A multipurpose membraneless sample platform for supporting a target material, includes a substrate; a dielectric layer formed over a side of the substrate; first and second electrodes formed over the dielectric layer; and a window formed through the substrate and the dielectric layer. There is no material covering the window.

System for performing in-line nanoprobing on semiconductor wafer. A wafer support or vertical wafer positioner is attached to a wafer stage. An SEM column, an optical microscope and a plurality of nanoprobe positioners are all attached to the ceiling. The nanoprobe positioners have one nanoprobe configured for physically contacting selected points on the wafer. A force (or touch) sensor measures contact force applied by the probe to the wafer (or the moment) when the probe physically contacts the wafer. A plurality of drift sensors are provided for calculating probe vs. wafer alignment drift in real-time during measurements.

An electrical device for electrically measuring a sample during electron microscope imaging includes: a chip through which a slit is defined, the chip having at least one peripheral edge, the slit having an open end at the at least one peripheral edge; an electrically conductive first contact on the chip; and an electrically conductive second contact on the chip; wherein the slit is at least partially positioned between the first contacts and second contact. An electrically conductive first wire may extend along the chip electrically connected to the first contact; and an electrically conductive second wire may extend along the chip electrically connected to the second contact. The first wire and second wire may diverge from each other in extending along the chip away from the slit.

In some embodiments, a system for measuring magnetic fields produced within a microscope comprising an electromagnetic lens includes a sensor support element configured to be mounted to a distal end of an elongated support member that is configured to be inserted into the microscope, and a magnetic field sensor supported by the sensor support element, the magnetic field sensor being configured to sense magnetic fields at a position within the electron microscope at which specimens are imaged during operation of the microscope.

Embodiments of the invention provide for an electron microscope sample holder, which includes a membrane, a support frame partially surrounding a perimeter or circumference of the membrane, a mounting area for mounting a sample to the membrane, where the mounting area abuts a perimeter or circumference of the membrane not surrounded by the support frame, at least two of conducting contact pads mounted on a the support frame, and at least one electrode lead mounted on the membrane and in electric contact with at least one conducting contact pad.

A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.

A system for positioning a sample in a charged particle apparatus (CPA) or an X-ray photoelectron spectroscopy (XPS) system includes a sample carrier coupled to a stage inside the vacuum chamber of the CPA or XPS system. The system allows transferring of the sample carrier among multiple CPAs, XPS systems and glove boxes in inert gas or in vacuum. The sample carrier is releasably coupled with the stage in the vacuum chamber of the CPA or the XPS. Multiple electrodes in a sample area of the sample carrier are electrically connectable with the stage by multiple spring contacts between the sample carrier and the stage.

A cell for electrochemical measurement is a cell for electrochemical measurement used for measurement by an electron beam that passes through an observation window, a MEMS chip for observation which includes a laminate including an electron-transmissive thin film and a substrate and in which a working electrode and a counter electrode are provided on a thin film and an MEMS chip for sealing which is a laminate including an electron-transmissive thin film and a substrate are disposed apart from each other, and there are areas in both laminates in which the substrates are not present, and an observation window including the thin film is formed in the areas, and the working electrode overlaps the observation window in both laminates and has a plurality of through-holes on an observation window in a direction in which an electron beam passes.

An electrical connector for use in electron microscopy sample holders. The electrical connector provides electrical contacts to the sample support devices which are positioned in the sample holders for electrical, temperature and/or electrochemical control.

An electrochemistry device for electrically measuring a sample during electron microscope imaging includes: a planar chip having a first longitudinal end along which at least three laterally spaced contact electrodes are positioned; a laterally extending working electrode in electrical communication with a first of the three contact electrodes; a counter electrode spaced from and at least partially encircling the working electrode, the counter electrode in electrical communication with a second of the three contact electrodes; and a reference electrode in electrical communication with a third of the three contact electrodes, the reference electrode positioned outside of an area defined between the working electrode and counter electrode.