In an embodiment, a method includes: placing a wafer on an implanter platen, the wafer including alignment marks; measuring a position of the wafer by measuring positions of the alignment marks with one or more cameras; determining an angular displacement between the position of the wafer and a reference position of the wafer; and rotating the implanter platen by the angular displacement.

A display device includes: a substrate including an alignment area in a non-display area, and a display area including a plurality of material layers on the substrate; in the alignment area, a plurality of keys including a first alignment key and a second alignment key. Each alignment key includes a light blocking pattern, a layer pattern and a display pattern. The position of the display pattern within the first alignment key is different from the position of the display pattern within the second alignment key, the layer pattern of the alignment key and one material layer among the plurality of material layers are respective portions of a same material layer on the substrate, and the layer pattern of the first alignment key and the layer pattern of the second alignment key are respective portions of different material layers among the plurality of material layers on the substrate.

A semiconductor device has shielding to prevent transmission and/or reception of EMI and/or RFI radiation. The semiconductor device comprises a substrate including grounded contact pads around a periphery of the substrate, exposed at one or more edges of the substrate. A bump made of gold or other non-oxidizing conductive material may be formed on the contact pads, for example using ultrasonic welding to remove an oxidation layer between the contact pads and the conductive bumps. The conductive bumps electrically couple to a conductive coating applied around the periphery of the semiconductor device.

A technique for marking semiconductor devices with an identifiable mark or alphanumeric text yields a high-contrast, easily distinguishable mark on an electrical terminal of the device without impacting the device's breakdown voltage capability and without compromising the solderability and wire bondability of the terminal. This approach deposits the mark on the terminal as a patterned layer of palladium, which offers good contrast with the base metal of the terminal and maintains the solderability and bondability of the terminal.

A transistor package that includes a metal submount; a transistor die mounted on said metal submount; a surface mount IPD component that includes a dielectric substrate; and the dielectric substrate mounted on said metal submount. Additionally, the dielectric substrate includes one of the following: an irregular shape, a non-square shape, and a nonrectangular shape.

A module of an embodiment of the present disclosure includes a first substrate including a first wiring pattern and a second substrate having a second wiring pattern with a wiring density different from that of the first wiring pattern, in which the second substrate is bonded to the first substrate. At least one of the first substrate or the second substrate has visible light transmittance.

Provided is a method of manufacturing a semiconductor device, including providing a substrate including a first region and a second region; forming an alignment mark in the substrate in the second region; forming a material layer on a first surface of the substrate in the first region and the second region; introducing heteroatoms into the substrate in the second region from a second surface of the substrate; and reacting the heteroatoms with the substrate to form a dielectric layer overlapping the alignment mark in the substrate in the second region.

One or more semiconductor dice are arranged on a substrate. The semiconductor die or dice have a first surface adjacent the substrate and a second surface facing away from the substrate. Laser-induced forward transfer (LIFT) processing is applied to the semiconductor die or dice to form fiducial markers on the second surface of the semiconductor die or dice. Laser direct structuring (LDS) material is molded onto the substrate. The fiducial markers on the second surface of the semiconductor die or dice are optically detectable at the surface of the LDS material. Laser beam processing is applied to the molded LDS material at spatial positions located as a function of the optically detected fiducial markers to provide electrically conductive formations for the semiconductor die or dice.

The disclosure provides an integrated circuit (IC) structure with fluorescent materials, and related methods. An IC structure according to the disclosure may include a layer of fluorescent material on an IC component. The layer of fluorescent material defines a portion of an identification marker for the IC structure.

A 3D semiconductor device including: a first level including a plurality of first single-crystal transistors; a plurality of memory control circuits formed from at least a portion of the plurality of first single-crystal transistors; a first metal layer disposed atop the plurality of first single-crystal transistors; a second metal layer disposed atop the first metal layer; a second level disposed atop the second metal layer, the second level including a plurality of second transistors; a third level including a plurality of third transistors, where the third level is disposed above the second level; a third metal layer disposed above the third level; and a fourth metal layer disposed above the third metal layer, where the plurality of second transistors are aligned to the plurality of first single crystal transistors with less than 140 nm alignment error, the second level includes first memory cells, the third level includes second memory cells.