A light receiving device includes a light receiver including pixels and a light receiving area. The pixels are arranged in an array in a first direction and in a second direction intersecting with the first direction and each of the pixels has one light receiving element or more. The light receiving area has continuous pixels out of the pixels, outputs signals based on intensities of light received in the continuous pixels, and is changed in position in the light receiver according to a signal indicating a position in the first direction and a position in the second direction.

A radiation image capturing apparatus includes a sensor substrate including a flexible base material and plural pixels that accumulate charges generated in accordance with radiation, a flexible first cable including one ends electrically connected to a connection region disposed at a predetermined side of the sensor substrate, a first circuit substrate electrically connected to the other end of the first cable and in which a first component used for processing a digital signal in a circuit unit driven in a case of reading out the charges in the plural pixels is mounted, a flexible second cable including one end electrically connected to a connection region disposed at a side different from the predetermined side, and a second circuit substrate electrically connected to the other end of the second cable and in which a second component used for processing an analog signal in the circuit unit is mounted.

To provide a light receiving element including: a photoelectric conversion unit (PD) that is provided in a semiconductor substrate and converts light into a charge; a first charge accumulation unit (MEM) to which the charge is transferred from the photoelectric conversion unit; a second charge accumulation unit (MEM) to which the charge is transferred from the photoelectric conversion unit, in which each of the first and second charge accumulation units includes a stack of an electrode, a first insulating layer, and a semiconductor layer.

An optical sensing apparatus is provided. The optical sensing apparatus includes a substrate, one or more pixels supported by the substrate, where each of the one or more pixels includes an absorption region, a field control region, a first contact region, a second contact region and a carrier confining region. The field control region and the first contact region are doped with a dopant of a first conductivity type. The second contact region is doped with a dopant of a second conductivity type. The carrier confining region includes a first barrier region and a channel region, where the first barrier region is doped with a dopant of the second conductivity type and has a first peak doping concentration, and where the channel region is intrinsic or doped with a dopant of the second conductivity type and has a second peak doping concentration lower than the first peak doping concentration.

Provided are an imaging element, a distance measuring device, and an electronic device capable of improving resolution of a distance image while preventing generation of electromagnetic noise.

An imaging element according to the present disclosure includes: a signal generator configured to generate a clock signal; a plurality of flip-flops connected in a cascade manner; a circuit block configured to supply a first signal to a clock terminal of each of the plurality of flip-flops and to supply a second signal to an input terminal of a first-stage flip-flop of the plurality of flip-flops in accordance with the clock signal; and a pixel array including pixels configured to be driven using pulse signals supplied from different stages of the plurality of flip-flops.

A device may include: a highly doped n.sup.+ Si region; an intrinsic silicon multiplication region disposed on at least a portion of the n.sup.+ Si region, the intrinsic silicon multiplication having a thickness of about 90-110 nm; a highly doped p.sup.− Si charge region disposed on at least part of the intrinsic silicon multiplication region, the p.sup.− Si charge region having a thickness of about 40-60 nm; and a p.sup.+ Ge absorption region disposed on at least a portion of the p.sup.− Si charge region; wherein the p.sup.+ Ge absorption region is doped across its entire thickness. The thickness of the n.sup.+ Si region may be about 100 nm and the thickness of the p.sup.− Si charge region may be about 50 nm. The p.sup.+ Ge absorption region may confine the electric field to the multiplication region and the charge region to achieve a temperature stability of 4.2 mV/° C.

A sensing substrate and an electronic device are provided. The sensing substrate includes a sensing unit on a base substrate. The sensing unit includes a sensing element and a conductive pattern, the sensing element has a light incident surface and a back surface that are opposite and a side surface between the light incident surface and the back surface. The conductive pattern is on a side of the sensing element away from the base substrate, and has a hollow portion and a transparent conductive portion surrounding the hollow portion, an orthographic projection of the hollow portion on the base substrate is at least partially within an orthographic projection of the sensing element on the base substrate, and an orthographic projection of the transparent conductive portion on the base substrate at least partially overlaps with an orthographic projection of the side surface of the sensing element on the base substrate.

An integrated circuit structure including a substrate having an upper surface; a gallium nitride layer disposed on the upper surface of the substrate; and a photoconductive semiconductor switch laterally disposed alongside a transistor on the gallium nitride layer integrated into the integrated circuit structure; an EMF shield enclosing the substrate, the gallium nitride layer and the photoconductive semiconductor switch laterally disposed alongside the transistor on the gallium nitride layer integrated into the integrated circuit structure; and a signal line electronically coupled with the photoconductive semiconductor switch, the signal line penetrating the EMF shield.

An integrated circuit structure including a substrate having an upper surface; a gallium nitride layer disposed on the upper surface of the substrate; and a photoconductive semiconductor switch laterally disposed alongside a transistor on the gallium nitride layer integrated into the integrated circuit structure; an EMF shield enclosing the substrate, the gallium nitride layer and the photoconductive semiconductor switch laterally disposed alongside the transistor on the gallium nitride layer integrated into the integrated circuit structure; and a signal line electronically coupled with the photoconductive semiconductor switch, the signal line penetrating the EMF shield.

Microstructures of micro and/or nano holes on one or more surfaces enhance photodetector optical sensitivity. Arrangements such as a CMOS Image Sensor (CIS) as an imaging LIDAR using a high speed photodetector array wafer of Si, Ge, a Ge alloy on SI and/or Si on Ge on Si, and a wafer of CMOS Logic Processor (CLP) ib Si fi signal amplification, processing and/or transmission can be stacked for electrical interaction. The wafers can be fabricated separately and then stacked or can be regions of the same monolithic chip. The image can be a time-of-flight image. Bayer arrays can be enhanced with microstructure holes. Pixels can be photodiodes, avalanche photodiodes, single photon avalanche photodiodes and phototransistors on the same array and can be Ge or Si pixels. The array can be of high speed photodetectors with data rates of 56 Gigabits per second, Gbps, or more per photodetector.