A semiconductor device includes a semiconductor layer with opposing first and second main surfaces and a first column extending from the first main surface and having a first concentration of a dopant of the first conductivity type. A trench with a sidewall and bottom extends at least partially through the semiconductor layer from the first main surface. A second column between the trench sidewall and the first column has a second concentration of a dopant of a second conductivity type and is formed in the semiconductor layer and extends from the first main surface. A trench oxide layer is in contact with at least the trench sidewall and the trench bottom. A trench nitride layer covers the trench oxide layer at least on the trench sidewall. A dielectric seal material seals the trench proximate the first main surface of the semiconductor layer such that the trench is air-tight.

An integrated circuit package with a buffer providing radiation protection to memory elements and components is described. The integrated circuit packages and the incorporated buffers provide a protective distance between potential sources of internal radiation particles within the integrated circuit package and any memory elements/components which may be sensitive to radiation such as alpha particles. This protective distance allows for the integrated circuit packages to be completed or assembled without needing added more expensive or redundant memory components.

In one embodiment, a method of forming a semiconductor device may include forming a sensing circuit to apply a voltage to a doped region wherein the voltage expands depletion region toward a second depletion region but substantially does not intersect the second depletion region. An embodiment may include configuring the sensing circuit to detect electrons within the doped region and to responsively assert a detection signal representing detection of the electrons wherein the sensing circuit detects the electrons while applying the voltage to the second doped region.

In one embodiment, a method of forming a semiconductor device may include forming a sensing circuit to apply a voltage to a doped region wherein the voltage expands depletion region toward a second depletion region but substantially does not intersect the second depletion region. An embodiment may include configuring the sensing circuit to detect electrons within the doped region and to responsively assert a detection signal representing detection of the electrons wherein the sensing circuit detects the electrons while applying the voltage to the second doped region.

Certain aspects of the present disclosure provide an integrated circuit (IC) package and techniques for fabricating the IC package. The IC package generally includes a substrate, an IC disposed above the substrate, and a shielding layer coupled to a layer of the substrate, wherein the shielding layer is disposed above the substrate adjacent to the IC, and below an upper surface of the IC.

A semiconductor device includes a substrate and a semiconductor chip. The semiconductor chip includes a semiconductor element on a first surface thereof. The semiconductor chip is provided on the substrate such that a second surface thereof, which is opposite to the first surface, faces an upper surface of the substrate. A metal layer is provided between the second surface of the semiconductor chip and the upper surface of the substrate. A metal material, in which the range of rays is shorter than for single-crystal silicon, is used in the metal layer.

A semiconductor device includes a substrate and a semiconductor chip. The semiconductor chip includes a semiconductor element on a first surface thereof. The semiconductor chip is provided on the substrate such that a second surface thereof, which is opposite to the first surface, faces an upper surface of the substrate. A metal layer is provided between the second surface of the semiconductor chip and the upper surface of the substrate. A metal material, in which the range of rays is shorter than for single-crystal silicon, is used in the metal layer.

According to one embodiment, there is provided a semiconductor device including a substrate, a semiconductor chip, and a conductive film. The substrate has a main face. The semiconductor chip has a surface equipped with an SRAM circuit. The semiconductor chip is mounted on the main face via a plurality of bump electrodes in a state where the surface faces the main face. The conductive film is disposed on the main face or the surface. The conductive film extends planarly between the plurality of bump electrodes. A region in the main face or the surface where the conductive film is disposed overlaps the SRAM circuit in a direction perpendicular to the main face.

According to one embodiment, there is provided a semiconductor device including a substrate, a semiconductor chip, and a conductive film. The substrate has a main face. The semiconductor chip has a surface equipped with an SRAM circuit. The semiconductor chip is mounted on the main face via a plurality of bump electrodes in a state where the surface faces the main face. The conductive film is disposed on the main face or the surface. The conductive film extends planarly between the plurality of bump electrodes. A region in the main face or the surface where the conductive film is disposed overlaps the SRAM circuit in a direction perpendicular to the main face.

Examples of an electronic component device includes a housing formed of a member that causes radiation to lose its energy by generating an electric charge when the housing is subjected to the radiation and an electronic component housed in the housing. The member is a semiconductor device member having a PN junction.