaced from the second leads by a respective gap. The coplanar waveguide is configured to transmit an electrical signal to a specimen held by the sample carrier, in particular, an electrical signal having a frequency in the radio-frequency (RF) regime (3 kHz-300 GHz), for example, up to 100 GHz. The sample carrier may be mounted to a TEM sample holder, which supports the sample carrier within a vacuum chamber of the microscope and provides electrical connection between the leads of the sample carrier and an RF source external to the vacuum chamber.
Specimen holder used for mounting samples in electron microscopes
A novel specimen holder for specimen support devices for insertion in electron microscopes. The novel specimen holder of the invention provides mechanical support for specimen support devices and as well as electrical contacts to the specimens or specimen support devices.
Cell for electrochemical measurement
A cell for electrochemical measurement is a cell for electrochemical measurement used for measurement by an electron beam that passes through an observation window, a MEMS chip for observation which includes a laminate including an electron-transmissive thin film and a substrate and in which a working electrode and a counter electrode are provided on a thin film and an MEMS chip for sealing which is a laminate including an electron-transmissive thin film and a substrate are disposed apart from each other, and there are areas in both laminates in which the substrates are not present, and an observation window including the thin film is formed in the areas, and the working electrode overlaps the observation window in both laminates and has a plurality of through-holes on an observation window in a direction in which an electron beam passes.