A semiconductor device has a substrate, a first circuit, a first inductor, a second circuit and a second inductor IND2. The substrate includes a first region and a second region, which are regions different from each other. The first circuit is formed on the first region. The first inductor is electrically connected with the first circuit. The second circuit is formed on the second regions. The second inductor is electrically connected with the second circuit and formed to face the first inductor. A penetrating portion is formed in the substrate. The penetrating portion is formed such that the penetrating portion surrounds one or both of the first circuit and the second circuit in plan view.

A display substrate, a manufacturing method thereof and a display apparatus are provided. The display substrate includes: a base substrate; a sealant on the base substrate; and a contact layer between the base substrate and the sealant, the contact layer being in contact with the sealant. In the display substrate, a contact layer surface of the contact layer, which is away from the base substrate, is not flat at a contact position where the contact layer is in contact with the sealant.

Compounds containing, in one molecule thereof, a structure represented by formula (1), a structure represented by formula (2), and a structure represented by formula (3) (all the symbols are those described in the specification).

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are useful as epoxy resin curing agents.

Compounds containing, in one molecule thereof, a structure represented by formula (1), a structure represented by formula (2), and a structure represented by formula (3) (all the symbols are those described in the specification).

##STR00001##

are useful as epoxy resin curing agents.

This semiconductor module includes: a base plate formed in a plate shape; a terminal member; an electronic component joined to one surface of the base plate; and mold resin sealing the base plate, the terminal member, and the electronic component. The base plate and the terminal member are conductive members and are arranged with an interval therebetween on the same plane. Each of the base plate and the terminal member has a body portion and a terminal portion exposed to outside from the mold resin. The base plate has a through hole at an extension part which is a part extending toward the terminal portion and connected to the terminal portion, in the body portion.

A semiconductor chip is arranged on a first surface of a die pad in a substrate (leadframe) including an array of electrically conductive leads. An encapsulation of laser direct structuring (LDS) material encapsulates the substrate and the semiconductor chip. The encapsulation has a first surface, a second surface opposed to the first surface and a peripheral surface. The array of electrically conductive leads protrude from the peripheral surface with areas of the second surface of the encapsulation arranged between adjacent leads. LDS structured areas of the second surface located between adjacent leads in the array of electrically conductive leads provide a further array of electrically conductive leads exposed at the second surface. First and second electrically conductive vias extending through the encapsulation material as well as electrically conductive lines over the encapsulation material provide an electrical bonding pattern between the semiconductor chip and selected ones of the leads.

Some embodiments of the present disclosure relate to a high electron mobility transistor (HEMT) which includes a heterojunction structure arranged over a semiconductor substrate. The heterojunction structure includes a binary III/V semiconductor layer is a first III-nitride material and a ternary III/V semiconductor layer arranged over the binary III/V semiconductor layer and is a second III-nitride material. Source and drain regions are arranged over the ternary III/V semiconductor layer. A gate structure is arranged over the heterojunction structure and arranged between the source and drain regions. The gate structure is a third III-nitride material. A first passivation layer directly contacts an entire sidewall surface of the gate structure and is a fourth III-nitride material. The entire sidewall surface has no dangling bond. A second passivation layer is conformally disposed along the first passivation layer, the second passivation layer has no physical contact with the gate structure.

A photosensitive resin composition is also provided that includes a polymer precursor selected from a polyimide precursor and a polybenzoxazole precursor; a photo-radical polymerization initiator; and a solvent, in which an acid value of an acid group contained in the polymer precursor and having a neutralization point in a pH range of 7.0 to 12.0 is in a range of 2.5 to 34.0 mgKOH/g, and either the polymer precursor contains a radically polymerizable group or the photosensitive resin composition includes a radically polymerizable compound other than the polymer precursor.

An object is to provide a technique which suppresses peeling between a sealing resin and a semiconductor element while suppressing a decrease in productivity and an increase in manufacturing cost in a semiconductor device. A semiconductor device includes a semiconductor element, and a sealing resin sealing the semiconductor element. The semiconductor element includes a cell region through which a main current flows, a terminal region provided on an outer peripheral side of the cell region, and a protective film covering an upper surface of an outer peripheral portion of the terminal region. The protective film includes spread portions spreading to outermost ends at four corners of the semiconductor element. The spread portions have a cut section continuous with a cut section of the terminal region, and do not spread to the outermost ends in four sides excluding the four corners of the semiconductor element.

A package structure includes a semiconductor die, an insulating encapsulant, a first redistribution layer, a second redistribution layer, antenna elements and a first insulating film. The insulating encapsulant is encapsulating the at least one semiconductor die, the insulating encapsulant has a first surface and a second surface opposite to the first surface. The first redistribution layer is disposed on the first surface of the insulating encapsulant. The second redistribution layer is disposed on the second surface of the insulating encapsulant. The antenna elements are located over the second redistribution layer. The first insulating film is disposed in between the second redistribution layer and the antenna elements, wherein the first insulating film comprises a resin rich region and a filler rich region, the resin rich region is located in between the filler rich region and the second redistribution layer and separating the filler rich region from the second redistribution layer.