The invention relates to a Cryo-Charged Particle (CCP) sample handling and storage system. The system is used for storing and handling cryo-samples for use in charged particle microscopy, such as cryo-electron microscope samples for use in cryo-transmission electron microscopy. The system comprises a storage apparatus for storing a plurality of CCP samples, and a Charged Particle Apparatus (CPA), such as a cryo-TEM, at a location remote from said storage apparatus. The system further comprises a transfer device that is releasably connectable to said storage apparatus, and that is releasably connectable to said CPA as well. As defined herein, said transfer device is arranged for acquiring a CCP sample from said plurality of CCP samples when connected to said storage apparatus, and arranged for transferring said CCP sample from said transfer device to said CPA when connected to said CPA.

Tweezers 8, which can grip a sample piece 9, includes a gripping member 8a1 and a gripping member 8a2. The gripping member 8a1 includes a gripping region 8c1 and an abutment region 8b1, and the gripping member 8a2 includes a gripping region 8c2 and an abutment region 8b2. The gripping region 8c1 and the gripping region 8c2 include a gripping surface SF1 and a gripping surface SF2 for gripping the sample piece 9, respectively. The abutment region 8b1 protrudes from the gripping region 8c1 in a direction directed from the gripping surface SF1 to the gripping surface SF2, and the abutment region 8b2 protrudes from the gripping region 8c2 in a direction directed from the gripping surface SF2 to the gripping surface SF1.

A nanoprober system can land a probe onto a device under test (DUT) by positioning a conductive probe above the DUT by a motion control device; applying electrical signals between the conductive probe and the DUT; measuring electrical responses from the applied electrical signal; calculating impedance magnitude values and / or phase angle values based on the measured electrical response values; causing the conductive probe to move towards the DUT while continuing to calculate impedance magnitude values and / or phase angle values from measured electrical response; determining that the conductive probe has contacted the DUT based on a change in the calculated impedance magnitude values and / or phase angle values; and signaling to the motion control device to stop moving the probe towards the DUT based on the change in the calculated impedance magnitude values and / or phase angle values.

The invention relates to a method for ablating a material (1) from a material unit (502) and for arranging the material (1) on an object (125), the object (125) being arranged in a particle beam apparatus. Further, the invention relates to a computer program product, and to a particle beam apparatus for carrying out the method. The method comprises feeding a particle beam with charged particles onto the material (1), wherein the material (1) is arranged on the material unit (502) and/or wherein the material unit (502) is formed from the material (1), wherein the material (1) is ablatable from the material unit (502) and wherein the material (1) is arranged on the material unit (502) at a distance from the object (125).

Further, the method comprises ablating the ablatable material (1) arranged on the material unit (502) from the material unit (502) using the particle beam, and arranging the ablated material (514) on the object (125).

A gas feed device includes a feed unit that feeds a gaseous state of a first precursor and/or a gaseous state of a second precursor, a first line device that conducts the gaseous state of the first precursor to the feed unit and a second line device that conducts the gaseous state of the second precursor to the feed unit. A first valve is arranged between the first line device and the feed unit. A second valve is arranged between the second line device and the feed unit. A control valve is connected to the first valve and is arranged between the first valve and the feed unit. The control valve is connected to the second valve and is arranged between the second valve and the feed unit. The first valve, the second valve and/or the control valve may be magnetic valve(s).

A probe assembly for use with a charged particle instrument includes an elongate body having a proximal end for positioning outside of a charged particle instrument enclosed environment, a distal end for positioning within the enclosed environment and a longitudinal axis. A port interface is located on the body between the proximal and distal ends, and is coupleable to a nanomanipulator system of the charged particle instrument. A probe needle is positioned at a distal end of the body and is selectively positionable from outside the enclosed environment to contact a specimen within the enclosed environment. At least one gas injection needle is adjustably positioned near the probe needle. The gas injection needle is connectable to a source of pressurized gas to selectively inject gas in the area of the probe needle within the enclosed environment.

An automatic sample preparation apparatus that automatically prepares a sample piece from a sample and includes a focused ion beam irradiation optical system, an electron beam irradiation optical system configured to irradiate an electron beam from a direction different from a direction of the focused ion beam, a sample piece transfer device configured to hold and transfer the sample piece separated and extracted from the sample, a detector configured to detect secondary charged particles emitted from an irradiation object, and a computer configured to recognize a position of the sample piece transfer device by image-recognition using an image data of the focused ion beam and the electron beam generated by irradiating the sample piece transfer device with the focused ion beam and the electron beam, and drive the sample piece transfer device, wherein the image data includes a reference mark.

An apparatus and a method for micromachining samples is provided. The apparatus includes an integral combination of a sample holder, a focused ion beam exposure system for projecting a FIB onto a first position on the sample, and a light optical microscope. The LM is configured for imaging or monitoring said first position. The method includes the steps of capturing LM images of the sample, determining a position and physical dimensions of a region of interest in the sample based on the LM images, establishing from the LM images settings of the sample holder and/or the FIB exposure system, for micromachining the sample to bring the region of interest more closer to the surface, and moving the sample or the trajectory of the FIB to locate the first position on the sample accordingly, and activating the FIB for micromachining the sample.

The invention relates to a transport apparatus for transferring a sample between two devices. The transport apparatus comprises a transport tube provided with a carrier for holding a sample. The carrier is movable within said transport tube along a length thereof. The transport apparatus further comprises an actuator tube extending substantially next to said transport tube and which is provided with an actuator element that is movable within said actuator tube. Said actuator element comprises a first magnet part, and said sample carrier is provided with a second magnet part, wherein said first magnet part and said second magnet part are configured such that movement of the sample carrier through said transport tube is linked to movement of the magnetic actuator element through the actuator tube. In this way, movement of the magnetic actuator causes movement of the sample carrier, allowing safe, reliable and protected transport of the sample.

Systems and methods for pre-aligning samples for more efficient processing of multiple samples with a BIB system according to the present invention comprises affixing a sample to an adjustable portion of a sample holder, nesting the sample holder with a first mask having a first mask edge, wherein the first mask is positioned outside of a BIB system, and aligning the sample such that it has a desired geometric relationship to the first mask edge. The first mask may be geometrically similar with a second mask within the BIB system that has a second mask edge such that the geometric relationship between the first mask edge and the sample when the sample holder is nested with the first mask is the same as the geometric relationship between the second mask edge and the sample when the sample holder is nested with the second mask.